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AUTO-REGISTRATION TECHNIQUE IN ELECTRON BEAM LITHOGRAPHYIGAKI S; NAKAYAMA N; FURUKAWA Y et al.1981; FUJITSU SCI. TECH. J.; ISSN 0016-2523; JPN; DA. 1981; VOL. 17; NO 1; PP. 101-114; BIBL. 11 REF.Article

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RESIST POSSIBILITIES IN ION BEAM LITHOGRAPHYMACRANDER A; BARR D; WAGNER A et al.1983; OPTICAL ENGINEERING; ISSN 0091-3286; USA; DA. 1983; VOL. 22; NO 2; PP. 215-219; BIBL. 21 REF.Article

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PHYSIKALISCH-TECHNISCHE PROBLEME DER ELEKTRONENSTRAHLLITHOGRAPHIE = PROBLEMES PHYSIQUES ET TECHNIQUES DE LA LITHOGRAPHIE PAR FAISCEAU D'ELECTRONSKASCHLIK K; HAHN E; KUSCHEL G et al.1980; EXP. TECH. PHYS.; ISSN 0014-4924; DDR; DA. 1980; VOL. 28; NO 5; PP. 451-475; ABS. ENG; BIBL. 21 REF.Article

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SUBSTRATE THICKNESS CONSIDERATIONS IN ELECTRON BEAM LITHOGRAPHYADESIDA I; EVERHART TE.1980; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1980; VOL. 51; NO 11; PP. 5994-6005; BIBL. 53 REF.Article

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