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Results 1 to 25 of 17684

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Combinatorial initiated chemical vapor deposition (iCVD) for polymer thin film discoveryMARTIN, Tyler P; CHAN, Kelvin; GLEASON, Karen K et al.Thin solid films. 2008, Vol 516, Num 5, pp 681-683, issn 0040-6090, 3 p.Conference Paper

The grain size effect on the empirically determined erosion resistance of CVD-ZnSCHANG, C. S; HE, J. L; LIN, Z. P et al.Wear. 2003, Vol 255, Num 1, pp 115-120, issn 0043-1648, 6 p.Conference Paper

Spent FCC catalysts: An untapped resource of carbon nanotubes?CHEE HOWE SEE; HARRIS, Andrew T.AIChE journal. 2007, Vol 53, Num 8, pp 2198-2200, issn 0001-1541, 3 p.Article

Propylene epoxidation over Ti/MCM-41 catalysts prepared by chemical vapor depositionLI, Kuo-Tseng; LIN, Chia-Chieh.Catalysis today. 2004, Vol 97, Num 4, pp 257-261, issn 0920-5861, 5 p.Conference Paper

Single-layer CVD-grown graphene decorated with metal nanoparticles as a promising biosensing platformGUTES, Albert; CARRARO, Carlo; MABOUDIAN, Roya et al.Biosensors & bioelectronics. 2012, Vol 33, Num 1, pp 56-59, issn 0956-5663, 4 p.Article

Etch rates for micromachining processing: Part IIWILLIAMS, Kirt R; GUPTA, Kishan; WASILIK, Matthew et al.Journal of microelectromechanical systems. 2003, Vol 12, Num 6, pp 761-777, issn 1057-7157, 17 p.Article

Synthesis of non-agglomerated nanoparticles by an electrospray assisted chemical vapor deposition (ES-CVD) methodNAKASO, K; HAN, B; AHN, K. H et al.Journal of aerosol science. 2003, Vol 34, Num 7, pp 869-881, issn 0021-8502, 13 p.Article

Multiwalled carbon nanotube deposition profiles within a CVD reactor : An experimental studyKUNADIAN, Illayathambi; ANDREWS, Rodney; PINAR MENGÜC, M et al.Chemical engineering science. 2009, Vol 64, Num 7, pp 1503-1510, issn 0009-2509, 8 p.Article

Mass production of carbon nanotubes using spin-coating of nanoparticlesCHOI, G. S; CHO, Y. S; SON, K. H et al.Microelectronic engineering. 2003, Vol 66, Num 1-4, pp 77-82, issn 0167-9317, 6 p.Conference Paper

Particle Dynamics in a Chemical Vapor Deposition Reactor: A Multiscale ApproachSHARIFI, Yousef; ACHENIE, Luke.Industrial & engineering chemistry research. 2009, Vol 48, Num 13, pp 5969-5974, issn 0888-5885, 6 p.Article

Superhydrophobicity of polyvinylidene fluoride membrane fabricated by chemical vapor deposition from solutionZHENRONG ZHENG; ZHENYA GU; RUITING HUO et al.Applied surface science. 2009, Vol 255, Num 16, pp 7263-7267, issn 0169-4332, 5 p.Article

A mathematical model of the coupled fluid mechanics and chemical kinetics in a chemical vapor deposition reactorCOLTRIN, M. E; KEE, R. J; MILLER, J. A et al.Journal of the Electrochemical Society. 1984, Vol 131, Num 2, pp 425-434, issn 0013-4651Article

Zirconia coatings prepared by spray pyrolysisNGUYEN, D; VAN ROODE, M; SZE, W et al.Journal of the Canadian Ceramic Society. 1984, Vol 53, pp 34-38, issn 0068-8444Article

Chemical vapor deposition of copper thin films for multi-level interconnectionsCHO, Nam-Ihn; NAM, H. Gin; YONG CHOI et al.Microelectronic engineering. 2003, Vol 66, Num 1-4, pp 415-421, issn 0167-9317, 7 p.Conference Paper

Plasma-assisted vapor deposition processes and some applicationsBUNSHAH, R. F; DESHPANDEY, C. V.Surface technology. 1986, Vol 27, Num 1, pp 1-21, issn 0376-4583Article

Chemical Vapor Deposition for Solvent-Free Polymerization at SurfacesLUIS YAGÜE, Jose; COCLITE, Anna Maria; PETRUCZOK, Christy et al.Macromolecular chemistry and physics (Print). 2013, Vol 214, Num 3, pp 302-312, issn 1022-1352, 11 p.Article

Homojunction and heterojunction silicon solar cells deposited by low temperature-high frequency plasma enhanced chemical vapour depositionPLA, J; CENTURIONI, E; SUMMONTE, C et al.Thin solid films. 2002, Vol 405, Num 1-2, pp 248-255, issn 0040-6090Article

Characteristics of the etching of undoped silica in MCVD-fabricated optical fibers with buffered hydrofluoric acidHOPLAND, S.Materials research bulletin. 1985, Vol 20, Num 11, pp 1367-1372, issn 0025-5408Article

Performance Under Thermal and Hydrothermal Condition of Amorphous Silica Membrane Prepared by Chemical Vapor DepositionAKAMATSU, Kazuki; NAKANE, Masataka; SUGAWARA, Takashi et al.AIChE journal. 2009, Vol 55, Num 8, pp 2197-2200, issn 0001-1541, 4 p.Article

Directed Self-Assembly by Photostimulation of an Amorphous Semiconductor SurfaceKONDRATENKO, Yevgeniy V; SEEBAUER, Edmund G.AIChE journal. 2010, Vol 56, Num 12, pp 3206-3211, issn 0001-1541, 6 p.Article

Fabrication techniques for high-quality optical fibersARNAB SARKAR.Fiber and integrated optics. 1985, Vol 5, Num 2, pp 135-149, issn 0146-8030Article

Optimization of a Chemical Vapor Deposition Process Using Sequential Experimental DesignWISSMANN, Paul J; GROVER, Martha A.Industrial & engineering chemistry research. 2010, Vol 49, Num 12, pp 5694-5701, issn 0888-5885, 8 p.Article

Controlled pore opening of Ni/Al2O3 using chemical vapor deposition in a fluidized bed reactorBOATENG, Kenneth A; LINJIE HU; HILL, Josephine M et al.Industrial & engineering chemistry research. 2007, Vol 46, Num 3, pp 684-690, issn 0888-5885, 7 p.Article

Effective synthesis of single-walled carbon nanotubes using Ni-MCM-41 catalytic template through chemical vapor deposition methodSOMANATHAN, Thirunavukkarasu; PANDURANGAN, Arumugam.Industrial & engineering chemistry research. 2006, Vol 45, Num 26, pp 8926-8931, issn 0888-5885, 6 p.Article

Computational analysis and optimization of a chemical vapor deposition reactor with large-scale computingSALINGER, Andrew G; PAWLOWSKI, Roger P; SHADID, John N et al.Industrial & engineering chemistry research. 2004, Vol 43, Num 16, pp 4612-4623, issn 0888-5885, 12 p.Article

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