INFLUENCE OF APPARATUS GEOMETRY AND DEPOSITION CONDITIONS ON THE STRUCTURE AND TOPOGRAPHY OF THICK SPUTTERED COATINGSTHORNTON JA.1974; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1974; VOL. 11; NO 4; PP. 666-670; BIBL. 30 REF.; (CONF. STRUCT. PROP. RELATIONSHIPS THICK FILMS BULK COATINGS. PROC.; SAN FRANCISCO; 1974)Conference Paper

EFFECT OF ION BOMBARDMENT DURING DEPOSITION ON THICK METAL AND CERAMIC DEPOSITSBLAND RD; KOMINIAK GJ; MATTOX DM et al.1974; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1974; VOL. 11; NO 4; PP. 671-674; BIBL. 12 REF.; (CONF. STRUCT. PROP. RELATIONSHIPS THICK FILMS BULK COATINGS. PROC.; SAN FRANCISCO; 1974)Conference Paper

SOME COMMENTS ON NEW TECHNIQUE OF ION PLATINGNAKAI T; OHMAE N; TSUKIZOE T et al.1974; BULL. JAP. SOC. PRECIS. ENGNG; JAP.; DA. 1974; VOL. 8; NO 1; PP. 17-18; BIBL. 2 REF.Article

ION PLATINGSPALVINS T.1973; S.A.E. TRANS.; U.S.A.; DA. 1973; VOL. 82; NO 3; PP. 1806-1812; BIBL. 9 REF.Article

TRIBOLOGIE DES FILMS METALLIQUES DEPOSES PAR BOMBARDEMENT IONIQUETSUKIZOE T; NAKAI T.1974; J. JAP. SOC. LUBRICAT. ENGRS; JAP.; DA. 1974; VOL. 19; NO 11; PP. 838-842; ABS. ANGL.; BIBL. 13 REF.Article

SYMPOSIUM IONENZERSTAEUBURG VON 25.BIS 27. SEPTEMBER 1973 IN KARL-MARX-STADT = ACTES DU SYMPOSIUM SUR LA VAPORISATION SOUS VIDE PAR FAISCEAU D'IONS, DU 25 AU 27 SEPTEMBRE 1973 A KARL-MARX-STADT, RDAsdKARL-MARX-STADT; TECH. HOCHSCH.; PP. 1-297; BIBL. DISSEM.Conference Proceedings

THE INTERACTION OF LOW ENERGY ION BEAMS WITH SURFACES = L'INTERACTION DES FAISCEAUX D'IONS DE FAIBLE ENERGIE AVEC LES SURFACESCARTER G; ARMOUR DG.1981; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1981; VOL. 80; NO 1-3; PP. 13-29; BIBL. 42 REF.Conference Paper

HIGH RATE SPUTTERING TECHNIQUES = TECHNIQUES PULVERISATION A GRANDE VITESSETHORNTON JA.1981; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1981; VOL. 80; NO 1-3; PP. 1-11; BIBL. 46 REF.Conference Paper

SURFACE COATING BY IONIC BOMBARDMENT = DEPOT PAR BOMBARDEMENT IONIQUE1982; SURFG J.; ISSN 0307-7365; GBR; DA. 1982; VOL. 13; NO 1; PP. 14-17; LOC. ISArticle

ETUDE ET CARACTERISATION DE L'ION PLATING POUR LA REALISATION INDUSTRIELLE DE COMPOSANTS ELECTRONIQUES = STUDY AND CHARACTERIZATION OF ION PLATING FOR THE INDUSTRIAL PRODUCTION OF ELECTRONIC COMPONENTSGRANDCLEMENT G; JOURDAIN P; VIEILLEDENT G et al.1982; ; FRA; DA. 1982; DGRST/80 7 0605; 71 P.; 31 CM; ACTION CONCERTEE: COMPOSANTS PASSIFSReport

THICK ION-VAPOR-DEPOSITED ALUMINUM COATINGS FOR IRREGULARLY SHAPED AIRCRAFT AND SPACECRAFT PARTSSTEUBE KE; MCCRARY LE.1974; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1974; VOL. 11; NO 1; PP. 362-365; BIBL. 12 REF.; (20TH NATL SYMP. AM. VAC. SOC. 11TH CONF. MICROBALANCE TECH. PROC.; NEW YORK; 1973)Conference Paper

CHEMICAL VAPOUR DEPOSITION FROM AN AEROSOLVIGUIE JC.1974; IN: SCI. TECHNOL. SURF. COATING. NATO ADV. STUDY INST.; LONDON; 1972; LONDON; ACAD. PRESS; DA. 1974; PP. 169-175; BIBL. 3 REF.Conference Paper

THE SURFACE OXIDATION OF ION-BOMBARDED NIMN ALLOYKRASEVEC V; NAVINSEK B.1974; SURF. SCI.; NETHERL.; DA. 1974; VOL. 45; NO 1; PP. 39-44; BIBL. 8 REF.Article

CHARACTERIZATION OF ALUMINIUM COATINGS DEPOSITED IN A HOLLOW-CATHODE DISCHARGE = CARACTERISATION DES REVETEMENTS D'ALUMINIUM DEPOSES DANS LA DECHARGE D'UNE CATHODE CREUSEAHMED NAG; TEER DG.1981; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1981; VOL. 80; NO 1-3; PP. 49-54; BIBL. 9 REF.Conference Paper

ION PLATING BY FIELD EMISSION DEPOSITION = DEPOT PAR BOMBARDEMENT IONIQUE AVEC CHAMP ELECTRIQUECLAMPITT R.1979; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1979; VOL. 64; NO 3; PP. 471-478; BIBL. 43 REF.Conference Paper

COMPOSITION PROFILE OF ION-PLATED AU FILM ON CU ANALYZED BY AES AND SIMS DURING XE ION BOMBARDMENTNARUSAWA T; KOMIYA S.1974; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1974; VOL. 11; NO 1; PP. 312-316; BIBL. 15 REF.; (20TH NATL SYMP. AM. VAC. SOC. 11TH CONF. MICROBALANCE TECH. PROC.; NEW YORK; 1973)Conference Paper

ELLIPSOMETRIC EXAMINATION OF ION-PLATED CHROMIUM FILMS IN THE VISIBLE SPECTRAL RANGE = EXAMEN PAR ELLIPSOMETRIE DE COUCHES MINCES DE CHROME PREPAREES PAR PLAQUAGE IONIQUE DANS LE DOMAINE DU SPECTRE VISIBLEIDCZAK E; OLESZKIEWICZ E; TANCULA M et al.1980; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1980; VOL. 72; NO 3; PP. L21-L23; BIBL. 11 REF.Article

DEPTH PROFILING OF AN ION PLATED INTERFACE BY ION SCATTERING SPECTROMETRYHOFFMAN DW; NIMMAGADDA R.1974; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1974; VOL. 11; NO 4; PP. 657-662; BIBL. 11 REF.; (CONF. STRUCT. PROP. RELATIONSHIPS THICK FILMS BULK COATINGS. PROC.; SAN FRANCISCO; 1974)Conference Paper

THE STRUCTURE OF ALUMINUM BRONZE COATINGS DEPOSITED BY ION PLATINGMINNI E; SUNDQUIST H.1981; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1981; VOL. 80; NO 1-3; PP. 55-61; BIBL. 6 REF.Conference Paper

PROCEEDINGS/IPAT 79, ION PLATING AND ALLIED TECHNIQUES, INTERNATIONAL CONFERENCE, LONDON, JULY 1979 = DEPOTS PAR BOMBARDEMENT IONIQUE ET TECHNIQUES SIMILAIRES, CONFERENCE INTERNATIONALE, LONDRES, JUILLET 19791979; IPAT 79. ION PLATING AND ALLIED TECHNIQUES. INTERNATIONAL CONFERENCE./1979-07/LONDRES; GBR; EDINBURGH: CEP CONSULTANTS; DA. 1979; V-283 P.: ILL.; 30 CM; BIBL. DISSEM.Conference Proceedings

TRAITEMENTS SUPERFICIELS: LA DEPOSITION IONIQUE = SURFACE TREATMENT: ION BEAM COATINGDUBUS A.1979; C.E.T.I.M. INFORM.; FRA; DA. 1979; NO 63; PP. 56-57Article

EIGENSCHAFTEN VON NACH DEM ION-PLATING-VERFAHEEN HERGESTELLTEN TI2N-SCHICHTEN = PROPERTIES OF TI₂N-LAYERS PRODUCED BY ION-PLATING = PROPRIETES DES COUCHES DE TI₂N PREPAREES PAR PLACAGE IONIQUEBARANY I; KIENEL G.1979; VAKUUM-TECH.; DEU; DA. 1979; VOL. 28; NO 6; PP. 168-172; ABS. ENG/FRE; BIBL. 7 REF.Article

ION VAPOR DEPOSITED ALUMINIUM COATINGS FOR IMPROVED CORROSION PROTECTION = DEPOTS D'AL PAR BOMBARDEMENT IONIQUE POUR AMELIORER LA PROTECTION CONTRE LA CORROSIONFANNIN ER.1979; A.G.A.R.D. CONF. PROC.; FRA; DA. 1979; NO 256; PP. 1-8; BIBL. 7 REF.Article

NEW DEVELOPMENTS IN IONIZED-CLUSTER BEAM AND REACTIVE IONIZED-CLUSTER BEAM DEPOSITION TECHNIQUES = NOUVEAUX DEVELOPPEMENTS DANS LES DEPOTS IONIQUES A AMAS D'IONS ET A AMAS D'IONS REACTIFS (TECHNIQUES ICB ET R-ICB)TAKAGI T; MATSUBARA K; TAKAOKA H et al.1979; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1979; VOL. 63; NO 1; PP. 41-51; BIBL. 32 REF.Conference Paper

VEREINFACHTE IONENQUELLE FUER VIELE ZWECKE = SOURCE IONIQUE SIMPLIFIEE POUR DIVERS USAGESBOLTZ CL.1973; Z. WIRTSCH. FERTIG.; DTSCH.; DA. 1973; VOL. 68; NO 4; PP. 212-213Serial Issue