BREVET 2.232.510 (B) (7420197). A 11 JUIN 1974. PROCEDE DE PREPARATION DE POLY-CARBOMONOFLUORUREsdPatent

SYNTHESIS OF POLY (CARBON MONOFLUORIDE) IN A FLUORINE PLASMALAGOW RJ; SHIMP LA; LAM DK et al.1972; INORG. CHEM.; U.S.A.; DA. 1972; VOL. 11; NO 10; PP. 2568-2570; BIBL. 11 REF.Serial Issue

Micro-tribological studies on fluorinated carbon filmsMIYAKE, S; KANEKO, R; KIKUYA, Y et al.Journal of tribology. 1991, Vol 113, Num 2, pp 384-389, issn 0742-4787Article

A STUDY OF THERMAL DECOMPOSITION OF THE SOLID-LAYERED FLUOROCARBON, POLY(CARBON MONOFLUORIDE).KAMARCHIK P JR; MARGRAVE JL.1977; J. THERM. ANAL.; HUNGARY; DA. 1977; VOL. 11; NO 2; PP. 259-270; ABS. FR. ALLEM. RUSSE; BIBL. 12 REF.Article

Fluorographit-ein interessanter Festschmierstoff = Intérêt du fluorographie comme lubrifiant solide = Fluorographite ― an interesting solid lubricantSTEPINA, V.Schmierungstechnik. 1988, Vol 19, Num 4, pp 114-117, issn 0036-6226Article

PERILYMPHATISCHE PERFUSION DER KOCHLEA MIT EINER FLUOROKARBON-EMULSION = PERFUSION PERILYMPHATIQUE DE LA COCHLEE PAR UNE EMULSION DE FLUORURE DE CARBONEBERGMANN K.1978; ARCH. OTO-RHINO-LARYNGOL.; DEU; DA. 1978; VOL. 220; NO 4; PP. 299-301; ABS. ENG; BIBL. 3 REF.Article

Dry etching characteristics of (Ba0.6, Sr0.4)TiO3 thin films in high density CF4/Ar plasmaKANG, Pil-Seung; KIM, Kyoung-Tae; KIM, Dong-Pyo et al.Surface & coatings technology. 2003, Vol 171, Num 1-3, pp 273-279, issn 0257-8972, 7 p.Article

Mass spectrometric studies of ionic products in CF₄/He and CF₄/O₂/He microwave discharge plasmasIWASE, Keiichiro; SELVIN, P. Christopher; SATO, Gen et al.Journal of physics. D, Applied physics (Print). 2002, Vol 35, Num 16, pp 1934-1938, issn 0022-3727, 5 p.Article

Plasma and plasma-frequency method of usefulness components extracting from ore minerals and concentrates : extracting of fluorine as carbon fluorides from fluoriteTUMANOV, Y. N; KONONOV, S. V; GALKIN, A. F et al.Fizika i himiâ obrabotki materialov. 1999, Num 5, pp 40-48, issn 0015-3214Article

Plasma-enhanced fluorination of carbon materialsMOGUET, F; SHIRASAKI, T; TRESSAUD, A et al.Le Vide (1995). 1997, Vol 53, Num 284, pp 101-104, issn 1266-0167, SUPConference Paper

Fiber optic micromirror sensor for volatile organic compoundsBUTLER, M. A; RICCO, A. J; BUSS, R et al.Journal of the Electrochemical Society. 1990, Vol 137, Num 4, pp 1325-1326, issn 0013-4651Article

High aspect ratio via etching conditions for deep trench of siliconPARK, W. J; KIM, J. H; CHO, S. M et al.Surface & coatings technology. 2003, Vol 171, Num 1-3, pp 290-295, issn 0257-8972, 6 p.Article

Effect of N-containing additive gases on global warming gas emission during remote plasma cleaning process of silicon nitride PECVD chamber using C₄F₈/O₂/Ar chemistryOH, C. H; LEE, N.-E; KIM, J. H et al.Surface & coatings technology. 2003, Vol 171, Num 1-3, pp 267-272, issn 0257-8972, 6 p.Article

Mass spectrometric measurements in inductively coupled CF₄/Ar plasmasRAO, M. V. V. S; SHARMA, S. P; MEYYAPPAN, M et al.Plasma sources science & technology (Print). 2002, Vol 11, Num 4, pp 397-406, issn 0963-0252, 10 p.Article

Mechanism of highly selective SiO₂ contact hole etchingMATSUI, Miyako; TATSUMI, Tetsuya; SEKINE, Makoto et al.Plasma sources science & technology (Print). 2002, Vol 11, Num 3A, pp A202-A205, issn 0963-0252Article

Innovative plasma diagnostics and control of process in reactive low-temperature plasmasKLICK, M; KAMMEYER, M; REHAK, W et al.Surface & coatings technology. 1998, Vol 98, Num 1-3, pp 1395-1399, issn 0257-8972Conference Paper

Synthesis, characterization, and rheological behavior of polyethylene glycols end-capped with fluorocarbon hydrophobesXU, B; LI, L; YEKTA, A et al.Langmuir. 1997, Vol 13, Num 9, pp 2447-2456, issn 0743-7463Article

New design of a plasma chamber for homogeneous web treatmentLEIBER, J; SELAFF, O; STEFFENS, F et al.Surface & coatings technology. 1995, Vol 74-75, Num 1-3, pp 49-54, issn 0257-8972, 1Conference Paper

CF₄ plasma treatment for preparing gas diffusion layers in membrane electrode assembliesPAI, Yi-Hao; KE, Jyh-Harng; HUANG, Hsin-Fu et al.Journal of power sources. 2006, Vol 161, Num 1, pp 275-281, issn 0378-7753, 7 p.Article

Hybrid cathode lithium batteries for implantable medical applicationsKAIMIN CHEN; MERRITT, Donald R; HOWARD, William G et al.Journal of power sources. 2006, Vol 162, Num 2, pp 837-840, issn 0378-7753, 4 p.Conference Paper

Processing and characterization of fluorinated amorphous carbon low-dielectric-constant filmsCHEN, Hung-Jen; CHANG, Shou-Yi; CHIUE, Hua-Chun et al.Journal of the Electrochemical Society. 2004, Vol 151, Num 11, pp F276-F282, issn 0013-4651Article

Measurements of electron transport coefficients in the 0.468% and 4.910% c-C₄F₈/Ar mixtures and pure c-C₄F₈YAMAJI, Masahiro; NAKAMURA, Yoshiharu.Journal of physics. D, Applied physics (Print). 2003, Vol 36, Num 6, pp 640-644, issn 0022-3727, 5 p.Article

Measurement of electron drift, diffusion, and effective ionization coefficients in the SF₆-CHF₃ and SF₆-CF₄ gas mixturesDE URQUIJO, J; BASURTO, E; HERNANDEZ-AVILA, J. L et al.Journal of physics. D, Applied physics (Print). 2003, Vol 36, Num 24, pp 3132-3137, issn 0022-3727, 6 p.Article

Two-dimensional modelling of CF₄ rf plasmas: periodic steady state, transient response after step change of power source voltage, and comparison with one-dimensional modellingSO, Soon-Youl; ODA, Akinori; SUGAWARA, Hirotake et al.Journal of physics. D, Applied physics (Print). 2002, Vol 35, Num 22, pp 2978-2987, issn 0022-3727, 10 p.Article

Development of high-density plasma reactor for high-performance processing and future prospectsSAMUKAWA, Seiji.Applied surface science. 2002, Vol 192, Num 1-4, pp 216-243, issn 0169-4332, 28 p.Conference Paper