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Dopant based electron beam lithography in CuxTiSe2KIDD, T. E; KLEIN, D; RASH, T. A et al.Applied surface science. 2011, Vol 257, Num 8, pp 3812-3816, issn 0169-4332, 5 p.Article

Electron beam lithography designed chemical nanosensors based on localized surface plasmon resonanceBARBILLON, G; BIJEON, J.-L; PLAIN, J et al.Surface science. 2007, Vol 601, Num 21, pp 5057-5061, issn 0039-6028, 5 p.Article

Microbowl-arrayed surface generated by EBL of negative-tone SU-8 for highly adhesive hydrophobicityXIANGMENG LI; JINYOU SHAO; YUCHENG DING et al.Applied surface science. 2014, Vol 307, pp 365-371, issn 0169-4332, 7 p.Article

Optimization of SERS-active substrates for near-field Raman spectroscopyGRAND, J; KOSTCHEEV, S; BIJEON, J.-L et al.Synthetic metals. 2003, Vol 139, Num 3, pp 621-624, issn 0379-6779, 4 p.Conference Paper

One-step fabrication of large area arrays of dots by electron beam lithographyPEREZ-JUNQUERA, A; MARTIN, J. I; ALAMEDA, J. M et al.Microelectronic engineering. 2007, Vol 84, Num 5-8, pp 845-847, issn 0167-9317, 3 p.Conference Paper

Extraction of the point-spread function in electron-beam lithography using a cross geometrySCHEFZYK, D; BIESINGER, D. E. F; WHARAM, D. A et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1091-1094, issn 0167-9317, 4 p.Conference Paper

Quantum sensing using Type II InAs/GaSb superlattice for infrared detectionRAZEGHI, Manijeh; GIN, Aaron; YAJUN WEI et al.Microelectronics journal. 2003, Vol 34, Num 5-8, pp 405-410, issn 0959-8324, 6 p.Conference Paper

Top-edge inaging in E-beam lithographyGILLESPIE, S. J.Solid state technology. 1983, Vol 26, Num 9, pp 174-176, issn 0038-111XArticle

Electron lithographyKING, H. N. G.Solid state technology. 1983, Vol 25, Num 2, pp 102-105, issn 0038-111XArticle

Zeolite micromembrane fabrication on magnetoelastic material using electron beam lithographyTSUKALA, Vassiliki; KOUZOUDIS, Dimitris.Microporous and mesoporous materials. 2014, Vol 197, pp 213-220, issn 1387-1811, 8 p.Article

A single-step process for making nanofluidic channels using electron beam lithographyPEARSON, J. L; CUMMING, D. R. S.Microelectronic engineering. 2005, Vol 78-79, pp 343-348, issn 0167-9317, 6 p.Conference Paper

Improvements to the alignment process in a commercial vector scan electron beam lithography toolDOCHERTY, K. E; THORNS, S; DOBSON, P et al.Microelectronic engineering. 2008, Vol 85, Num 5-6, pp 761-763, issn 0167-9317, 3 p.Conference Paper

The fabrication of 3-D nanostructures by a low- voltage EBLSEUNG HUN OH; JAE GU KIM; CHANG SEOK KIM et al.Applied surface science. 2011, Vol 257, Num 9, pp 3817-3823, issn 0169-4332, 7 p.Article

Tilt-corrected stitching for electron beam lithographyTHOMS, S; MACINTYRE, D. S.Microelectronic engineering. 2007, Vol 84, Num 5-8, pp 793-796, issn 0167-9317, 4 p.Conference Paper

Optical image formation using surface relief micrographic picture elementsLEE, Robert A; LEECH, Patrick W.Microelectronic engineering. 2007, Vol 84, Num 4, pp 669-672, issn 0167-9317, 4 p.Article

High robustness of correlation-based alignment with Penrose patterns to marker damage in electron beam lithographyDOCHERTY, K. E; LISTER, K. A; ROMIJN, J et al.Microelectronic engineering. 2009, Vol 86, Num 4-6, pp 532-534, issn 0167-9317, 3 p.Conference Paper

Development and molecular-weight issues on the lithographic performance of poly (methyl methacrylate)OLZIERSKI, A; RAPTIS, I.Microelectronic engineering. 2004, Vol 73-74, pp 244-251, issn 0167-9317, 8 p.Conference Paper

Fabrication of double split metallic nanorings for Raman sensingCLEARY, Alison; CLARK, Alasdair; GLIDLE, Andrew et al.Microelectronic engineering. 2009, Vol 86, Num 4-6, pp 1146-1149, issn 0167-9317, 4 p.Conference Paper

3D imprint technology using substrate voltage changeTANIGUCHI, Jun; IIDA, Masamichi; MIYAZAWA, Takayuki et al.Applied surface science. 2004, Vol 238, Num 1-4, pp 324-330, issn 0169-4332, 7 p.Conference Paper

Synthesis of diffractive structuresKOTACKA, Libor; VIZDAL, Petr; BEHOUNEK, Tomas et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8306, issn 0277-786X, isbn 978-0-8194-8953-1, 83060V.1-83060V.6Conference Paper

E-beam lithography: an efficient tool for the fabrication of diffractive and microoptical elementsKLEY, E.-B; SCHNABEL, B; ZEITNER, U. D et al.SPIE proceedings series. 1997, pp 222-232, isbn 0-8194-2419-6Conference Paper

Three-dimensional electron-beam resist profile simulatorMONIWA, A; YAMAGUCHI, H; OKAZAKI, S et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2771-2775, issn 1071-1023Conference Paper

Fabrication and application of subwavelength gratingsSCHNABEL, B; KLEY, E.-B.SPIE proceedings series. 1997, pp 233-241, isbn 0-8194-2419-6Conference Paper

E-Beam direct wafer writing process using a water-soluble conductive layerWATANABE, H; TODOKORO, Y.I.E.E.E. transactions on electron devices. 1989, Vol 36, Num 3, pp 474-478, issn 0018-9383, 5 p.Article

A comprehensive test sequence for the electron beam exposure systemZAVECZ, T. E.Solid state technology. 1983, Vol 25, Num 2, pp 106-110, issn 0038-111XArticle

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