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HIGH-RESOLUTION HIGH-CONTRAST ELECTRON MICROSCOPY.KING JG; COLEMAN JW.1974; MASSACHUSETTS INST. TECHNOL., RES. LAB. ELECTRON., QUART. PROGR. REP.; U.S.A.; DA. 1974; NO 114; PP. 11-12Article

FIRST RESULTS WITH THE AUGER ELECTRON MICROSCOPE (AEM-1).COLEMAN JW; JOST SR.1974; MASSACHUSETTS INST. TECHNOL., RES. LAB. ELECTRON., QUART. PROGR. REP.; U.S.A.; DA. 1974; NO 114; PP. 12-21; BIBL. 2 REF.Article

L'ELECTRONIQUE DANS LE CONTROLE DU FONCTIONNEMENT DES AUTOMOBILESJAUSET D.1978; INGRS DE L'AUTOM.; FRA; DA. 1978; NO 10; PP. 565-570Article

A MULTIPLE SOURCE ELECTRON-BEAM EVAPORATORMITCHINSON JC; PRINGLE RD.1972; J. PHYS. E; G.B.; DA. 1972; VOL. 5; NO 8; PP. 742-743; BIBL. 1 REF.Serial Issue

PRODUCTION TEST - AS PRACTICED BY A TEST EQUIPMENT MANUFACTURER.CROMER EG.1974; ELECTRON. PACKAG. PRODUCT.; U.S.A.; DA. 1974; VOL. 14; NO 5; PP. 33-44 (7P.)Article

STAGGERED MOVING AVERAGE TECHNIQUE (SMAT): A TOOL TO OPTIMIZE COMPONENT MANUFACTUREBAKER GO; HOCHHEISER CM.1972; I.E.E.E. TRANS. MANUFG TECHNOL.; U.S.A.; DA. 1972; VOL. 1; NO 2; PP. 15-18Serial Issue

WRIST INSTRUMENT OPENS NEW DIMENSION IN PERSONAL INFORMATION.MARION AF; HEINSEN EA; CHIN R et al.1977; HEWLETT-PACKARD J.; U.S.A.; DA. 1977-12; PP. 2-10; BIBL. 1 REF.Article

PRODUCIBILITY: THE CRITICAL ENGINEERING MANUFACTURING INTERFACE1972; WESCON TECH. PAPERS; U.S.A.; DA. 1972; VOL. 16; PP. (24 P.); BIBL. DISSEM.Serial Issue

ELECTRONIQUE RAPIDEMEY J.1981; TECHNIQUES DE L'INGENIEUR, ELECTRONIQUE; FRA; PARIS: TECH. ING.; DA. 1981; NO 94; E4840; 10 P.; BIBL. 9 REF.Book Chapter

ELECTRONIC RHYTHM UNIT.BATTAIOTTO A; RONZI G.1977; WIRELESS WORLD; G.B.; DA. 1977; VOL. 83; NO 1496; PP. 73-75Article

GROUND TERM COMBINATIONS OF MGIIILUNDSTROM T.1973; PHYS. SCRIPTA; SUEDE; DA. 1973; VOL. 7; NO 1-2; PP. 62-64; BIBL. 8 REF.Serial Issue

THE LOW TERMS OF CR IVEKBERG JO.1973; PHYS. SCRIPTA; SUEDE; DA. 1973; VOL. 7; NO 1-2; PP. 55-58; BIBL. 8 REF.Serial Issue

SPRAVOCHNIK PO OSNOVAM EHLEKTRONNOJ TEKHNIKI = MANUEL DES BASES DE LA TECHNIQUE ELECTRONIQUEGERSHUNSKIJ BS; ROMANOVSKAYA AV; VASHCHENKO NM et al.1972; KIEV; UNIV.; DA. 1972; PP. 1-344; BIBL. 2 P.Miscellaneous

DER ELEKTRONENSTRAHL ALS VIELSEITIGES WERKZEUG = LE FAISCEAU D'ELECTRONS COMME OUTIL A USAGES MULTIPLESVON GROTE KH; STEIGERWALD KH.1972; OPTIK; DTSCH.; DA. 1972; VOL. 36; NO 1; PP. 111-123; ABS. ANGL.; BIBL. 23 REF.Serial Issue

EXTENDED ANALYSIS OF CRVEKBERG JO.1973; PHYS. SCRIPTA; SUEDE; DA. 1973; VOL. 7; NO 1-2; PP. 59-61; BIBL. 5 REF.Serial Issue

THE THIRD AND FOURTH SPECTRA OF GALLIUM: GA III AND GA IVJOSHI YN; BHATIA KS; JONES WE et al.1973; SPECTROCHIM. ACTA, B; G.B.; DA. 1973; VOL. 28; NO 4; PP. 149-155; BIBL. 17 REF.Serial Issue

THE BS 9000 SYSTEM FOR ELECTRONIC COMPONENTS OF ASSESSED QUALITYCLARKSTONE KH.1973; POST OFF. ELECTR. ENGRS J.; G.B.; DA. 1973; VOL. 65; NO 4; PP. 228-233; BIBL. 4 REF.Serial Issue

CERTAINES PARTICULARITES DE L'IONISATION D'UNE SUBSTANCE SOUMISE A UN BOMBARDEMENT PAR UN FAISCEAU ELECTRONIQUE INTENSESMYAN OD; KRUZHKOV AG; TOVMACHENKO VN et al.1972; RADIOTEKH. I ELEKTRON.; S.S.S.R.; DA. 1972; VOL. 17; NO 7; PP. 1465-1470; BIBL. 8 REF.Serial Issue

PROPRIETES ELECTRONO-OPTIQUES D'UN MIROIR DE MICROSCOPE ELECTRONIQUE A MIROIR TRAVAILLANT EN REGIME D'OMBRE. IISEKUNOVA LM; YAKUSHEV EM.1975; ZH. TEKH. FIZ.; S.S.S.R.; DA. 1975; VOL. 45; NO 4; PP. 732-740; BIBL. 2 REF.Article

EUROPEAN INSTRUMENTS FOR QUANTITATIVE IMAGE ANALYSISEXNER HE.1972; A.S.T.M. SPEC. TECH. PUBL.; U.S.A.; DA. 1972; NO 504; PP. 95-107; BIBL. 19 REF.Serial Issue

ELECTRONIC TECHNOLOGY APPLIED TO VEHICLE CONTROL SYSTEMS. = TECHNOLOGIE DE L'ELECTRONIQUE APPLIQUEE AUX SYSTEMES DE CONTROLE DES VEHICULES1975; AUTOMOT. INDUSTR.; U.S.A.; DA. 1975; VOL. 152; NO 2; PP. 28-29Article

PHYSICAL AND SOLID STATE ELECTRONICSKANO K.1972; READING, MASS.; ADDISON-WESLEY; DA. 1972; PP. (461 P.); BIBL. DISSEM.Book

INFLUENCE DE LA CORRECTION D'ASTIGMATISME ET DE LA COURBURE DU CHAMP DE L'IMAGE SUR LA QUANTITE DES LIGNES (RESOLUBLES) DANS UNE IMAGE AU MICROSCOPE ELECTRONIQUE A BALAYAGEDER SHVARTS GV.1974; IZVEST. AKAD. NAUK S.S.S.R., SER. FIZ.; S.S.S.R.; DA. 1974; VOL. 38; NO 7; PP. 1505-1507; BIBL. 6 REF.Article

A VERSATILE SUBSTRATE DESIGN FOR LEED AND AES STUDIES IN UHVHOLLOWAY PH; HUDSON JB.1972; REV. SCI. INSTRUM.; U.S.A.; DA. 1972; VOL. 43; NO 7; PP. 1045-1047; BIBL. 3 REF.Serial Issue

MOLYBDENUM IN THE ELECTRONICS INDUSTRYBYDASH FA.1980; I.E.E.E. TRANS. COMPON. HYBR. MANUFG TECHNOL.; USA; DA. 1980; VOL. 3; NO 2; PP. 232-236; BIBL. 4 REF.Article

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