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Two families of centered zirconium cluster phases with M1,2M'Cl6.Zr6Cl12Z compositionsJIE ZHANG; CORBETT, J. D.Inorganic chemistry (Print). 1993, Vol 32, Num 9, pp 1566-1572, issn 0020-1669Article

Photoacoustic generation of anisotropic pressure waves through photodissociation of Cl2MARK, S. M; KHAN, M. I; DIEBOLD, G. J et al.Optics letters. 1990, Vol 15, Num 14, pp 771-773, issn 0146-9592, 3 p.Article

An X-ray diffraction study of liquid chlorineANDREANI, C; COLOGNESI, D; FILABOZZI, A et al.Molecular physics (Print). 1994, Vol 82, Num 6, pp 1181-1186, issn 0026-8976Article

Amplification in light-induced reaction of Cu with Cl2 in the VUVRAAF, H; GROEN, M; SCHWENTNER, N et al.Applied surface science. 2000, Vol 154-55, pp 536-541, issn 0169-4332Conference Paper

Transferability of nonbonded Cl....Cl potential energy function to crystalline chlorineWILLIAMS, D. E; LEH-YEH HSU.Acta crystallographica. Section A, Crystal physics, diffraction, theoretical and general crystallography. 1985, Vol 41, Num 3, pp 296-301, issn 0567-7394Article

The temperature dependence of the crystal structures of the solid halogens, bromine and chlorinePOWELL, B. M; HEAL, K. M; TORRIE, B. H et al.Molecular physics (Print). 1984, Vol 53, Num 4, pp 929-939, issn 0026-8976Article

Monitoring Cl2 using a differential absorption lidar systemEDNER, H; FREDRIKSSON, K; SUNESSON, A et al.Applied optics. 1987, Vol 26, Num 16, pp 3183-3185, issn 0003-6935Article

Optoacoustic detection of photodissociation and termolecular recombination in Cl2ÓCONNOR, M. T; DIEBOLD, G. J.The Journal of chemical physics. 1984, Vol 81, Num 2, pp 812-819, issn 0021-9606Article

Formation of molecular chlorine from the photolysis of ozone and aqueous sea-salt particlesOUM, K. W; LAKIN, M. J; DEHAAN, D. O et al.Science (Washington, D.C.). 1997, Vol 279, Num 5347, pp 74-77, issn 0036-8075Article

Molecular thermodynamics of free internal rotation versus harmonic torsional vibration formation of the complex Cl2-HF(g)SLANINA, Z.Thermochimica acta. 1991, Vol 178, pp 143-150, issn 0040-6031Article

Vibrational partial cross sections for photodissociation, calculated by the method of momentsIVANOV, V. S; SOVKOV, V. B.Optics and spectroscopy. 1991, Vol 70, Num 2, pp 178-179, issn 0030-400XArticle

The structure of chlorine gasSULLIVAN, J. D; EGELSTAFF, P. A.Chemical physics. 1983, Vol 82, Num 3, pp 479-488, issn 0301-0104Article

Etude numérique d'une décharge haute-fréquence dans les gaz électronégatifs de basse pressionBOJKO, V. V; MANKELEVICH, YU. A; RAKHIMOV, A. T et al.Fizika plazmy (Moskva, 1975). 1989, Vol 15, Num 2, pp 218-225, issn 0134-5052Article

Rôle de la réaction ClF2+Cl→2ClF au cours de la photolyse du monofluorure de chloreZHITNEVA, G. P.Kinetika i kataliz. 1985, Vol 26, Num 4, pp 799-803, issn 0453-8811Article

Electron attachment to Cl2MCCORKLE, D. L; CHRISTODOULIDES, A. A; CHRISTOPHOROU, L. G et al.Chemical physics letters. 1984, Vol 109, Num 3, pp 276-279, issn 0009-2614Article

Ion-enhanced gas-surface kinetics: the Si-Cl2-Ar+ systemROSSEN, R. A; SAWIN, H. H.Applied physics letters. 1984, Vol 45, Num 8, pp 860-862, issn 0003-6951Article

Rendements quantiques de luminescence de Cl2 en mélange avec des gaz tamponsBIBINOV, N. K; VINOGRADOV, I. P.Himiâ vysokih energij. 1984, Vol 18, Num 5, pp 448-450, issn 0023-1193Article

Time-dependent characteristics of the dielectric barrier discharge in Xe-Cl2 mixture and kinetics of the XeCl* moleculesAVTAEVA, Svetlana.The European physical journal. D, Atomic, molecular and optical physics (Print). 2014, Vol 68, Num 4, issn 1434-6060, 90.1-90.8Article

Controlling the branching ratio of the photodissociation of aligned Cl2 at 404 nmSUGITA, Akihiro; SUTO, Kunihiro; KAWASAKI, Masahiro et al.Chemical physics letters. 2001, Vol 340, Num 1-2, pp 83-88, issn 0009-2614Article

RF selfbias voltage and sheath width in inductively coupled chlorine plasmaSHINDO, H; FUKASAWA, T; NAKAMURA, A et al.Japanese journal of applied physics. 1995, Vol 34, Num 2A, pp 620-622, issn 0021-4922, 1Article

Etching of Si with Cl2 using an electron cyclotron resonance sourceSUNG, K. T; PANG, S. W.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 4, pp 1206-1210, issn 0734-2101, 1Conference Paper

Modeling of plasma-etch processes using well stirred reactor approximations and including complex gas-phase and surface reactions : Special issue on modeling and simulation of collisional low-temperature plasmasMEEKS, E; JONG WON SHON.IEEE transactions on plasma science. 1995, Vol 23, Num 4, pp 539-549, issn 0093-3813Article

Barrier-discharge excilamp on a mixture of krypton and molecular bromine and chlorineAVDEEV, S. M; BOICHENKO, A. M; SOSNIN, E. A et al.Laser physics. 2007, Vol 17, Num 9, pp 1119-1123, issn 1054-660X, 5 p.Article

A spatially-averaged model for high density dischargesMEYYAPPAN, M; GOVINDAN, T. R.Vacuum. 1996, Vol 47, Num 3, pp 215-220, issn 0042-207XArticle

UV-VUV excimer emitter pumped by a subnormal glow dischargeSHUAIBOV, A. K; DASHCHENKO, A. I; SHEVERA, I. V et al.Quantum electronics (Woodbury). 2001, Vol 31, Num 4, pp 371-372, issn 1063-7818Article

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