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Results 1 to 25 of 12456

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Particle Dynamics in a Chemical Vapor Deposition Reactor: A Multiscale ApproachSHARIFI, Yousef; ACHENIE, Luke.Industrial & engineering chemistry research. 2009, Vol 48, Num 13, pp 5969-5974, issn 0888-5885, 6 p.Article

Mechanisms of surface selectivity in aluminum chemical vapor depositionHIGASHI, G. S; KRISHNAN RAGHAVACHARI; STEIGERWALD, M. L et al.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1990, Vol 8, Num 1, pp 103-105, issn 0734-211X, 3 p.Article

Effect of Reaction Temperature and Catalyst Type on the Formation of Boron Nitride Nanotubes by Chemical Vapor Deposition and Measurement of Their Hydrogen Storage CapacityBURCU SANER OKAN; ZÜLEYHA ÖZLEM KOCABAS; ASLI NALBANT ERGÜN et al.Industrial & engineering chemistry research. 2012, Vol 51, Num 35, pp 11341-11347, issn 0888-5885, 7 p.Article

CVD graphene electrochemistry: the role of graphitic islandsBROWNSON, Dale A. C; BANKS, Craig E.PCCP. Physical chemistry chemical physics (Print). 2011, Vol 13, Num 35, pp 15825-15828, issn 1463-9076, 4 p.Article

Formation of Carbon Nanofibers from Supported Pt Catalysts through Catalytic Chemical Vapor Deposition from AcetyleneQILONG CHEN; JIA WANG; FENG LI et al.Industrial & engineering chemistry research. 2011, Vol 50, Num 15, pp 9034-9042, issn 0888-5885, 9 p.Article

Thermal stability of the Co-Mo-S structure as studied by a CVD technique using Co(CO)3NOUSMAN; KUBOTA, Takeshi; OKAMOTO, Yasuaki et al.Industrial & engineering chemistry research. 2006, Vol 45, Num 10, pp 3537-3543, issn 0888-5885, 7 p.Conference Paper

CVD als keramische Verfahrenstechnik = Le dépôt chimique en phase vapeur comme technique de préparation de céramiques = CVD as a ceramic processing techniqueTIMMEL, P.Keramische Zeitschrift. 1989, Vol 41, Num 4, pp 259-262, issn 0023-0561Article

Complementary self-aligned laser arrays by metalorganic chemical vapor depositionMAWST, L. J; GIVENS, M. E; EMANUEL, M. A et al.Journal of applied physics. 1986, Vol 60, Num 7, pp 2633-2635, issn 0021-8979Article

Preparation of amorphous silicon and related semiconductors by photochemical vapor deposition and their application to solar cellsKONAGAI, M; TAKEI, H; KIM, W. Y et al.IEEE photovoltaic specialists conference. 18. 1985, pp 1372-1377Conference Paper

A review of carbon nanotube synthesis via fluidized-bed chemical vapor depositionCHEE HOWE SEE; HARRIS, Andrew T.Industrial & engineering chemistry research. 2007, Vol 46, Num 4, pp 997-1012, issn 0888-5885, 16 p.Article

Hydro-fluorinated amorphous silicon made by thermal CVD (chemical vapor deposition) methodMATSUMURA, H; IHARA, H; TACHIBANA, H et al.IEEE photovoltaic specialists conference. 18. 1985, pp 1277-1282Conference Paper

CO2 laser-induced thermal chemical vapour deposition of polymersPOLA, J.Journal of analytical and applied pyrolysis. 1994, Vol 30, Num 1, pp 73-90, issn 0165-2370Article

Inorganic fibers and microstructures directly from the vapor phaseWALLENBERGER, F. T; NORDINE, P. C; BOMAN, M et al.Composites science and technology. 1994, Vol 51, Num 2, pp 193-212, issn 0266-3538Conference Paper

Optimization of a Chemical Vapor Deposition Process Using Sequential Experimental DesignWISSMANN, Paul J; GROVER, Martha A.Industrial & engineering chemistry research. 2010, Vol 49, Num 12, pp 5694-5701, issn 0888-5885, 8 p.Article

Controlled pore opening of Ni/Al2O3 using chemical vapor deposition in a fluidized bed reactorBOATENG, Kenneth A; LINJIE HU; HILL, Josephine M et al.Industrial & engineering chemistry research. 2007, Vol 46, Num 3, pp 684-690, issn 0888-5885, 7 p.Article

Effective synthesis of single-walled carbon nanotubes using Ni-MCM-41 catalytic template through chemical vapor deposition methodSOMANATHAN, Thirunavukkarasu; PANDURANGAN, Arumugam.Industrial & engineering chemistry research. 2006, Vol 45, Num 26, pp 8926-8931, issn 0888-5885, 6 p.Article

Computational analysis and optimization of a chemical vapor deposition reactor with large-scale computingSALINGER, Andrew G; PAWLOWSKI, Roger P; SHADID, John N et al.Industrial & engineering chemistry research. 2004, Vol 43, Num 16, pp 4612-4623, issn 0888-5885, 12 p.Article

Hydrogenated amorphous silicon films by chemical vapor depositionCHU, T. L; CHU, S. S; ANG, S. T et al.IEEE photovoltaic specialists conference. 18. 1985, pp 1267-1270Conference Paper

Applications of rapid thermal chemical vapor deposition technology to ULSI material processing and device fabricationSNNIKRISHNAN, U; YOON, G. W; KWONG, D. L et al.Thin solid films. 1994, Vol 241, Num 1-2, pp 329-334, issn 0040-6090Conference Paper

A study of heat transfer and particle motion relative to the modified chemical vapor deposition processCHOI, M; GREIF, R; BAUM, H. R et al.Journal of heat transfer. 1989, Vol 111, Num 4, pp 1031-1037, issn 0022-1481Conference Paper

Spent FCC catalysts: An untapped resource of carbon nanotubes?CHEE HOWE SEE; HARRIS, Andrew T.AIChE journal. 2007, Vol 53, Num 8, pp 2198-2200, issn 0001-1541, 3 p.Article

Electric field induced alignment of carbon nanotubes grown by CVDOBRAZTSOV, A. N; ZOLOTUKHIN, A. A; VOLKOV, A. P et al.International Vacuum Nanoelectronics Conference. 2004, pp 72-73, isbn 0-7803-8397-4, 1Vol, 2 p.Conference Paper

Enhanced light-trapping for micromorph tandem solar cells by LP-CVD ZNOMEIER, J; SPITZNAGEL, J; FAY, S et al.sans titre. 2002, pp 1118-1121, isbn 0-7803-7471-1, 4 p.Conference Paper

Novel carbon filaments with carbon beads grown on their surfaceLIJIE CI; JINQUAN WEI; BINGQING WEI et al.Journal of materials science letters. 2000, Vol 19, Num 1, pp 21-22, issn 0261-8028Article

CVD-Diamantbeschichtung in der zerspanenden Fertigung = CVD-diamond coating in chip-forming fabricationLEMMER, O.Keramische Zeitschrift. 1998, Vol 50, Num 11, pp 934-935, issn 0023-0561Article

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