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Minimization of the shadow patterns produced by periodic mesh grids in extreme ultraviolet telescopesAUCHERE, Frédéric; RIZZI, Julien; PHILIPPON, Anne et al.Journal of the Optical Society of America. A, Optics, image science, and vision (Print). 2011, Vol 28, Num 1, pp 40-45, issn 1084-7529, 6 p.Article

EUV and x-ray optics (synergy between laboratory and space II)Hudec, R; Pina, Ladislav.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8076, issn 0277-786X, isbn 978-0-8194-8666-0, 1 vol, isbn 978-0-8194-8666-0Conference Proceedings

Advances in X-ray/EUV optics and components VI (22-24 August 2011, San Diego, California, United States)Morawe, Christian; Khounsary, Ali M; Goto, Shunji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8139, issn 0277-786X, isbn 978-0-8194-8749-0, 1 vol, isbn 978-0-8194-8749-0Conference Proceedings

Future EUV/UV and visible space astrophysics missions and instrumentation (Waikoloa HI, 22-23 August 2002)Blades, J. Chris; Siegmund, Oswald H.W.SPIE proceedings series. 2003, isbn 0-8194-4633-5, XV, 702 p, isbn 0-8194-4633-5Conference Proceedings

Extreme ultraviolet astronomyBOWYER, S.Scientific American. 1994, Vol 271, Num 2, pp 32-39, issn 0036-8733Article

Iridium/silicon multilayers for extreme ultraviolet applications in the 20―35 nm wavelength rangeZUPPELLA, Paola; MONACO, Gianni; JODY CORSO, Alain et al.Optics letters. 2011, Vol 36, Num 7, pp 1203-1205, issn 0146-9592, 3 p.Article

Extreme ultraviolet multilayer mirror with near-zero IR reflectanceSOER, W. A; GAWLITZA, P; VAN HERPEN, M. M. J. W et al.Optics letters. 2009, Vol 34, Num 23, pp 3680-3682, issn 0146-9592, 3 p.Article

Advances in X-ray/EUV optics and components V (2-3 August 2010, San Diego, California, United States)Khounsary, Ali M; Morawe, Christian; Goto, Shunji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7802, issn 0277-786X, isbn 978-0-8194-8298-3, 1 vol, isbn 978-0-8194-8298-3Conference Proceedings

Advanced holographic methods in extreme ultraviolet interference lithographyTERHALLE, Bernd; LANGNER, Andreas; PÄIVÄNRANTA, Birgit et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8102, issn 0277-786X, isbn 978-0-8194-8712-4, 81020V.1-81020V.7Conference Paper

Predictive Modeling of EUV-Lithography: The Role of Mask, Optics, and Photoresist EffectsERDMANN, Andreas; EVANSCHITZKY, Peter; FENG SHAO et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8171, issn 0277-786X, isbn 978-0-8194-8797-1, 81710M.1-81710M.16Conference Paper

Analysis and Control of Thin Film Stresses during Extreme Ultraviolet Lithography Mask Blank FabricationLIANG ZHENG.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7848, issn 0277-786X, isbn 978-0-8194-8378-2, 78483G.1-78483G.8Conference Paper

Modeling EUVL Illumination SystemsSMITH, Daniel G.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7103, issn 0277-786X, isbn 978-0-8194-7333-2 0-8194-7333-2, 1Vol, 71030B.1-71030B.8Conference Paper

Extreme ultraviolet interferometry of warm dense matter in laser plasmasGARTSIDE, L. M. R; TALLENTS, G. J; RUS, B et al.Optics letters. 2010, Vol 35, Num 22, pp 3820-3822, issn 0146-9592, 3 p.Article

Comparisons between EUV at-wavelength metrological methodsSUGISAKI, Katsumi; OKADA, Masashi; OUCHI, Chidane et al.Proceedings of SPIE. 2005, pp 59210D.1-59210D.8, isbn 0-8194-5926-7, 1VolConference Paper

Normal incidence spectrophotometer with high-density transmission grating technology and high-efficiency silicon photodiodes for absolute solar extreme-ultraviolet irradiance measurements : Magnetospheric imagery and atmospheric remote sensingOGAWA, H. S; MCMULLIN, D. R; JUDGE, D. L et al.Optical engineering (Bellingham. Print). 1993, Vol 32, Num 12, pp 3121-3125, issn 0091-3286Article

High-resolution Fresnel zone plate fabrication by achromatic spatial frequency multiplication with extreme ultraviolet radiationSUBHRA SARKAR, Sankha; SOLAK, Harun H; SAIDANI, Menouer et al.Optics letters. 2011, Vol 36, Num 10, pp 1860-1862, issn 0146-9592, 3 p.Article

Increasing of the EUV resist's sensitivityKITAI, M. S; SOROKA, A. M; RUDOI, I. G et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7996, issn 0277-786X, isbn 978-0-8194-8569-4, 799612.1-799612.10Conference Paper

Erratum to: Traveling-wave Thomson scattering and optical undulators for high-yield EUV and X-ray sourcesDEBUS, A. D; BUSSMANN, M; SIEBOLD, M et al.Applied physics. B, Lasers and optics (Print). 2010, Vol 101, Num 1-2, issn 0946-2171, p. 483Article

Longitudinal coherence measurements of an extreme-ultraviolet free-electron laserSCHLOTTER, W. F; SORGENFREI, F; BEECK, T et al.Optics letters. 2010, Vol 35, Num 3, pp 372-374, issn 0146-9592, 3 p.Article

The network structure of the merit function space of EUV mirror systemsMARINESCU, Oana; BOCIORT, Florian.Proceedings of SPIE, the International Society for Optical Engineering. 2005, pp 587402.1-587402.8, issn 0277-786X, isbn 0-8194-5879-1, 1VolConference Paper

The problems concerning the integration of very thin mirror shellsBASSO, S; CITTERIO, O; MAZZOLENI, F et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7437, issn 0277-786X, isbn 0-8194-7727-3 978-0-8194-7727-9, 74371C.1-74371C.11Conference Paper

Sn droplet target development for laser produced plasma EUV light sourceNAKANO, Masaki; YABU, Takayuki; SOMEYA, Hiroshi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692130.1-692130.8, issn 0277-786X, isbn 978-0-8194-7106-2Conference Paper

PIN diamond detector development for LYRA, the solar VUV radiometer on board PROBA IIBENMONSSA, A; SCHÜHLE, U; HAENEN, K et al.Physica status solidi. A. Applied research. 2004, Vol 201, Num 11, pp 2536-2541, issn 0031-8965, 6 p.Conference Paper

Rigorous Simulations of 3D Patterns on Extreme Ultraviolet Lithography MasksBURGER, Sven; ZSCHIEDRICH, Lin; POMPLUN, Jan et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8083, issn 0277-786X, isbn 978-0-8194-8679-0, 80831B.1-80831B.11Conference Paper

Interferometric testing of aspheric components for EUV reduced cameraGAVRILOV, Egor; KIRILLOVSKY, Vladimir; ORLOV, Peter et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 66110D.1-66110D.7, issn 0277-786X, isbn 978-0-8194-6752-2, 1VolConference Paper

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