A STUDY OF ELECTRON BEAM EXSPOSURE OF POSITIVE RESISTS.ERSOY O.1975; OPTIK; DTSCH.; DA. 1975; VOL. 41; NO 5; PP. 479-487; ABS. ALLEM.; BIBL. 6 REF.Article

PHOTORESIST DEVELOPMENT BY PLASMAHUGHES HG; GOODNER WR; WOOD TE et al.1980; POLYM. ENG. SCI.; ISSN 0032-3888; USA; DA. 1980; VOL. 20; NO 16; PP. 1093-1096; BIBL. 7 REF.Article

DEVELOPER TEMPERATURE EFFECTS ON E-BEAM AND OPTICALLY EXPOSED POSITIVE PHOTORESISTSHAW JM; HATZAKIS M.1979; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1979; VOL. 126; NO 11; PP. 2026-2031; BIBL. 8 REF.Article

FORECAST OF VLSI PROCESSING - A HISTORICAL REVIEW OF THE FIRST DRY-PROCESSED ICPENN TC.1979; I.E.E.E. TRANS. ELECTRON DEVICES; USA; DA. 1979; VOL. 26; NO 4; PP. 640-643; BIBL. 8 REF.Article

TECHNIQUES DE PHOTOGRAVUREBONNEL M.1972; REV. TECH. THOMSON-CSF.; FR.; DA. 1972; VOL. 4; NO 4; PP. 833-856; ABS. ANGL. ALLEM.; BIBL. 4 REF.Serial Issue