kw.\*:("CONDENSATION PLASMA")
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DISTRIBUTION DU CHAMP MAGNETIQUE OBTENU A PARTIR DE LA CINEMATIQUE D'UNE CONDENSATION DE PLASMA DANS LA QUEUE DE LA COMETE DE HALLEYDUBININ EH M; IZRAJLEVICH PL; PODGORNYJ IM et al.1982; ASTRON. Z.; ISSN 504831; SUN; DA. 1982; VOL. 59; NO 5; PP. 1006-1011; ABS. ENG; BIBL. 14 REF.Article
STRUCTURE MODIFICATION OF BETA -BORON BY PLASMA SPRAYINGKUMAR K; DAS D.1980; METALL. TRANS. A; ISSN 0360-2133; USA; DA. 1980; VOL. 11; NO 8; PP. 1489-1492; BIBL. 6 REF.Article
DEPOT DE COUCHES DE CARBONE DE PROPRIETES SIMILAIRES A CELLES DU DIAMANT A PARTIR D'UN PLASMA ACETYLENE-KRYPTONBALAKOV AV; KONSHINA EA.1982; Z. TEH. FIZ.; ISSN 0044-4642; SUN; DA. 1982; VOL. 52; NO 4; PP. 810-811; BIBL. 10 REF.Article
THE GALILEAN SATELLITES AND THE JOVIAN MAGNETIC FIELD.FREEMAN JW.1978; MOON AND PLANETS; NETHERL.; DA. 1978; VOL. 18; NO 3; PP. 325-326; BIBL. 8 REF.Article
EFFECT OF BORON-DOPING ON THE HYDROGEN EVOLUTION FROM A-SI: H FILMSBEYER W; WAGNER H; MELL H et al.1981; SOLID STATE COMMUN.; ISSN 0038-1098; USA; DA. 1981; VOL. 39; NO 2; PP. 375-379; BIBL. 19 REF.Article
PLASMA DEPOSITION OF SI3N4 LAYERSKIROV KI; GEORGIEV SS; PANTCHEV BG et al.1980; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1980; VOL. 71; NO 1; PP. L9-L11; BIBL. 8 REF.Article
PARTICULARITES DE LA STRUCTURE DE COUCHES MINCES, PRODUITES A PARTIR DU PLASMA EXCITE DANS LES VAPEURS D'ALUMINIUMDOSTANKO AP; PIKUL MI; KULAGIN YU A et al.1976; ELEKTRON. OBRABOT. MATER., MOLDAV. S.S.R.; S.S.S.R.; DA. 1976; NO 4; PP. 58-59; BIBL. 4 REF.Article
PROTON NMR STUDIES OF ANNEALED PLASMA-DEPOSITED AMORPHOUS SI:H FILMSREIMER JA; VAUGHAN RW; KNIGHTS JC et al.1981; SOLID STATE COMMUN.; ISSN 0038-1098; USA; DA. 1981; VOL. 37; NO 2; PP. 161-164; BIBL. 8 REF.Article
THE MECHANISM OF DEPOSITION IN A SILANE PLASMAKOCIAN P.1981; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1981; VOL. 80; NO 4; PP. L81-L84; BIBL. 12 REF.Article
THE SYNTHESIS OF ULTRAFINE TITANIUM NITRIDE IN AN R.F. PLASMAYOSHIDA T; KAWASAKI A; NAKAGAWA K et al.1979; J. MATER. SCI.; GBR; DA. 1979; VOL. 14; NO 7; PP. 1624-1630; BIBL. 20 REF.Article
PROCEDES D'OBTENTION ET PROPRIETES DE COUCHES DE CARBONE DU TYPE DIAMANTBALAKOV AV; KONSHINA EA.1982; OPT.-MEH. PROM.; ISSN 0030-4042; SUN; DA. 1982; NO 9; PP. 52-59; BIBL. 49 REF.Article
SIC SYNTHESIS BY A PLASMA DEPOSITION PROCESSYOSHIHARA H; MORI H; KIUCHI M et al.1981; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1981; VOL. 76; NO 1; PP. 1-10; BIBL. 14 REF.Article
A DOPING-PRECIPITATED MORPHOLOGY IN PLASMA-DEPOSITED A-SI:HSCHIFF EA; PERSANS PD; FRITZSCHE H et al.1981; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1981; VOL. 38; NO 2; PP. 92-94; BIBL. 11 REF.Article
PARTICULARITES DE LA CONDENSATION DES COUCHES DES COMPOSANTES DU PLASMA OBTENU PAR DES IMPULSIONS LASERS DE NANOSECONDESOPACHKO II.1981; Z. TEH. FIZ.; ISSN 0044-4642; SUN; DA. 1981; VOL. 51; NO 2; PP. 439-442; BIBL. 8 REF.Article
AES INVESTIGATION OF THE CHEMICAL STRUCTURE OF PLASMA-DEPOSITED SILICON NITRIDEMADDEN HH.1981; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1981; VOL. 128; NO 3; PP. 625-629; BIBL. 18 REF.Article
COOLING OF A PURE ELECTRON PLASMA BY CYCLOTRON RADIATIONO'NEIL TM.1980; PHYS. OF FLUIDS; USA; DA. 1980; VOL. 23; NO 4; PP. 725-731; BIBL. 14 REF.Article
Processus de relaxation dans un plasma en faible déséquilibre et à phase dispersée condenséeZHUKHOVITSKIJ, D. I; YAKUBOV, I. T.Teplofizika vysokih temperatur. 1985, Vol 23, Num 5, pp 842-848, issn 0040-3644Article
Gas-phase free radical reactions in the glow-discharge deposition of hydrogenated amorphous silicon from silane and disilaneKAMPAS, F. J.Journal of applied physics. 1985, Vol 57, Num 6, pp 2290-2291, issn 0021-8979Article
Analysis of a flowing silane dc discharge in the presence of a hot surfaceLONGEWAY, P. A; WEAKLIEM, H. A; ESTES, R. D et al.Journal of applied physics. 1985, Vol 57, Num 12, pp 5499-5505, issn 0021-8979Article
The neutralization of sodium ions in plasma-deposited SiO2 layersGEORGIEV, S. S.Thin solid films. 1984, Vol 121, Num 4, pp 271-277, issn 0040-6090Article
PLASMA-ENHANCED DEPOSITION OF TUNGSTEN, MOLYBDENUM, AND TUNGSTEN SILICIDE FILMS = DEPOT AUGMENTE PAR PLASMA DE COUCHES MINCES DE TUNGSTENE, MOLYBDENE ET SILICIURE DE TUNGSTENETANG CC; CHU JK; HESS DW et al.1983; SOLID STATE TECHNOLOGY; ISSN 0038-111X; USA; DA. 1983; VOL. 26; NO 3; PP. 125-128; BIBL. 26 REF.Article
PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF TUNGSTEN FILMS = DEPOT CHIMIQUE EN PHASE VAPEUR AUGMENTE PAR PLASMA DE COUCHES MINCES DE TUNGSTENECHU JK; TANG CC; HESS DW et al.1982; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1982; VOL. 41; NO 1; PP. 75-77; BIBL. 11 REF.Article
TITANIUM DEPOSITION ONTS COPPER SUBSTRATES USING THE COLD-PLASMA TECHNIQUE = DEPOT DU TITANE SUR DES SUPPORTS DE CUIVRE EN EMPLOYANT LA TECHNIQUE DU PLASMA FROIDRUDER A; ITZHAK D.1982; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1982; VOL. 97; NO 4; PP. 339-343; BIBL. 8 REF.Article
PROCEEDINGS: TETRAHEDRALLY BONDED AMORPHOUS SEMICONDUCTORS/TOPICAL CONFERENCE ON TETRAHEDRALLY BONDED AMORPHOUS SEMICONDUCTORS, CAREFREE AZ, MARCH 12-14, 1981STREET RA ED; BIEGELSEN DK ED; KNIGHTS JC ED et al.1981; TETRAHEDRALLY BONDED AMORPHOUS SEMICONDUCTORS. TOPICAL CONFERENCE/1981-03-12/CAREFREE AZ; USA; NEW YORK: AMERICAN INSTITUTE OF PHYSICS; DA. 1981; 338 P.; 25 CM; ISBN 0-88318-172-X; AIP CONFERENCE PROCEEDINGS; 73Conference Proceedings
REACTION MECHANISMS IN PLASMA DEPOSITION OF SIXC1-X:H FILMSCATHERINE Y; TURBAN G; GROLLEAU B et al.1981; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1981; VOL. 76; NO 1; PP. 23-33; BIBL. 23 REF.Article