kw.\*:("Dielectric thin films")
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Control of high-k/germanium interface properties through selection of high-k materials and suppression of GeO volatilizationKITA, Koji; TAKAHASHI, Toshitake; NOMURA, Hideyuki et al.Applied surface science. 2008, Vol 254, Num 19, pp 6100-6105, issn 0169-4332, 6 p.Conference Paper
Development of low-K encapsulating film for stacked packagesMATSUMURA, Akiko; UWADA, Kazuki; HOTT, Yuji et al.SPIE proceedings series. 2003, pp 189-193, isbn 0-8194-5189-4, 5 p.Conference Paper
Solid-state nuclear magnetic resonance spectroscopy of low dielectric constant films from pulsed hydrofluorocarbon plasmasLAU, Kenneth K. S; GLEASON, Karen K.Journal of the Electrochemical Society. 1999, Vol 146, Num 7, pp 2652-2658, issn 0013-4651Article
Thin-film graded optical filters for mini-spectrometersPIEGARI, A; BULIR, J; KRASILNIKOVA SYTCHKOVA, A et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67851S.1-67851S.7, issn 0277-786X, isbn 978-0-8194-6949-6, 1VolConference Paper
Polar and non-polar domain borders in MgO ultrathin films on Ag(001)FERRARI, A. M; CASASSA, S; PISANI, C et al.Surface science. 2005, Vol 588, Num 1-3, pp 160-166, issn 0039-6028, 7 p.Article
Band offsets of epitaxial Tm2O3 high-k dielectric films on Si substrates by X-ray photoelectron spectroscopyWANG, J. J; FANG, Z. B; JI, T et al.Applied surface science. 2012, Vol 258, Num 16, pp 6107-6110, issn 0169-4332, 4 p.Article
Mechanical stress in ALD-Al2O3 filmsKRAUTHEIM, Gunter; HECHT, Thomas; JAKSCHIK, Stefan et al.Applied surface science. 2005, Vol 252, Num 1, pp 200-204, issn 0169-4332, 5 p.Conference Paper
Photoluminescence of Al2O3 nanocrystals induced by compressive stressYUAN, C. L; LEI, W.Physica. E, low-dimentional systems and nanostructures. 2010, Vol 42, Num 5, pp 1687-1690, issn 1386-9477, 4 p.Article
5th European Workshop on Piezolectric MaterialsARMAND, P; BALITSKY, D; BORNAND, V et al.Solid state sciences. 2010, Vol 12, Num 3, issn 1293-2558, 119 p.Conference Proceedings
Subpicosecond Optical Switching with a Negative Index MetamaterialDANI, Keshav M; ZAHYUN KU; UPADHYA, Prashanth C et al.Nano letters (Print). 2009, Vol 9, Num 10, pp 3565-3569, issn 1530-6984, 5 p.Article
Linear stability analysis of thin leaky dielectric films subjected to electric fieldsPEASE, Leonard F; RUSSEL, William B.Journal of non-newtonian fluid mechanics. 2002, Vol 102, Num 2, pp 233-250, issn 0377-0257Article
Some fundamentals of optical thin film growthKAISER, Norbert.Optical interference coatings. Springer series in optical sciences. 2003, pp 59-80, issn 0342-4111, isbn 3-540-00364-9, 22 p.Book Chapter
The crystallization behavior and interfacial reaction of Ge2Sb2Te5 thin films between dielectric material for the application to the phase change memoryJUNG, E. J; KANG, S. K; MIN, B. G et al.Proceedings - Electrochemical Society. 2003, pp 159-160, issn 0161-6374, isbn 1-56677-376-8, 2 p.Conference Paper
Self-organized filaments in dielectric barrier glow discharges : Special issue on images in plasma scienceMÜLLER, I; PUNSET, C; AMMELT, E et al.IEEE transactions on plasma science. 1999, Vol 27, Num 1, pp 20-21, issn 0093-3813Article
Tribological issues and modeling of removal rate of low-k films in CMPTHAGELLA, Swetha; SIKDER, Arun K; KUMAR, Ashok et al.Journal of the Electrochemical Society. 2004, Vol 151, Num 3, pp G205-G215, issn 0013-4651Article
Narrow band filters in both transmission and reflection with metal/dielectric thin filmsWEIDONG SHEN; XUEZHENG SUN; YUEGUANG ZHANG et al.Optics communications. 2009, Vol 282, Num 2, pp 242-246, issn 0030-4018, 5 p.Article
Electrochemical explanation for asymmetric electrowetting responseKHODAYARI, Mehdi; CRANE, Nathan B; VOLINSKY, Alex A et al.Thin solid films. 2013, Vol 548, pp 632-635, issn 0040-6090, 4 p.Article
A reverse symmetry optical waveguide sensor using a plasma substrateTAYA, Sofyan A; EL-AGEZ, Taher M.Journal of optics (Print). 2011, Vol 13, Num 7, issn 2040-8978, 075701.1-075701.1Article
High quality interlayer dielectric for 4H-SiC DMOSFETsOKAYAMA, T; ARTHUR, S. D; WALDRAB, P et al.Semiconductor science and technology. 2007, Vol 22, Num 11, pp 1193-1199, issn 0268-1242, 7 p.Article
Supercapacitive admittance tomoscopyGAMBY, Jean; ABID, Jean-Pierre; GIRAULT, Hubert H et al.Journal of the American Chemical Society. 2005, Vol 127, Num 38, pp 13300-13304, issn 0002-7863, 5 p.Article
Comparison of FTIR transmission spectra of thermally and LPCVD SiO2 films grown by TEOS pyrolysisVAMVAKAS, Vassilis Em; DAVAZOGLOU, Dimitris.Journal of the Electrochemical Society. 2004, Vol 151, Num 5, pp F93-F97, issn 0013-4651Article
Refinement on the theoretical analysis of multifiber ceramic capacitorCHEN, L. F; LAN, L; HUANG, Q. J et al.Journal of materials science. Materials in electronics. 2004, Vol 15, Num 3, pp 135-138, issn 0957-4522, 4 p.Article
Mechanical stress in optical coatingsSTRAUSS, Georg N.Optical interference coatings. Springer series in optical sciences. 2003, pp 207-229, issn 0342-4111, isbn 3-540-00364-9, 23 p.Book Chapter
PBII processing of dielectric layers : physical aspects limitations and experimental resultsLACOSTE, A; LE COEUR, F; ARNAL, Y et al.Surface & coatings technology. 2001, Vol 135, Num 2-3, pp 268-273, issn 0257-8972Article
Physical and electrical characteristics of methylsilane-and trimethylsilane-doped low dielectric constant chemical vapor deposited oxidesWU, Zhen-Cheng; SHIUNG, Zhi-Wen; LIANG, Mong-Song et al.Journal of the Electrochemical Society. 2001, Vol 148, Num 6, pp F127-F132, issn 0013-4651Article