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Effects of altering surface integrity by electrolytic etching on fatigue performance in rolling contactYOUNGSIK CHOI.International journal of fatigue. 2014, Vol 68, pp 269-276, issn 0142-1123, 8 p.Article

PROCEDIMENTI ELETTROCHIMICI DI SBAVATURA = ELECTROCHEMICAL TRIMMING PROCESSES = PROCEDES D'EBAVURAGE ELECTROCHIMIQUES1982; TRATTAMENTI E FINITURA; ISSN 0041-1833; ITA; DA. 1982; VOL. 22; NO 6-7; PP. 45-46Article

Residual stress determination by continuous electroetchingISRAELI, A; BENEDEK, J.Precision engineering. 1984, Vol 6, Num 2, pp 95-97, issn 0141-6359Article

METALLIZATION OF STYRENE COPOLYMERS (1. ETCHING OF HIGH IMPACT POLYSTYRENE)DOBREVA ED; NENOV DP; PETROV KH B et al.1980; DARB.-LIET. TSR MOKSLU AKAD. SER. B; ISSN 0132-2729; SUN; DA. 1980; NO 2; PP. 35-39; ABS. LIT; BIBL. 17 REF.Article

Basics of chemical and electrochemical etchingGABE, David R.Transactions of the Institute of Metal Finishing. 2001, Vol 79, pp 54-56, issn 0020-2967, 4Article

Microfabrication and microsensorsSHOJI, S; ESASHI, M.Applied biochemistry and biotechnology. 1993, Vol 41, Num 1-2, pp 21-34, issn 0273-2289Conference Paper

Electrolytic etching of AZ91D Mg alloy in AlCl₃―EMIC ionic liquid for the electrodeposition of adhesive Al coatingBAJIN XU; MIN ZHANG; GUOPING LING et al.Surface & coatings technology. 2014, Vol 239, pp 1-6, issn 0257-8972, 6 p.Article

SURFACE CHANGES DURING A.C. ETCHING OF ALUMINUM = MODIFICATIONS DE SURFACE PENDANT LE POLISSAGE D'ALUMINIUM EN COURANT ALTERNATIFDYER CK; ALWITT RS.1981; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1981; VOL. 128; NO 2; PP. 300-305; BIBL. 9 REF.Article

The turbulence pickling lines = Les lignes de décapage en turbulencePEMPERA, F. G.Revue de métallurgie (Paris). 1989, Vol 86, Num 7-8, pp 625-630, issn 0035-1563Article

Dislocation-caused etch pits in the neighbourhood of ferric grainsKHALDEEV, G.V; VOLYNTSEV, A.B.Izvestiâ Akademii nauk SSSR. Metally. 1984, Vol 1984, Num 3, pp 134-135, issn 0568-5303Article

The effect of aluminum ions on the DC etching of aluminum foilRYU, Jong-Ho; JONG HYUN SEO; JEONG, Jae-Han et al.Journal of applied electrochemistry. 2004, Vol 34, Num 9, pp 879-884, issn 0021-891X, 6 p.Article

Fine pattern evolution on metal sheets using electrolytic photochemical machiningMAKINO, E; YAMASHITA, T; SHIBATA, T et al.Hyomen gijutsu. 1999, Vol 50, Num 7, pp 637-642, issn 0915-1869Article

ELEKTROCHEMISCHE VERFAHREN ZUM MASCHINELLEN ENTGRATEN = ELECTROCHEMICAL METHODS FOR DEBURRINGSCHAEFER F.1981; MM, MASCHINENMARKT; DEU; DA. 1981-03-20; VOL. 87; NO 22; PP. 413-415; BIBL. 6 REF.Article

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ELEKTROLYTISCHES POLIEREN UND AETZEN ZUR GEFUEGEENTWICKLUNG VON HOCHSCHMELZENDEN METALLEN = ATTAQUE ET POLISSAGE ELECTROLYTIQUE POUR REVELER LA STRUCTURE DES METAUX A HAUT POINT DE FUSIONSCHLUTER P; HONECKER H; ELSSNER G et al.1980; PRAKT. METALLOGR.; ISSN 0032-678X; DEU; DA. 1980; VOL. 17; NO 2; PP. 53-60; ABS. ENGArticle

Nano-scale anodic oxidation on a Si(1 1 1) surface terminated by bilayer-GaSeUENO, K; OKADA, R; SAIKI, K et al.Surface science. 2002, Vol 514, Num 1-3, pp 27-32, issn 0039-6028Conference Paper

Jet electrochemical etching of nickel in a sodium chloride medium assisted by a pulsed laser beamLESCURAS, V; ANDRE, J. C; LAPICQUE, F et al.Journal of applied electrochemistry. 1995, Vol 25, Num 10, pp 933-939, issn 0021-891XArticle

Bi-polar pickling of steel wiresHÜGDAHL, H.Wire industry. 1992, Vol 59, Num 8, pp 595-597, issn 0043-6011Article

Tunnel morphology of aluminum foil etched by a two-step DC etching methodRENGUI XIAO; KANGPING YAN.Corrosion science. 2008, Vol 50, Num 11, pp 3256-3260, issn 0010-938X, 5 p.Article

The etching of Ti adhesion layers in H₂O₂ solutionsVAN DEN MEERAKKER, J. E. A. M; METSEMAKERS, J. P; GIESBERS, J. B et al.Journal of the Electrochemical Society. 2002, Vol 149, Num 5, pp C256-C260, issn 0013-4651Article

Closed-cycle process for etching printed circuit board and electrolytic regeneration of spent etchantZHU YOUCHUNG; CHEN BINDE.Water treatment. 1993, Vol 8, Num 4, pp 477-490, issn 0921-2639Article

A field emitter etching facility with good reproducibility = Une amélioration pour l'attaque chimique à émetteur de champ avec une bonne reproductibilitéHUBNER, H.Optik (Stuttgart). 1983, Vol 63, Num 2, pp 179-183, issn 0030-4026Article

Back-side etching: A tool for making morphology gradients in porous siliconKARLSSON, L. M; TENGVALL, P; LUNDSTRÖM, I et al.Journal of the Electrochemical Society. 2002, Vol 149, Num 12, pp C648-C652, issn 0013-4651Article

Chemical attack on polypyrrole by electrolytically generated solution species in aqueous chloride mediumCHEN, C. C; RAJESHWAR, K.Journal of the Electrochemical Society. 1994, Vol 141, Num 11, pp 2942-2946, issn 0013-4651Article