Effect of time-dependent development process on the limit of proximity exposure compensation in electron beam lithographyDESHMUKH, P. R; KHOKLE, W. S.Microelectronics and reliability. 1991, Vol 31, Num 6, pp 1091-1096, issn 0026-2714Article

Simulation of resist profiles in single and triple layer electron beam lithographyDESHMUKH, P. R; RAJA, N. K. L; KHOKLE, W. S et al.Microelectronics. 1987, Vol 18, Num 6, pp 32-38, issn 0026-2692Article

Fabrication of damage free micropatterns in siliconGUPTA, R. P; DESHMUKH, P. R; KHOKLE, W. S et al.Microelectronics and reliability. 1984, Vol 24, Num 4, pp 623-624, issn 0026-2714Article

A new approach for the preparation of in situ superconducting BSCCO filmsAJAY AGARWAL; GUPTA, R. P; KHOKLE, W. S et al.Superconductor science & technology (Print). 1993, Vol 6, Num 9, pp 670-673, issn 0953-2048Article

Proximity exposure compensation and resit debris formation in electron beam lithographyDESHMUKH, P. R; SINGH, M; RANGRA, K. J et al.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1992, Vol 10, Num 1, pp 179-182, issn 0734-211XConference Paper

On the Monte Carlo simulation program «RESIS» for electron exposure of resistsDESHMUKH, P. R; KHOKLE, W. S.Solid-state electronics. 1989, Vol 32, Num 4, pp 261-268, issn 0038-1101Article

Microwave assisted chemical bath deposited polyaniline films for supercapacitor applicationDESHMUKH, P. R; PUSAWALE, S. N; JAMADADE, V. S et al.Journal of alloys and compounds. 2011, Vol 509, Num 16, pp 5064-5069, issn 0925-8388, 6 p.Article

Micromachining of single crystal silicon in Fluorine based reactive plasma for the fabrication of high density nano-tip field-emitter arraysPANT, B. D; DESHMUKH, P. R; RANGRA, K. J et al.SPIE proceedings series. 2002, pp 1344-1347, isbn 0-8194-4500-2, 2VolConference Paper

Phenomenon of resist debris formation in electron beam lithography and its possible applicationDESHMUKH, P. R; RANGRA, K. J; SINGH, M et al.Vacuum. 1996, Vol 47, Num 11, pp 1305-1311, issn 0042-207XConference Paper

On proximity exposure compensation in electron-beam lithographyDESHMUKH, P. R; KHOKLE, W. S.I.E.E.E. transactions on electron devices. 1989, Vol 36, Num 9, pp 2011-2017, issn 0018-9383, 7 p., 2Article

Photosensitive nanostructured Ti0₂ grown at room temperature by novel bottom-up approached CBD methodPATIL, U. M; KULKARNI, S. B; DESHMUKH, P. R et al.Journal of alloys and compounds. 2011, Vol 509, Num 21, pp 6196-6199, issn 0925-8388, 4 p.Article

Newly Developed WHO Growth Standards : Implications for Demographic Surveys and Child Health ProgramsDESHMUKH, P. R; DONGRE, A. R; GUPTA, S. S et al.Indian journal of pediatrics. 2007, Vol 74, Num 11, pp 987-990, issn 0019-5456, 4 p.Article

Nutritional status of adolescents in rural wardhaDESHMUKH, P. R; GUPTA, S. S; BHARAMBE, M. S et al.Indian journal of pediatrics. 2006, Vol 73, Num 2, pp 139-141, issn 0019-5456, 3 p.Article

On simulation of resist profiles in electron beam lithographyDESHMUKH, P. R; RAJA, N. K. L; KHOKLE, W. S et al.Microelectronics and reliability. 1988, Vol 28, Num 2, pp 223-228, issn 0026-2714Article

On dose correction in electron beam lithographyDESHMUKH, P. R; KHOKLE, W. S.Journal of applied physics. 1988, Vol 64, Num 1, pp 421-423, issn 0021-8979, 3 p.Article