Pascal and Francis Bibliographic Databases


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Results 1 to 25 of 26961

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Diamond science and technology: Diversity and maturitySWAIN, Greg M.The Electrochemical Society interface. 2003, Vol 12, Num 1, issn 1064-8208, 21, 54 [2 p.]Article

Proceedings of the 16th European Conference on Chemical Vapor Deposition (EUROCVD-16), The Hague, The Netherlands, September 16-21, 2007KLEIJN, Chris R.Surface & coatings technology. 2007, Vol 201, Num 22-23, issn 0257-8972, 655 p.Conference Proceedings

Third Asian Conference on Chemical Vapor Deposition (Third Asian-CVD), Taipei, Taiwan, November 12-14, 2004FENG, Zhe Chuan; CHEN, Chia-Fu; KUO, Cheng-Tzu et al.Surface & coatings technology. 2006, Vol 200, Num 10, issn 0257-8972, 290 p.Conference Proceedings

Aligned array FETs as a route towards THz nanotube transistorsZHEN YU; BURKE, Peter J.Proceedings of SPIE, the International Society for Optical Engineering. 2005, pp 246-253, issn 0277-786X, isbn 0-8194-5775-2, 1Vol, 8 p.Conference Paper

Enhancing quality of carbons nanotubes through a real-time controlled CVD process with application to next-generation nanosystemsLAXMINARAYANA, K; JALILI, N.SPIE proceedings series. 2004, pp 135-146, isbn 0-8194-5306-4, 12 p.Conference Paper

Aligned and coiled carbon nanotubes by microwave chemical vapor depositionJINING XIE; VARADAN, Vijay K.SPIE proceedings series. 2004, pp 147-158, isbn 0-8194-5306-4, 12 p.Conference Paper

Carbon nanoflake growth from carbon nanotubes by hot filament chemical vapor depositionSAHOO, Subasa C; MOHAPATRA, Dipti R; LEE, Hak-Joo et al.Carbon (New York, NY). 2014, Vol 67, pp 704-711, issn 0008-6223, 8 p.Article

Characteristics of the etching of undoped silica in MCVD-fabricated optical fibers with buffered hydrofluoric acidHOPLAND, S.Materials research bulletin. 1985, Vol 20, Num 11, pp 1367-1372, issn 0025-5408Article

Fabrication techniques for high-quality optical fibersARNAB SARKAR.Fiber and integrated optics. 1985, Vol 5, Num 2, pp 135-149, issn 0146-8030Article

Influence of a modulated magnetic field on the behavior of particulates in silane plasma CVDYANG, S.-C; MAEMURA, Y; TAZOE, K et al.Surface & coatings technology. 1997, Vol 97, Num 1-3, pp 366-371, issn 0257-8972Conference Paper

Particle Dynamics in a Chemical Vapor Deposition Reactor: A Multiscale ApproachSHARIFI, Yousef; ACHENIE, Luke.Industrial & engineering chemistry research. 2009, Vol 48, Num 13, pp 5969-5974, issn 0888-5885, 6 p.Article

Superhydrophobicity of polyvinylidene fluoride membrane fabricated by chemical vapor deposition from solutionZHENRONG ZHENG; ZHENYA GU; RUITING HUO et al.Applied surface science. 2009, Vol 255, Num 16, pp 7263-7267, issn 0169-4332, 5 p.Article

Parametric study of synthesis conditions in plasma-enhanced CVD of high-quality single-walled carbon nanotubesMASCHMANN, Matthew R; AMAMA, Placidus B; GOYAL, Amit et al.Carbon (New York, NY). 2006, Vol 44, Num 1, pp 10-18, issn 0008-6223, 9 p.Article

Formation and emission spectroscopy of laser generated nanoparticlesHESZLER, P; ELIHN, K; LANDSTRÖM, L et al.SPIE proceedings series. 2001, pp 251-262, isbn 0-8194-4320-4Conference Paper

Yellow photoluminescence in MOCVD-grown n-type GaNSCHUBERT, E. F; GRIESHABER, W; BOUTROS, K. S et al.SPIE proceedings series. 1998, pp 59-68, isbn 0-8194-2718-7Conference Paper

Métallisation de matériaux composites organiques par dépôt chimique en phase vapeur à partir de sources organométalliques = Metallization of organic composites materials by chemical vapour deposition using organometallic sourcesFau-Canillac, Florence; Maury, Francis.1992, 129 p.Thesis

Effect of Ar gas addition on AlN film formation by microwave plasma chemical vapor depositionSOMENO, Y; SASAKI, M; HIRAI, T et al.Japanese journal of applied physics. 1991, Vol 30, Num 4, pp 790-795, issn 0021-4922, 1Article

Observations and analyses of microstructural defects for chemical vapour deposited β-SiC by transmission electron microscopyYANG-MING LU; MIN-HSIUNG HON; WHAI-YUH LIN et al.Journal of materials science. 1991, Vol 26, Num 22, pp 6091-6096, issn 0022-2461Article

A mathematical model of the coupled fluid mechanics and chemical kinetics in a chemical vapor deposition reactorCOLTRIN, M. E; KEE, R. J; MILLER, J. A et al.Journal of the Electrochemical Society. 1984, Vol 131, Num 2, pp 425-434, issn 0013-4651Article

Promoter-assisted chemical vapor deposition of grapheneHSIEH, Ya-Ping; HOFMANN, Mario; JING KONG et al.Carbon (New York, NY). 2014, Vol 67, pp 417-423, issn 0008-6223, 7 p.Article

Deposition and properties of silicon oxynitride films with low propagation losses by inductively coupled PECVD at 150 °CRANGARAJAN, Balaji; KOVALGIN, Alexey Y; SCHMITZ, Jurriaan et al.Surface & coatings technology. 2013, Vol 230, pp 46-50, issn 0257-8972, 5 p.Conference Paper

Combined growth of carbon nanotubes and carbon nanowalls by plasma-enhanced chemical vapor depositionMALESEVIC, Alexander; VIZIREANU, Sorin; KEMPS, Raymond et al.Carbon (New York, NY). 2007, Vol 45, Num 15, pp 2932-2937, issn 0008-6223, 6 p.Article

Ferroelectric PbTiO3 films grown by pulsed liquid injection MOCVDBARTASYTE, A; BOUREGBA, R; SALTYTE, Z et al.Surface & coatings technology. 2007, Vol 201, Num 22-23, pp 9340-9344, issn 0257-8972, 5 p.Conference Paper

Laser assisted chemical vapor deposition synthesis of carbon nanotubes and their characterizationBONDI, S. N; LACKEY, W. J; JOHNSON, R. W et al.Carbon (New York, NY). 2006, Vol 44, Num 8, pp 1393-1403, issn 0008-6223, 11 p.Article

Growth of multiwalled carbon nanotubes during the initial stages of aerosol-assisted CCVDPINAULT, M; MAYNE-L'HERMITE, M; REYNAUD, C et al.Carbon (New York, NY). 2005, Vol 43, Num 14, pp 2968-2976, issn 0008-6223, 9 p.Article

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