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THE QUASI-2 DIMENSIONAL SYSTEM IN MOS-STRUCTURESDORDA G.1978; PHYS. SCRIPTA; SWE; DA. 1978; VOL. 18; NO 6; PP. 415-416; BIBL. 47 REF.Article

EFFECT OF THE ELECTRON TEMPERATURE ON THE GATE-INDUCED CHARGE IN SMALL SIZE MOS TRANSISTORSLEBURTON JP; DORDA G.1983; SOLID-STATE ELECTRONICS; ISSN 0038-1101; GBR; DA. 1983; VOL. 26; NO 6; PP. 611-615; BIBL. 12 REF.Article

RESISTANCE THERMOMETERS WITH MOS FIELD EFFECT TRANSISTORS.EISELE I; DORDA G.1975; INST. PHYS. CONF. SER., LONDON; G.B.; DA. 1975; NO 26; PP. 131-134; BIBL. 4 REF.; (EUR. CONF. TEMP. MEAS.; TEDDINGTON; 1975)Conference Paper

Model for the integral and fractional quantum Hall effect based on superconductivity-like domainsDORDA, G.Siemens Forschungs- und Entwicklungsberichte. 1985, Vol 14, Num 3, pp 127-132, issn 0370-9736Article

INTERFACE STATES IN MOSFETS DUE TO HOT-ELECTRON INJECTION DETERMINED BY THE CHARGE PUMPING TECHNIQUESCHMITT D; DORDA G.1981; ELECTRONICS LETTERS; ISSN 0013-5194; GBR; DA. 1981; VOL. 17; NO 20; PP. 761-763; BIBL. 8 REF.Article

SPATIAL DISTRIBUTION OF HOT ELECTRONS AS A PHYSICAL LIMIT TO MOS TRANSISTOR PERFORMANCESCHMITT LANDSIEDEL S; DORDA G.1982; ELECTRONICS LETTERS; ISSN 0013-5194; GBR; DA. 1982; VOL. 18; NO 24; PP. 1041-1043; BIBL. 4 REF.Article

NEW METHOD FOR HIGH-ACCURACY DETERMINATION OF THE FINE-STRUCTURE CONSTANT BARED ON QUANTIZED HALL RESISTANCEKLITZING KV; DORDA G; PEPPER M et al.1980; PHYS. REV. LETT.; ISSN 0031-9007; USA; DA. 1980; VOL. 45; NO 6; PP. 494-497; BIBL. 13 REF.Article

MANY-VALLEY INTERACTIONS IN N-TYPE SILICON INVERSION LAYERS.DORDA G; EISELE I; GESCH H et al.1978; PHYS. REV., B; U.S.A.; DA. 1978; VOL. 17; NO 4; PP. 1785-1798; BIBL. 35 REF.Article

EFFECTIVE MASSES IN (100) SILICON INVERSION LAYERS.EISELE I; GESCH H; DORDA G et al.1977; SOLID STATE COMMUNIC.; G.B.; DA. 1977; VOL. 22; NO 3; PP. 185-188; BIBL. 13 REF.Article

DETERMINATION OF RECOMBINATION LIFETIME IN MOSFET'SSOUTSCHEK E; MUELLER W; DORDA G et al.1980; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1980; VOL. 36; NO 6; PP. 437-438; BIBL. 10 REF.Article

QUANTUM OSCILLATIONS IN P-TYPE INVERSION LAYERS OF (111) AND (100) SILICON FIELD EFFECT TRANSISTORS.VON KLITZING K; LANDWEHR G; DORDA G et al.1974; SOLID STATE COMMUNIC.; G.B.; DA. 1974; VOL. 15; NO 3; PP. 489-493; ABS. ALLEM.; BIBL. 11 REF.Article

ENERGY LEVEL DIFFERENCES IN SURFACE QUANTIZATION MEASURED BY PIEZORESISTANCE EFFECTDORDA G; EISELE I; PREUSS E et al.1972; SOLID STATE COMMUNIC.; G.B.; DA. 1972; VOL. 11; NO 12; PP. 1625-1628; ABS. ALLEM.; BIBL. 11 REF.Serial Issue

EVIDENCE FOR MOBILITY DOMAINS IN (100) SILICON INVERSION LAYERS.EISELE I; GESCH H; DORDA G et al.1976; SOLID STATE COMMUNIC.; G.B.; DA. 1976; VOL. 20; NO 7; PP. 677-680; BIBL. 11 REF.Article

COMPARISON OF SHUBNIKOV-DE HAAS EFFECT AND CYCLOTRON RESONANCE ON SI(100) MOS TRANSISTORS UNDER UNIAXIAL STRESSGESCH H; DORDA G; STALLHOFER P et al.1979; SOLID STATE COMMUN.; ISSN 0038-1098; USA; DA. 1979; VOL. 32; NO 7; PP. 543-546; BIBL. 14 REF.Article

SURFACE QUANTUM OSCILLATIONS IN N-TYPE (100) SILICON INVERSION LAYERS ON SAPPHIRE.VON KLITZING K; ENGLERT T; LANDWEHR G et al.1977; SOLID STATE COMMUNIC.; G.B.; DA. 1977; VOL. 24; NO 10; PP. 703-706; BIBL. 11 REF.Article

HOT-CARRIER EFFECTS IN HIGH MAGNETIC FIELDS IN SILICON INVERSION LAYERS AT LOW TEMPERATURES: P CHANNEL.HESS K; ENGLERT T; NEUGEBAUER T et al.1977; PHYS. REV., B; U.S.A.; DA. 1977; VOL. 16; NO 8; PP. 3652-3659; BIBL. 25 REF.Article

Novel hot-electron effects in the channel of MOSFET's observed by capacitance measurementsSCHMITT-LANDSIEDEL, D; DORDA, G.I.E.E.E. transactions on electron devices. 1985, Vol 32, Num 7, pp 1294-1301, issn 0018-9383Article

Degradation of n-MOS-transistors after pulsed stressWEBER, W; WERNER, C; DORDA, G et al.IEEE electron device letters. 1984, Vol 5, Num 12, pp 518-520, issn 0741-3106Article

ON THE ELECTRONIC G-FACTOR IN N-TYPE SILICON INVERSION LAYERSENGLERT TH; VON KLITZING K; NICHOLAS RJ et al.1980; PHYS. STATUS SOLIDI (B), BASIC RES.; DDR; DA. 1980; VOL. 99; NO 1; PP. 237-242; ABS. GER; BIBL. 9 REF.Article

Hot-electron and hole-emission effects in short n-channel MOSFET'sHOFMANN, K. R; WERNER, C; WEBER, W et al.I.E.E.E. transactions on electron devices. 1985, Vol 32, Num 3, pp 691-699, issn 0018-9383Article

Interface degradation in Si-metal-oxide-semiconductor structures by homogeneous, microwave heating of channel carriersQIU-YI, Y; ZRENNER, A; KOCH, F et al.Applied physics letters. 1988, Vol 52, Num 7, pp 561-563, issn 0003-6951Article

Universal behaviour of the electronic transportDORDA, G.Physica scripta. T. 1992, Vol 45, pp 297-299, issn 0281-1847Conference Paper

High precision measurements of the quantized Hall resistance at the PTBBLIEK, L; BRAUN, E; MELCHERT, F et al.IEEE transactions on instrumentation and measurement. 1985, Vol 34, Num 2, pp 304-305, issn 0018-9456Article

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