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Interdiffusion profiles of AuGe/n-GaAs ohmic contacts studied by AESJUNG, T; NEBAUER, E.Physica status solidi. A. Applied research. 1983, Vol 77, Num 2, pp K203-K206, issn 0031-8965Article

Determination of nitroester and stabilizer migration in combustible cartridge case wallHO, C.-H; TOMKINS, B. A; RAMSEY, R. S et al.Propellants, explosives, pyrotechnics. 1996, Vol 21, Num 2, pp 79-84, issn 0721-3115Article

Experimental determination of chemical diffusion within secondary organic aerosol particlesABRAMSON, Evan; IMRE, Dan; BERANEK, Josef et al.PCCP. Physical chemistry chemical physics (Print). 2013, Vol 15, Num 8, pp 2983-2991, issn 1463-9076, 9 p.Article

Quantum yield of a two-site proton diffusion model : suggestions for dominant uncoupling processes in cytochrome oxidaseARRECIS, J. J; KUNDU, K; PHILLIPS, P et al.Journal of physical chemistry (1952). 1990, Vol 94, Num 18, pp 7316-7321, issn 0022-3654Article

Interstitial kinetics near oxidizing silicon interfacesDUNHAM, S. T.Journal of the Electrochemical Society. 1989, Vol 136, Num 1, pp 250-254, issn 0013-4651, 5 p.Article

Rôle de la diffusion par les limites des phases solides dans la cristallisation eutectiqueTEMKIN, D. E.Kristallografiâ. 1986, Vol 31, Num 1, pp 12-22, issn 0023-4761Article

Diffuse interface model of diffusion-limited crystal growthCOLLINS, J. B; LEVINE, H.Physical review. B, Condensed matter. 1985, Vol 31, Num 9, pp 6119-6122, issn 0163-1829Article

Profils de diffusion d'impuretés près de la surface des semiconducteurs. I. Enoncé du problème. Diffusions successivesFISTUL, V. I; SINDER, M. I.Fizika i tehnika poluprovodnikov. 1983, Vol 17, Num 11, pp 1995-2002, issn 0015-3222Article

Lateral confinement of microchemical surface reactions: effects on mass diffusion and kineticsZEIGER, H. J; EHRLICH, D. J.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1989, Vol 7, Num 3, pp 466-480, issn 0734-211X, 15 p.Article

Hopping diffusion across interfacesBLENDER, R; DIETERICH, W; FRISCH, H. L et al.Physical review. B, Condensed matter. 1986, Vol 33, Num 5, pp 3538-3540, issn 0163-1829Article

Arsenic diffusion effects in CdxHg1-xTe layers grown by metal-organic vapour phase epitaxyMAXEY, C. D; CAPPER, P; WHIFFIN, P. A. C et al.Materials letters (General ed.). 1989, Vol 8, Num 9, pp 385-388, issn 0167-577X, 4 p.Article

Interface deformation due to a quench: solid caseONUKI, A; SEKIMOTO, K; JASNOW, D et al.Progress of theoretical physics. 1985, Vol 74, Num 4, pp 685-692, issn 0033-068XArticle

Profils de diffusion d'impuretés près de la surface des semiconducteurs II. Diffusion simultanée et diffusion mutuelleFISTUL, V. I; SINDER, M. I.Fizika i tehnika poluprovodnikov. 1983, Vol 17, Num 11, pp 2003-2008, issn 0015-3222Article

HYDROGEN CHEMISORPTION ON TUNGSTEN (110) STUDIED BY CORE LEVEL SPECTROSCOPYGUILLOT C; TREGLIA G; LECANTE J et al.1983; JOURNAL OF PHYSICS. C. SOLID STATE PHYSICS; ISSN 0022-3719; GBR; DA. 1983; VOL. 16; NO 8; PP. 1555-1566; BIBL. 23 REF.Article

THE SPATIAL DISTRIBUTION OF IONS IMPLANTED INTO SOLIDS SUBJECT TO DIFFUSION, LOCAL TRAPPING AND SURFACE SPUTTERING.CARTER G; COLLINS R.1976; RAD. EFFECTS; G.B.; DA. 1976; VOL. 28; NO 1-2; PP. 123-125; BIBL. 2 REF.Article

A SOLID PLANAR SOURCE FOR PHOSPHORUS DIFFUSION.METZ DM; STACH J; JONES N et al.1976; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1976; VOL. 123; NO 10; PP. 1565-1569; BIBL. 12 REF.Article

MESURE DU COEFFICIENT DE DIFFUSION CHIMIQUE DANS LES OXYDES PAR LA METHODE DE RELAXATION.MORIN F.1975; CANAD. METALLURG. QUART.; CANADA; DA. 1975; VOL. 14; NO 2; PP. 97-104; ABS. ANGL.; BIBL. 22 REF.Article

ELEKTROCHEMISCHE UNTERSUCHUNG DER CHEMISCHEN DIFFUSION IN WUESTIT MIT HILFE EINES OXIDISCHEN FESTELEKTROLYTEN. = ETUDE ELECTROCHIMIQUE DE LA DIFFUSION CHIMIQUE DANS LA WUSTITE AU MOYEN D'UN OXYDE ELECTROLYTE SOLIDERICKERT H; WEPPNER W.1974; Z. NATURFORSCH., A; DTSCH.; DA. 1974; VOL. 29; NO 12; PP. 1849-1859; ABS. ANGL.; BIBL. 59 REF.Article

DIFFUSION OF BR-IONS IN KCL-KBR MIXED CRYSTALSPEHKONEN S.1973; J. PHYS. D; G.B.; DA. 1973; VOL. 6; NO 5; PP. 538-543; BIBL. 10 REF.Serial Issue

DIFFUSION-CONTROLLED GROWTH OF DENDRITE ARRAYS.SCHERER GW; UHLMANN DR.1975; J. CRYST. GROWTH; NETHERL.; DA. 1975; VOL. 30; NO 3; PP. 304-310; BIBL. 7 REF.Article

THEORY OF DEPARTURE FROM LOCAL EQUILIBRIUM AT THE INTERFACE OF A TWO-PHASE DIFFUSION COUPLE.LANGER JS; SEKERKA RF.1975; ACTA METALLURG.; E.U.; DA. 1975; VOL. 23; NO 10; PP. 1225-1237; ABS. FR. ALLEM.; BIBL. 15 REF.Article

WORK FUNCTION AND CHEMICAL DIFFUSION OF NONSTOICHROMETRIC OXIDE MATERIALSADAMCZYK Z; NOWOTNY J.1980; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1980; VOL. 127; NO 5; PP. 1112-1116; BIBL. 17 REF.Article

SURFACE DIFFUSION CAPTURE IN NUCLEATION THEORY.LEWIS B; HALPERN V.1976; J. CRYST. GROWTH; NETHERL.; DA. 1976; VOL. 33; NO 1; PP. 39-52; BIBL. 48 REF.Article

CINETIQUE DES SURFACES DE DIFFUSION ET FORMATION DE GERMES. IITOCHITSKIJ EH I; TKHAREV VE.1975; VESCI AKAD. NAVUK B.S.S.R., FIZ.-TEKH. NAVUK; S.S.S.R.; DA. 1975; NO 4; PP. 15-18; BIBL. 4 REF.Article

IMPURITY CONCENTRATION PROFILE IN IRRADIATION ENHANCED DIFFUSION EXPERIMENTS.ST PETERS MA; PEAK D; CORBETT JW et al.1974; PHYS. LETTERS, A; NETHERL.; DA. 1974; VOL. 49; NO 2; PP. 159-160; BIBL. 10 REF.Article

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