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Shave-off depth profiling for nano-devicesNOJIMA, Masashi; TOI, Masayuki; MAEKAWA, Ayaka et al.Mikrochimica acta (1966. Print). 2006, Vol 155, Num 1-2, pp 219-223, issn 0026-3672, 5 p.Conference Paper

Sputtered neutral mass spectrometryREUTER, W.TrAC. Trends in analytical chemistry (Regular ed.). 1989, Vol 8, Num 6, pp 203-208, issn 0165-9936Article

The effect of oxygen flooding on the secondary ion yield of Cs in the cameca IMS 3fSYKES, D. E; CHEW, A; CRAPPER, M. D et al.Vacuum. 1992, Vol 43, Num 1-2, pp 159-162, issn 0042-207XConference Paper

Sources of uncertainty in the experimental determination of sample heterogeneity in secondary ion mass spectrometryMICHIELS, F. P. L; ADAMS, F. C. V.Analytical chemistry (Washington, DC). 1991, Vol 63, Num 23, pp 2735-2743, issn 0003-2700Article

Isotopic studies of oxidation of Si3N4 and Si using SIMSHONGHUA DU; HOUSER, C. A; TRESSLER, R. E et al.Journal of the Electrochemical Society. 1990, Vol 137, Num 2, pp 741-742, issn 0013-4651, 2 p.Article

Proceedings of the Eighteenth International Conference on Secondary Ion Mass Spectrometry, SIMS XVIII, Riva Del Garda, Trento, Italy, September 18-23, 2011Surface and interface analysis. 2013, Vol 45, Num 1, issn 0142-2421, 611 p.Conference Proceedings

Elimination of cluster interferences in secondary ion mass spectrometry using extreme energy filteringSCHAUER, S. N; WILLIAMS, P.International journal of mass spectrometry and ion processes. 1990, Vol 103, Num 1, pp 21-29, issn 0168-1176, 9 p.Article

Measurement and visual observation of sample charging effects on primary beam focusing in secondary ion mass spectrometryAPPELHANS, A. D.International journal of mass spectrometry and ion processes. 1989, Vol 88, Num 2-3, pp 161-173, issn 0168-1176Article

Characterization of sample heterogeneity in secondary ion mass spectrometry by the use of a sampling constant modelMICHIELS, F. P. L; ADAMS, F. C. V; BRIGHT, D. S et al.Analytical chemistry (Washington, DC). 1991, Vol 63, Num 23, pp 2727-2734, issn 0003-2700Article

Comparison of polyatomic and atomic primary beams for secondary ion mass spectrometry of organicsAPPELHANS, A. D; DELMORE, J. E.Analytical chemistry (Washington, DC). 1989, Vol 61, Num 10, pp 1087-1093, issn 0003-2700, 7 p.Article

Post-implantation as an aid in scale calibration for SIMS depth profilingZALM, P. C; JANSSEN, K. T. F; FONTIJN, G. M et al.Surface and interface analysis. 1989, Vol 14, Num 11, pp 781-786, issn 0142-2421, 6 p.Article

Distinction of oxygen and sulfur in secondary ion mass spectrometryINOUE, K.Japanese journal of applied physics. 1986, Vol 25, Num 9, pp L734-L735, issn 0021-4922, 2Article

Sulfur Isotope Studies in Solid Organics: A Protocol for Utilizing Heterogeneous Standards and Secondary Ion Mass SpectrometryKING, Hubert E; ZIMMER, Mindy M; HORN, William C et al.Energy & fuels. 2014, Vol 28, Num 3-4, pp 2446-2453, issn 0887-0624, 8 p.Article

Secondary electron analysis of polymeric sions generated by an electrospray ion sourceXU, Y; BAE, Y. K; BEUHLER, R. J et al.Journal of physical chemistry (1952). 1993, Vol 97, Num 46, pp 11883-11886, issn 0022-3654Article

Quantification of molecular secondary ion mass spectrometry by internal standardsMEYER, K; HAGENHOFF, B; DEIMEL, M et al.Organic mass spectrometry. 1992, Vol 27, Num 10, pp 1148-1150, issn 0030-493XArticle

Range of high energy phophorus and medium energy boron ions implanted in polymersTSOUKALAS, D.Solid-state electronics. 1990, Vol 33, Num 6, pp 639-643, issn 0038-1101, 5 p.Article

Application of characteristic secondary ion mass spectroscopy to phase identification in amorphous titanium carbideKALOYEROS, A; WILLIAMS, W. S.Surface science. 1986, Vol 171, Num 2, pp L454-L460, issn 0039-6028Article

Comment on High-spatial and high-mass-resolution SIMS instrument for the surface analysis of chemically complex materials [Rev. Sci. Instrum. 60, 53 (1989)]. ReplyCONTY, C; SCHUETZLE, D; PRATER, T. J et al.Review of scientific instruments. 1990, Vol 61, Num 1, pp 203-204, issn 0034-6748, 1Article

Ion yields of impurities in gallium arsenide for secondary ion mass spectrometryHOMMA, Y; TANAKA, T.Analytical chemistry (Washington, DC). 1986, Vol 58, Num 6, pp 1108-1112, issn 0003-2700Article

Experimental and theorical investigations into the origin of cross-contamination effects observed in a quadrupole-based SIMS instrumentWITTMAACK, K.Applied physics. A, Solids and surfaces. 1985, Vol 38, Num 4, pp 235-252, issn 0721-7250Article

XPS, static SIMS and NEXAFS spectroscopic investigation of thiol adsorption on metals and metal sulfidesGOH, S. W; BUCKLEY, A. N; LAMB, R. N et al.Proceedings - Electrochemical Society. 2006, pp 107-119, issn 0161-6374, isbn 1-56677-440-3, 1Vol, 13 p.Conference Paper

Optimization of the dynamic range of SIMS depth profiles by sample preparationVON CRIEGERN, R; WEITZEL, I; ZEININGER, H et al.Surface and interface analysis. 1990, Vol 15, Num 7, pp 415-421, issn 0142-2421Article

Effect of a field-limiting method in a micro-area analysis by SIMSTAKAHASHI, K; WATANABE, K; TAKANO, A et al.Bunseki Kagaku. 1991, Vol 40, Num 11, pp 863-866, issn 0525-1931Article

Application of glow discharge mass spectrometry and sputtered neutral mass spectrometry to materials characterizationCHU, P. K; HUNEKE, J. C; BLATTNER, R. J et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1987, Vol 5, Num 3, pp 295-301, issn 0734-2101Article

SIMS analysis of evaporated indium contacts on (HgCd)TeDEMANET, C. M; STRYDOM, H. J; BASSON, J. H et al.Applied surface science. 1986, Vol 25, Num 3, pp 279-287, issn 0169-4332Article

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