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Dépôts chimiques à partir d'une phase gazeuse = Chemical vapor depositionAUDISIO, S.Métallurgie. sd, pp 1-12Book Chapter

Systematic control of the electrical conductivity of poly (3,4-ethylenedioxythiophene) via oxidative chemical vapor deposition (oCVD)SUNG GAP IM; OLIVETTI, Elsa A; GLEASON, Karen K et al.Surface & coatings technology. 2007, Vol 201, Num 22-23, pp 9406-9412, issn 0257-8972, 7 p.Conference Paper

Very high epitaxial growth rate of SiC using MTS as chloride-based precursorPEDERSEN, H; LEONE, S; HENRY, A et al.Surface & coatings technology. 2007, Vol 201, Num 22-23, pp 8931-8934, issn 0257-8972, 4 p.Conference Paper

A study of the effect of excessive free carbon on mean whisker diameters grown by chemical vapor depositionLIM, D. C; LEE, Y. J; CHOI, D. J et al.Surface & coatings technology. 2005, Vol 192, Num 2-3, pp 247-251, issn 0257-8972, 5 p.Article

Mechanisms of graphene growth by chemical vapour deposition on transition metalsSEAH, Choon-Ming; CHAI, Siang-Piao; ABDUL RAHMAN MOHAMED et al.Carbon (New York, NY). 2014, Vol 70, pp 1-21, issn 0008-6223, 21 p.Article

Controlling the growth of CVD carbon from methane on transition metal substratesLI, Wei-Na; DING, Yun-Shuang; SUIB, Steven L et al.Surface & coatings technology. 2005, Vol 190, Num 2-3, pp 366-371, issn 0257-8972, 6 p.Article

Proceedings of the 16th European Conference on Chemical Vapor Deposition (EUROCVD-16), The Hague, The Netherlands, September 16-21, 2007KLEIJN, Chris R.Surface & coatings technology. 2007, Vol 201, Num 22-23, issn 0257-8972, 655 p.Conference Proceedings

Third Asian Conference on Chemical Vapor Deposition (Third Asian-CVD), Taipei, Taiwan, November 12-14, 2004FENG, Zhe Chuan; CHEN, Chia-Fu; KUO, Cheng-Tzu et al.Surface & coatings technology. 2006, Vol 200, Num 10, issn 0257-8972, 290 p.Conference Proceedings

Electroless nickel: Q & A = Dépôt chimique de nickel: questions et réponsesMACKAY, H. A; ZAKI, N; BAUDRAND, D. W et al.Plating and surface finishing. 1986, Vol 73, Num 7, pp 32-37, issn 0360-3164Article

Electroless copper deposition on aluminum-seeded ABS plasticsDAPENG LI; GOODWIN, Kate; YANG, Chen-Lu et al.Journal of materials science. 2008, Vol 43, Num 22, pp 7121-7131, issn 0022-2461, 11 p.Article

High-quality copper deposited from electroless baths = Cuivre de haute qualité déposé à partir de bains chimiquesBLURTON, K. F.Plating and surface finishing. 1986, Vol 73, Num 1, pp 52-55, issn 0360-3164Article

Enhancing quality of carbons nanotubes through a real-time controlled CVD process with application to next-generation nanosystemsLAXMINARAYANA, K; JALILI, N.SPIE proceedings series. 2004, pp 135-146, isbn 0-8194-5306-4, 12 p.Conference Paper

Aligned and coiled carbon nanotubes by microwave chemical vapor depositionJINING XIE; VARADAN, Vijay K.SPIE proceedings series. 2004, pp 147-158, isbn 0-8194-5306-4, 12 p.Conference Paper

Au/nc-Si:H core―shell nanostructures prepared by hot wire assisted plasma enhanced chemical vapor deposition techniqueKEE WAH CHAN; BOON TONG GOH; SAADAH ABDUL RAHMAN et al.Surface & coatings technology. 2013, Vol 231, pp 394-398, issn 0257-8972, 5 p.Conference Paper

Effect of AC electric fields on the aerosol assisted chemical vapour deposition growth of titanium dioxide thin filmsROMERO, Luz; BINIONS, Russell.Surface & coatings technology. 2013, Vol 230, pp 196-201, issn 0257-8972, 6 p.Conference Paper

Preparation of carbon nanotubes by pyrolysis of dimethyl sulfideGAOHUI DU; YONGSHENG ZHOU; BINGSHE XU et al.Materials characterization. 2010, Vol 61, Num 4, pp 427-432, issn 1044-5803, 6 p.Article

Polyimide (PI) films by chemical vapor deposition (CVD) : Novel design, experiments and characterizationPUIG-PEY GONZALEZ, Jaime; LAMURE, Alain; SENOCQ, Francois et al.Surface & coatings technology. 2007, Vol 201, Num 22-23, pp 9437-9441, issn 0257-8972, 5 p.Conference Paper

UHV chemical vapour deposition of silicon nanowiresSCHMIDT, Volker; SENZ, Stephan; GÖSELE, Ulrich et al.Zeitschrift für Metallkunde. 2005, Vol 96, Num 5, pp 427-428, issn 0044-3093, 2 p.Conference Paper

Characterisation of thin SiO_x-layers on float glass deposited by Combustion Chemical Vapour Deposition (C-CVD)RÜFFER, Paul; HEFT, Andreas; LINKE, Ralf et al.Surface & coatings technology. 2013, Vol 232, pp 582-586, issn 0257-8972, 5 p.Article

Langasite crystal microbalance frequency behavior over wide gas phase conditions for chemical vapor depositionHABUKA, Hitoshi; MATSUI, Misako.Surface & coatings technology. 2013, Vol 230, pp 312-315, issn 0257-8972, 4 p.Conference Paper

Synthesis of nanostructured Pt/oxide catalyst particles by MOCVD process at ambient pressureFAUST, Matthias; ENDERS, Mirja; BRUNS, Michael et al.Surface & coatings technology. 2013, Vol 230, pp 284-289, issn 0257-8972, 6 p.Conference Paper

Thermochromic vanadium dioxide thin films from electric field assisted aerosol assisted chemical vapour depositionWARWICK, Michael E. A; RIDLEY, Ian; BINIONS, Russell et al.Surface & coatings technology. 2013, Vol 230, pp 163-167, issn 0257-8972, 5 p.Conference Paper

Chemical vapor deposition of rhenium on a gourd shaped graphite substrateLI'AN ZHU; SHUXIN BAI; KE CHEN et al.Surface & coatings technology. 2012, Vol 206, Num 23, pp 4940-4946, issn 0257-8972, 7 p.Article

Nb₂O₅ coating of glass fibres applied by chemical vapour depositionDA SILVEIRA, C. B; DE OLIVEIRA, A. F; DE CAMPOS, S. D et al.Surface engineering. 2012, Vol 28, Num 1, pp 68-72, issn 0267-0844, 5 p.Article