DIE DUENNFILM-HYBRIDSCHALTUNG HAT CHANCENDELFS H.1972; ELEKTRONIK; DTSCH.; DA. 1972; VOL. 21; NO 10; PP. 335-338; BIBL. 7 REF.Serial Issue

CHOICE OF CRITERIA FOR ELLIPSOMETRIC DETERMINATIONS ON THIN FILMSCAMAGNI P; MANARA A.1972; THIN SOLID FILMS; NETHERL.; DA. 1972; VOL. 13; NO 2; PP. 341-350; BIBL. 14 REF.Serial Issue

PROPRIETES OPTIQUES DE QUELQUES REVETEMENTS ABSORBANTS DANS LE DOMAINE SPECTRAL IRBURKIN AL; NOVIKOV AF.1972; ZH. PRIKL. SPEKTROSK., BELORUS. S.S.R.; S.S.S.R.; DA. 1972; VOL. 17; NO 4; PP. 655-660; BIBL. 6 REF.Serial Issue

GHOST IMAGERY INTENSITY AND DURABILITY OF SELECTED ANTI-REFLECTANT COATINGSPROVINES WF; TARGOVE BD; KISLIN B et al.1973; AMER. J. OPTOM. ARCH. AMER. ACAD. OPTOM.; U.S.A.; DA. 1973; VOL. 50; NO 1; PP. 34-39; BIBL. 6 REF.Serial Issue

CARACTERISTIQUES OPTIQUES DES COUCHES MULTIPLES REFLECHISSANTES A DISPERSION ELEVEE DU DEPHASAGESHKLYAREVSKIJ IN; UMEROV RI; LUPASHKO EA et al.1972; ZH. PRIKL. SPEKTROSK., BELORUS. S.S.R.; S.S.S.R.; DA. 1972; VOL. 17; NO 4; PP. 682-686; BIBL. 10 REF.Serial Issue

DETERMINATION OF THE RELATIVE NITROGEN DOPING LEVEL OF TANTALUM NITRIDE RESISTOR FILM BY MEANS OF THE SEEBECK EFFECTTRUDEL ML.1972; I.E.E.E. TRANS. PARTS HYBR. PACKAG.; U.S.A.; DA. 1972; VOL. 8; NO 3; PP. 16-21; BIBL. 4 REF.Serial Issue

THIN FILMS1972; IN: 1972 INTER. MICROELECTRON. SYMP.; WASHINGTON, D.C.; 1972; PARK RIDGE; INTER. SOC. HYBRID MICROELECTRON.; DA. 1972; PP. (17 P.); BIBL. DISSEM.Conference Paper

ETUDE DES COUCHES MINCES DE TANTALE DEPOSEES PAR PROJECTION CATHODIQUE EN VUE DE DEFINIR LES PARAMETRES PHYSICO-CHIMIQUES PERMETTANT D'OBTENIR DES STRUCTURES BCC, QUADRATIQUE ET POREUSEMOULIN M.1970; DGRST-7072282; FR.; DA. 1970; PP. (40 P.); BIBL. DISSEM.; (RAPP. FINAL, ACTION CONCERTEE: COMPOSANTS CIRCUITS MICROMINIATURISES). 2 FASCReport

ZUR WEITERENTWICKLUNG DER THERMISCHEN ELEKTRONENSTRAHL-BEARBEITUNG DUENNER SCHICHTEN = SUR LES DEVELOPPEMENTS DE LA METHODE DU TRAITEMENT THERMIQUE DE COUCHES MINCES PAR UN FAISCEAU ELECTRONIQUESCHILLER S; HEISIG U; PANZER S et al.1972; NACHR.-TECH.; DTSCH.; DA. 1972; VOL. 22; NO 11; PP. 398-401Serial Issue

DEPLACEMENT ET RUPTURE D'UN FILM DE LIQUIDEUSPENSKIJ VA; KISELEV VM.1972; ZH. PRIKL. KHIM.; S.S.S.R.; DA. 1972; VOL. 45; NO 9; PP. 1996-2000; BIBL. 12 REF.Serial Issue

REVETEMENTS INTERFERENTIELS SPECULAIRES METALLODIELECTRIQUES A SOLIDITE MECANIQUE ACCRUEFURMAN SH A; VVEDENSKIJ VD.1977; OPT.-MEKH. PROMYSHL.; S.S.S.R.; DA. 1977; VOL. 44; NO 5; PP. 41-43; BIBL. 6 REF.Article

RAPID NONDESTRUCTIVE METHOD FOR MEASURING THE REFRACTIVE INDEX AND THICKNESS OF THIN DIELECTRIC FILMSRAIF J; BEN YOSEF N; ORON M et al.1973; J. PHYS. E; G.B.; DA. 1973; VOL. 6; NO 1; PP. 48-50; BIBL. 10 REF.Serial Issue

THE DETERMINATION OF THIN LAYER THICKNESSES WITH AN ELECTRON MICROPROBEBUTZ R; WAGNER H.1973; SURF. SCI.; NETHERL.; DA. 1973; VOL. 34; NO 3; PP. 693-704; BIBL. 10 REF.Serial Issue

A SIMPLE AND HIGHLY STABLE PHOTOELECTRIC APPARATUS FOR MONITORING THE THICKNESS OF OPTICAL FILMSKIRCHNER H.1973; J. PHYS. E; G.B.; DA. 1973; VOL. 6; NO 5; PP. 430-431; BIBL. 3 REF.Serial Issue

CHANGEMENT DE TOPOGRAPHIE DES CARACTERISTIQUES OPTIQUES D'UN REVETEMENT INTERFERENTIELFURMAN SH A; LEVINA MD.1976; OPT.-MEKH. PROMYSHL.; S.S.S.R.; DA. 1976; VOL. 43; NO 12; PP. 35-37; BIBL. 4 REF.Article

ANISOTROPIC EFFECTS IN THE ELLIPSOMETRY OF "BUILT-UP" FILMS AND DETERMINATION OF THEIR OPTICAL CONSTANTSTOMAR MS; SRIVASTAVA VK.1973; THIN SOLID FILMS; NETHERL.; DA. 1973; VOL. 15; NO 2; PP. 207-215; BIBL. 17 REF.Serial Issue

FORMATION DE COUCHES MAGNETIQUES TEXTUREES POUR CIRCUITS INTEGRESBALYASNIKOV VV; BEKKER YA M.1973; MIKROELEKTRONIKA; S.S.S.R.; DA. 1973; VOL. 2; NO 4; PP. 334-336; BIBL. 4 REF.Serial Issue

ABSORPTION IN TURNING VALUE MONITORING OF NARROW BAND THIN-FILM OPTICAL FILTERSMACLEOD HA.1973; OPT. ACTA; G.B.; DA. 1973; VOL. 20; NO 7; PP. 493-508; ABS. FR. ALLEM.; BIBL. 3 REF.Serial Issue

GRAPHICAL AIDS IN THE USE OF EQUIVALENT INDEX IN MULTILAYER-FILTER DESIGN.UFFORD C; BAUMEISTER P.1974; J. OPT. SOC. AMER.; U.S.A.; DA. 1974; VOL. 64; NO 3; PP. 329-334; BIBL. 8 REF.Article

COMPARISON OF DRY FILM AND LIQUID PHOTORESIST.BAUER J.1978; ELECTRON. PACKAG. PRODUCT.; U.S.A.; DA. 1978; VOL. 18; NO 5; PP. 87-89Article

THIN FILM OPTICAL COATINGS. II. THREE-LAYER ANTIREFLECTION COATING THEORY.MOUCHART J.1977; APPL. OPT.; U.S.A.; DA. 1977; VOL. 16; NO 10; PP. 2722-2728; BIBL. 11 REF.Article

THE ELECTRICAL RESISTIVITY OF DISCONTINUOUS METAL FILMS: THE CALCULATION OF ISLAND BOUNDARY STRENGTH.JOGLEKAR AV.1975; J. PHYS. D; G.B.; DA. 1975; VOL. 8; NO 15; PP. 1851-1855; BIBL. 6 REF.Article

APPLICATION OF LINEAR PROGRAMMING TO ANTIREFLECTION COATING DESIGN.BAUMEISTER P; MOORE R; WALSH K et al.1977; J. OPT. SOC. AMER.; U.S.A.; DA. 1977; VOL. 67; NO 8; PP. 1039-1046; BIBL. 26 REF.Article

CDS-SI WIDE-BAND-GAP EMITTER TRANSISTORS.BRIAN MT.1975; J. PHYS. D; G.B.; DA. 1975; VOL. 8; NO 5; PP. 543-550; H.T. 1; BIBL. 18 REF.Article

INFLUENCE DE L'ACTIVITE DE L'ADSORBANT EN CHROMATOGRAPHIE D'ABSORPTION SUR COUCHES MINCESVIRICEL M; GONNET C.1975; J. CHROMATOGR.; NETHERL.; DA. 1975; VOL. 115; NO 1; PP. 41-55; ABS. ANGL.; BIBL. 28 REF.Article