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Optical microlithography XXIV (1-3 March 2011, San Jose, California, United States)Dusa, Mircea V.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 2 vol, 2, isbn 978-0-8194-8532-8Conference Proceedings

Solutions for 22nm node patterning using ArFi technologyFINDERS, Jo; DUSA, Mircea; MULKENS, Jan et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79730U.1-79730U.16, 2Conference Paper

Optical microlithography XXII (24-27 February 2009, San Jose, California, United States)Levinson, Harry J; Dusa, Mircea V.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 2 vol, 2, isbn 978-0-8194-7527-5 0-8194-7527-0Conference Proceedings

Beam shaping: Top hat and customized intensity distributions for semiconductor manufacturing and inspectionTEIPEL, Ansgar; ASCHKE, Lutz.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 797321.1-797321.15, 2Conference Paper

A Study of Quantum Lithography for Diffraction LimitKIM, Sang-Kon.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79732X.1-79732X.7, 2Conference Paper

Freeform and SMOSOCHA, Robert.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, Part I, 797305.1-797305.17, 2Conference Paper

High-performance Intensity Slope Correction method for global process variability band improvement and printability enhancement in RET applicationsKOMIRENKO, Sergiy M.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 797318.1-797318.8, 2Conference Paper

Optical microlithography XXIII (23-25 February 2010, San Jose, California, United States)Dusa, Mircea V; Conley, Willard.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 2 vol, 2, isbn 978-0-8194-8054-5 0-8194-8054-1Conference Proceedings

Evaluation of a New Model of Mask Topography EffectsPIERRAT, Christophe.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 797317.1-797317.8, 2Conference Paper

Quadratic blur kernels for latent image formation modelingBUROV, Anatoly.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76400P.1-76400P.10, 2Conference Paper

Joint-Optimization of Layout and Litho for SRAM and Logic towards the 20 nm node, using 193iDE BISSCHOP, Peter; LAENENS, Bart; IWASE, Kazuya et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79730B.1-79730B.18, 2Conference Paper

22nm Logic Lithography in the Presence of Local InterconnectSMAYLING, Michael C; SOCHA, Robert J; DUSA, Mircea V et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 764019.1-764019.8, 2Conference Paper

Choosing objective functions for inverse lithography patterningYU, Jue-Chin; PEICHEN YU.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79731N.1-79731N.16, 2Conference Paper

Comparison of Clear-Field and Dark-Field Images with Optimized MasksSINN, Robert; DAM, Thuc; GLEASON, Bob et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79731V.1-79731V.8, 2Conference Paper

Fast algorithm for quadratic aberration model based on cross triple correlationWEI LIU; TINGTING ZHOU; SHIYUAN LIU et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79731M.1-79731M.9, 2Conference Paper

In-situ Mueller matrix polarimetry of projection lenses for 193-nm lithographyNOMURA, Hiroshi; HIGASHIKAWA, Iwao.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76400Q.1-76400Q.11, 2Conference Paper

Optical microlithography XXI (26-29 February 2008, San Jose, California, USA)Levinson, Harry J; Dusa, Mircea V.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7109-3, 3 v, isbn 978-0-8194-7109-3Conference Proceedings

A Cost-Driven Fracture Heuristics to Minimize External Sliver LengthXU MA; SHANGLIANG JIANG; ZAKHOR, Avideh et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79732O.1-79732O.15, 2Conference Paper

A recursive cost-based approach to fracturingSHANGLIANG JIANG; XU MA; ZAKHOR, Avideh et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79732P.1-79732P.18, 2Conference Paper

Gradient-Based Fast Source Mask Optimization (SMO)YU, Jue-Chin; PEICHEN YU.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 797320.1-79732013, 2Conference Paper

Physical conversion of Stokes parameters, which are multiplied by a general Mueller matrix, into Jones vectors applicable to the lithographic calculationNOMURA, Hiroshi; TAKAHASHI, Masanori; KYOH, Suigen et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79731O.1-79731O.14, 2Conference Paper

Modeling of CD and placement error in multi-spacer patterning technologyBABIN, S; BAY, K.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 764021.1-764021.9, 2Conference Paper

The feasibility of using image parameters for test pattern selection during OPC model calibrationABDO, Amr; VISWANATHAN, Ramya.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76401E.1-76401E.11, 2Conference Paper

Advanced Model and Fast Algorithm for Aerial Image Computation with Well Controlled AccuracyMANUYLOV, V.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 727431.1-727431.1, 2Conference Paper

Mask Data Correction Methodology in the Context of Model-Based Fracturing and Advanced Mask ModelsPIERRAT, Christophe; CHAU, Larry; BORK, Ingo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79732J.1-79732J.11, 2Conference Paper

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