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High rate deposition of highly stable a-Si:H films using multi-hollow discharges for thin films solar cellsNAKAMURA, William Makoto; MATSUZAKI, Hidefumi; SATO, Hiroshi et al.Surface & coatings technology. 2010, Vol 205, issn 0257-8972, S241-S245, SUP1Conference Paper

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Study on crystalline to amorphous structure transition of Cr coatings by magnetron sputteringHONGTAO LI; BAILING JIANG; BO YANG et al.Applied surface science. 2011, Vol 258, Num 2, pp 935-939, issn 0169-4332, 5 p.Article

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Influence of pressure on an asymmetric, radio frequency discharge with methaneHEGEMANN, D.Thin solid films. 2006, Vol 515, Num 4, pp 2173-2178, issn 0040-6090, 6 p.Article

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Maximum rate of the cathodic reaction in electroless copper deposition = Vitesse maximale de la réaction cathodique dans le dépôt chimique de cuivreVITKAVAGE, D; PAUNOVIC, M.Plating and surface finishing. 1983, Vol 70, Num 4, pp 48-50, issn 0360-3164Article

High-rate welds need more current, a different gas, and gun cooling = Le soudage à grande vitesse nécessite une intensité plus forte, un gaz différent et un refroidissement de la torcheBIRCHFIELD, J. R.Welding design & fabrication. 1985, Vol 58, Num 6, pp 32-37, issn 0043-2253Article

High deposition rate of amorphous carbon film using a magnetically driven shunting arc dischargeYUKIMURA, Ken; KUMAGAI, Motoya; TAKAKI, Koichi et al.Surface & coatings technology. 2005, Vol 196, Num 1-3, pp 203-206, issn 0257-8972, 4 p.Conference Paper

Practical units and conversions in surface finishing : Part a. general information and plating ratesWALSH, Frank; KERR, Charlie; OTTEWILL, Gerri et al.Transactions of the Institute of Metal Finishing. 2001, Vol 79, pp B46-B47, issn 0020-2967, 3Article

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The rebound phenomenon in kinetic spraying depositionJINGWEI WU; HONGYUAN FANG; YOON, Sanghoon et al.Scripta materialia. 2006, Vol 54, Num 4, pp 665-669, issn 1359-6462, 5 p.Article

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