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kw.\*:("Cobre siliciuro")

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Results 1 to 25 of 33

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Damascene test structures for the evaluation of barrier layer performance against copper diffusionMOTTE, P; SWAANEN, M; TORRES, J et al.Microelectronic engineering. 2001, Vol 55, Num 1-4, pp 291-296, issn 0167-9317Conference Paper

Electrochemical characteristics of copper silicide-coated graphite as an anode material of lithium secondary batteriesKIM, In-Chul; BYUN, Dongjin; LEE, Sangwha et al.Electrochimica acta. 2006, Vol 52, Num 4, pp 1532-1537, issn 0013-4686, 6 p.Conference Paper

Na growth on Cu3Si and CH3Cl adsorption on a Na promoted Cu3Si surface : an XPS and AES studySAMSON, Y; TARDY, B; BERTOLINI, J. C et al.Surface science. 1995, Vol 339, Num 1-2, pp 159-170, issn 0039-6028Article

Deduction of a three-phase model for the (√3 x √3)R30°-Cu2Si/Cu(1 1 1) surface alloySHUTTLEWORTH, I. G.Applied surface science. 2009, Vol 256, Num 3, pp 636-639, issn 0169-4332, 4 p.Article

Addition of Cu for carbon coated si-based composites as anode materials for lithium-ion batteriesKIM, Jae-Hun; KIM, Hansu; SOHN, Hun-Joon et al.Electrochemistry communications. 2005, Vol 7, Num 5, pp 557-561, issn 1388-2481, 5 p.Article

Diffusion barrier performance of reactively sputtered Ta-W-N between Cu and SiYUZHANG LIU; SHUANGXI SONG; DALI MAO et al.Microelectronic engineering. 2004, Vol 75, Num 3, pp 309-315, issn 0167-9317, 7 p.Article

New insight into silicide formation: the creation of silicon self-interstitialRONAY, M; SCHAD, R. G; SCHAD et al.Physical review letters. 1990, Vol 64, Num 17, pp 2042-2045, issn 0031-9007Article

Enhancement of capacity of carbon-coated Si-Cu3Si composite anode using metal-organic compound for lithium-ion batteriesYOON, Sukeun; LEE, Sung-Il; KIM, Hansu et al.Journal of power sources. 2006, Vol 161, Num 2, pp 1319-1323, issn 0378-7753, 5 p.Article

Deactivation of CuSi and CuZnSnSi due to coke formation during the direct synthesis of methylchlorosilanesWESSEL, T. J; RETHWISCH, D. G.Journal of catalysis (Print). 1996, Vol 161, Num 2, pp 861-866, issn 0021-9517Article

Reactivity of Cu3Si of different genesis towards copper(I) chlorideSOUHA, H; BERNARD, F; GAFFET, E et al.Thermochimica acta. 2000, Vol 351, Num 1-2, pp 71-77, issn 0040-6031Article

Reactivity of commercial silicon and silicides towards copper(I) chloride. Effect of aluminium, calcium and iron on the formation of copper silicideGILLOT, B; WEBER, G; SOUHA, H et al.Journal of alloys and compounds. 1998, Vol 270, Num 1-2, pp 275-280, issn 0925-8388Article

Passivation of copper by silicide formation in dilute silaneHYMES, S; MURARKA, S. P; SHEPARD, C et al.Journal of applied physics. 1992, Vol 71, Num 9, pp 4623-4625, issn 0021-8979Article

Influence of atmosphere on the wettability of α-SiC by non-reactive Cu-Si alloysGASSE, A; CHAUMAT, G; RADO, C et al.Journal of materials science letters. 1996, Vol 15, Num 18, pp 1630-1632, issn 0261-8028Article

Influence of uniaxial pressure on the specific heat of CeCu2Si2 in the vicinity of the superconducting transitionHARMS, K.-R; EICHLER, A; ASSMUS, W et al.Solid state communications. 1992, Vol 84, Num 11, pp 1015-1018, issn 0038-1098Article

SEM-EDX and SAM-AES investigations on Rochow contact massesEHRICH, H; BORN, D; RICHTER, K et al.Applied organometallic chemistry. 1997, Vol 11, Num 3, pp 237-247, issn 0268-2605Article

η-Cu3Si percentage and particle size in various Rochow contact massesLIESKE, H; FICHTNER, H; KRETZSCHMAR, U et al.Applied organometallic chemistry. 1995, Vol 9, Num 8, pp 657-666, issn 0268-2605Article

Phase formation in Cu-Si and Cu-GeHONG, S. Q; COMRIE, C. M; RUSSELL, S. W et al.Journal of applied physics. 1991, Vol 70, Num 7, pp 3655-3660, issn 0021-8979Article

The effect of Zn promoter on enhanced diffusion during catalytic formation of methylchlorosilanesPOTOCHNIK, S. J; FALCONER, J. L.Journal of catalysis (Print). 1994, Vol 147, Num 1, pp 101-106, issn 0021-9517Article

Rôle des interfaces dans le brasage non réactif du SiC par les siliciures de Co et de Cu = Role of interfaces in the non reactive brazing of SiC by Co and Cu silicidesGasse, Adrien; Eustathopoulos, N.1996, 187 p.Thesis

Elaboration of the Cu3Si compound using a mechanically activated annealing processSOUHA, H; GAFFET, E; BERNARD, F et al.Journal of materials science. 2000, Vol 35, Num 13, pp 3221-3226, issn 0022-2461Article

Crystal-field excitations in CeCu2Si2GOREMYCHKIN, E. A; OSBORN, R.Physical review. B, Condensed matter. 1993, Vol 47, Num 21, pp 14280-14290, issn 0163-1829Article

Study of low-temperature oxidation in Au/Si and Cu/Si systems by 7 MeV alpha particle backscattering analysisJIAN LI; YONEZAWA, H; SHIGEMATSU, T et al.Japanese journal of applied physics. 1992, Vol 31, Num 3A, pp L210-L213, issn 0021-4922, 2Article

In situ observation of fractal growth during a-Si crystallization in a Cu3Si matrixRUSSELL, S. W; JIAN LI; MAYER, J. W et al.Journal of applied physics. 1991, Vol 70, Num 9, pp 5153-5155, issn 0021-8979Article

Roomm temperature oxidation of silicon induced by UV irradiation of Cu3SiJIAN LI; MAYER, J. W; MATIENZO, L. J et al.Materials chemistry and physics. 1992, Vol 32, Num 4, pp 390-393, issn 0254-0584Article

Unconventional superconductive and magnetism in a heavy fermion material CeCu2Si2OZAKI, M.-A; MACHIDA, K.Journal of the Physical Society of Japan. 1991, Vol 60, Num 5, pp 1452-1455, issn 0031-9015Article

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