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HYDROGEN CHEMISORPTION ON TUNGSTEN (110) STUDIED BY CORE LEVEL SPECTROSCOPYGUILLOT C; TREGLIA G; LECANTE J et al.1983; JOURNAL OF PHYSICS. C. SOLID STATE PHYSICS; ISSN 0022-3719; GBR; DA. 1983; VOL. 16; NO 8; PP. 1555-1566; BIBL. 23 REF.Article

THE SPATIAL DISTRIBUTION OF IONS IMPLANTED INTO SOLIDS SUBJECT TO DIFFUSION, LOCAL TRAPPING AND SURFACE SPUTTERING.CARTER G; COLLINS R.1976; RAD. EFFECTS; G.B.; DA. 1976; VOL. 28; NO 1-2; PP. 123-125; BIBL. 2 REF.Article

A SOLID PLANAR SOURCE FOR PHOSPHORUS DIFFUSION.METZ DM; STACH J; JONES N et al.1976; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1976; VOL. 123; NO 10; PP. 1565-1569; BIBL. 12 REF.Article

MESURE DU COEFFICIENT DE DIFFUSION CHIMIQUE DANS LES OXYDES PAR LA METHODE DE RELAXATION.MORIN F.1975; CANAD. METALLURG. QUART.; CANADA; DA. 1975; VOL. 14; NO 2; PP. 97-104; ABS. ANGL.; BIBL. 22 REF.Article

ELEKTROCHEMISCHE UNTERSUCHUNG DER CHEMISCHEN DIFFUSION IN WUESTIT MIT HILFE EINES OXIDISCHEN FESTELEKTROLYTEN. = ETUDE ELECTROCHIMIQUE DE LA DIFFUSION CHIMIQUE DANS LA WUSTITE AU MOYEN D'UN OXYDE ELECTROLYTE SOLIDERICKERT H; WEPPNER W.1974; Z. NATURFORSCH., A; DTSCH.; DA. 1974; VOL. 29; NO 12; PP. 1849-1859; ABS. ANGL.; BIBL. 59 REF.Article

DIFFUSION OF BR-IONS IN KCL-KBR MIXED CRYSTALSPEHKONEN S.1973; J. PHYS. D; G.B.; DA. 1973; VOL. 6; NO 5; PP. 538-543; BIBL. 10 REF.Serial Issue

WORK FUNCTION AND CHEMICAL DIFFUSION OF NONSTOICHROMETRIC OXIDE MATERIALSADAMCZYK Z; NOWOTNY J.1980; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1980; VOL. 127; NO 5; PP. 1112-1116; BIBL. 17 REF.Article

SURFACE DIFFUSION CAPTURE IN NUCLEATION THEORY.LEWIS B; HALPERN V.1976; J. CRYST. GROWTH; NETHERL.; DA. 1976; VOL. 33; NO 1; PP. 39-52; BIBL. 48 REF.Article

CINETIQUE DES SURFACES DE DIFFUSION ET FORMATION DE GERMES. IITOCHITSKIJ EH I; TKHAREV VE.1975; VESCI AKAD. NAVUK B.S.S.R., FIZ.-TEKH. NAVUK; S.S.S.R.; DA. 1975; NO 4; PP. 15-18; BIBL. 4 REF.Article

IMPURITY CONCENTRATION PROFILE IN IRRADIATION ENHANCED DIFFUSION EXPERIMENTS.ST PETERS MA; PEAK D; CORBETT JW et al.1974; PHYS. LETTERS, A; NETHERL.; DA. 1974; VOL. 49; NO 2; PP. 159-160; BIBL. 10 REF.Article

STUDIES OF THE PUSH-OUT EFFECT IN SILICON. II. THE EFFECT OF PHOSPHORUS EMITTER DIFFUSION ON GALLIUM-BASE PROFILES, DETERMINED BY RADIO-TRACER TECHNIQUES.JONES CL; WILLOUGHBY AFW.1976; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1976; VOL. 123; NO 10; PP. 1531-1538; BIBL. 40 REF.Article

REDISTRIBUTION OF COPPER IN GERMANIUM INDUCED BY A CONTACTING LIQUID METAL LAYER.SZEP IC.1975; ACTA TECH. ACAD. SCI. HUNGAR.; HONGR.; DA. 1975; VOL. 80; NO 1-2; PP. 193-203; ABS. ALLEM. RUSSE; BIBL. 23 REF.Article

THEORIE PHENOMENOLOGIQUE ET THEORIE ATOMIQUE DE LA DIFFUSION CHIMIQUE. RELATIONS D'ONSAGER.PEDRO GOMEZ J; REMY C; CALAIS D et al.1975; RAPP. C.E.A.; FR.; DA. 1975; NO 4719; PP. 1-17; ABS. ANGL.; BIBL. 5 REF.Serial Issue

EFFET DES PROCESSUS DE FORMATION ET DE MOUVEMENT DES DISLOCATIONS SUR LA DIFFUSION DES IMPURETES DANS LE SILICIUMZAVODYAN AV; VIGDOROVICH VN; ELYUKHIN VA et al.1975; IZVEST. VYSSH. UCHEBN. ZAVED., RADIOELEKTRON.; S.S.S.R.; DA. 1975; VOL. 18; NO 12; PP. 38-41; BIBL. 10 REF.Article

A FINITE DIFFERENCE METHOD FOR THE DETERMINATION OF DIFFUSION COEFFICIENT.TURUNEN MJ.1975; PHYS. STATUS SOLIDI, A; ALLEM.; DA. 1975; VOL. 31; NO 2; PP. 489-493; ABS. ALLEM.; BIBL. 2 REF.Article

IMPURITY DISTRIBUTION IN THE DIFFUSED LAYERS IN SILICON.SHARMA RS.1974; INDIAN J. PHYS.; INDIA; DA. 1974; VOL. 48; NO 7; PP. 641-646; BIBL. 2 REF.Article

DIFFUSION DES ELEMENTS CHIMIQUES DANS LES ENVELOPPES STELLAIRESPAMYATNYKH AA.1974; ASTR. SOVET AKAD. NAUK S.S.S.R., NAUCH. INFORM.; S.S.S.R.; DA. 1974; NO 32; PP. 104-115; ABS. ANGL.; BIBL. 9 REF.Article

CHEMICAL DIFFUSION IN INTERMEDIATE PHASES IN THE LITHIUM-SILICON SYSTEMWEN CJ; HUGGINS RA.1981; J. SOLID STATE CHEM.; ISSN 0022-4596; GBR; DA. 1981; VOL. 37; NO 3; PP. 271-278; BIBL. 37 REF.Article

CERTAINES ERREURS SYSTEMATIQUES DE MESURE DU COEFFICIENT DE DIFFUSION D'UN GAZ DANS UN SOLIDEVAN'KOVICH RI; SEMCHISHIN IV.1976; FIZ.-KHIM. MEKH. MATER., U.S.S.R.; S.S.S.R.; DA. 1976; VOL. 12; NO 1; PP. 55-60; BIBL. 17 REF.Article

DETERMINATION OF DIFFUSION PROFILES IN THIN FILM COUPLES BY MEANS OF X-RAY-DIFFRACTION.WAGENDRISTEL A.1975; APPL. PHYS.; GERM.; DA. 1975; VOL. 7; NO 3; PP. 175-179; BIBL. 22 REF.Article

INTERDIFFUSION IN SEMICONDUCTING OXIDE SOLID SOLUTIONS.COOPER AR.1975; J. AMER. CERAM. SOC.; U.S.A.; DA. 1975; VOL. 58; NO 9-10; PP. 413-415; BIBL. 16 REF.Article

PHOSPHORUS DIFFUSION IN SILICON FREE FROM THE SURFACE EFFECT UNDER EXTRINSIC CONDITIONS.MATSUMOTO S; ARAI E; NAKAMURA H et al.1975; JAP. J. APPL. PHYS.; JAP.; DA. 1975; VOL. 14; NO 11; PP. 1665-1672; BIBL. 14 REF.Article

VERIFICATION OF CRYSTAL GROWTH RATE EQUATIONS.GARSIDE J; JANSSEN VAN ROSMALEN R; BENNEMA P et al.1975; J. CRYST. GROWTH; NETHERL.; DA. 1975; VOL. 29; NO 3; PP. 353-366; BIBL. 30 REF.Article

POTENTIEL INDUIT PAR LA DIFFUSION DE L'HYDROGENE DANS LE PALLADIUM.MARECHE JF; RAT YC; HEROLD A et al.1975; C.R. ACAD. SCI., C; FR.; DA. 1975; VOL. 281; NO 2; PP. 449-451; ABS. ANGL.; BIBL. 15 REF.Article

ZUM EINFLUSS DES FESTKOERPERLIGANDENAUSTAUSCHS AUF DIE DIFFUSION VON RADIOJODID IN K2(RECL6)-EINKRISTALLEN. = INFLUENCE DE L'ECHANGE DE COORDINATS DANS LE CORPS SOLIDE SUR LA DIFFUSION D'IODE RADIOACTIF DANS LES MONOCRISTAUX DE K2(RECL6)ROSSLER K; JANLEN KH.1975; BER. BUNSENGESELLSCH. PHYS. CHEM.; DTSCH.; DA. 1975; VOL. 79; NO 11; PP. 1001-1002; ABS. ANGL.; BIBL. 2 REF.Article

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