kw.\*:("Extreme ultraviolet radiation")
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EUV and x-ray optics (synergy between laboratory and space II)Hudec, R; Pina, Ladislav.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8076, issn 0277-786X, isbn 978-0-8194-8666-0, 1 vol, isbn 978-0-8194-8666-0Conference Proceedings
Advances in X-ray/EUV optics and components VI (22-24 August 2011, San Diego, California, United States)Morawe, Christian; Khounsary, Ali M; Goto, Shunji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8139, issn 0277-786X, isbn 978-0-8194-8749-0, 1 vol, isbn 978-0-8194-8749-0Conference Proceedings
Future EUV/UV and visible space astrophysics missions and instrumentation (Waikoloa HI, 22-23 August 2002)Blades, J. Chris; Siegmund, Oswald H.W.SPIE proceedings series. 2003, isbn 0-8194-4633-5, XV, 702 p, isbn 0-8194-4633-5Conference Proceedings
Extreme ultraviolet astronomyBOWYER, S.Scientific American. 1994, Vol 271, Num 2, pp 32-39, issn 0036-8733Article
Advanced holographic methods in extreme ultraviolet interference lithographyTERHALLE, Bernd; LANGNER, Andreas; PÄIVÄNRANTA, Birgit et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8102, issn 0277-786X, isbn 978-0-8194-8712-4, 81020V.1-81020V.7Conference Paper
Predictive Modeling of EUV-Lithography: The Role of Mask, Optics, and Photoresist EffectsERDMANN, Andreas; EVANSCHITZKY, Peter; FENG SHAO et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8171, issn 0277-786X, isbn 978-0-8194-8797-1, 81710M.1-81710M.16Conference Paper
Analysis and Control of Thin Film Stresses during Extreme Ultraviolet Lithography Mask Blank FabricationLIANG ZHENG.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7848, issn 0277-786X, isbn 978-0-8194-8378-2, 78483G.1-78483G.8Conference Paper
Modeling EUVL Illumination SystemsSMITH, Daniel G.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7103, issn 0277-786X, isbn 978-0-8194-7333-2 0-8194-7333-2, 1Vol, 71030B.1-71030B.8Conference Paper
Extreme ultraviolet interferometry of warm dense matter in laser plasmasGARTSIDE, L. M. R; TALLENTS, G. J; RUS, B et al.Optics letters. 2010, Vol 35, Num 22, pp 3820-3822, issn 0146-9592, 3 p.Article
Comparisons between EUV at-wavelength metrological methodsSUGISAKI, Katsumi; OKADA, Masashi; OUCHI, Chidane et al.Proceedings of SPIE. 2005, pp 59210D.1-59210D.8, isbn 0-8194-5926-7, 1VolConference Paper
Normal incidence spectrophotometer with high-density transmission grating technology and high-efficiency silicon photodiodes for absolute solar extreme-ultraviolet irradiance measurements : Magnetospheric imagery and atmospheric remote sensingOGAWA, H. S; MCMULLIN, D. R; JUDGE, D. L et al.Optical engineering (Bellingham. Print). 1993, Vol 32, Num 12, pp 3121-3125, issn 0091-3286Article
High-resolution Fresnel zone plate fabrication by achromatic spatial frequency multiplication with extreme ultraviolet radiationSUBHRA SARKAR, Sankha; SOLAK, Harun H; SAIDANI, Menouer et al.Optics letters. 2011, Vol 36, Num 10, pp 1860-1862, issn 0146-9592, 3 p.Article
Increasing of the EUV resist's sensitivityKITAI, M. S; SOROKA, A. M; RUDOI, I. G et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7996, issn 0277-786X, isbn 978-0-8194-8569-4, 799612.1-799612.10Conference Paper
Erratum to: Traveling-wave Thomson scattering and optical undulators for high-yield EUV and X-ray sourcesDEBUS, A. D; BUSSMANN, M; SIEBOLD, M et al.Applied physics. B, Lasers and optics (Print). 2010, Vol 101, Num 1-2, issn 0946-2171, p. 483Article
Longitudinal coherence measurements of an extreme-ultraviolet free-electron laserSCHLOTTER, W. F; SORGENFREI, F; BEECK, T et al.Optics letters. 2010, Vol 35, Num 3, pp 372-374, issn 0146-9592, 3 p.Article
The network structure of the merit function space of EUV mirror systemsMARINESCU, Oana; BOCIORT, Florian.Proceedings of SPIE, the International Society for Optical Engineering. 2005, pp 587402.1-587402.8, issn 0277-786X, isbn 0-8194-5879-1, 1VolConference Paper
Table-top z-pinch and laser-plasma x-ray/EUV facility SparkyKANTSYREV, V; FEDIN, D; SAVAGE, M et al.SPIE proceedings series. 2005, pp 59180W.1-59180W.7, isbn 0-8194-5923-2, 1VolConference Paper
An old material finds a new applicationACKERMAN, Bradford; HECKLE, Christine; HRDINA, Kenneth et al.Laser focus world. 2002, Vol 38, Num 11, pp 109-113, issn 1043-8092, 4 p.Article
Development of an extreme ultraviolet spectroscope for exospheric dynamics (EXCEED) missionYOSHIOKA, Kazuo; MURAKAMI, Go; UENO, Munetaka et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7077, pp 70771U.1-70771U.8, issn 0277-786X, isbn 978-0-8194-7297-7, 1VolConference Paper
7.87 eV postionization of peptides containing tryptophan or derivatized with fluoresceinHANLEY, L; EDIRISINGHE, P. D; CALAWAY, W. F et al.Applied surface science. 2006, Vol 252, Num 19, pp 6723-6726, issn 0169-4332, 4 p.Conference Paper
Recent research and development of VUV phosphors for a mercury-free lampTODA, Kenji.Journal of alloys and compounds. 2006, Vol 408-12, pp 665-668, issn 0925-8388, 4 p.Conference Paper
Applications of short wavelength radiation : Soft X-ray microscopy and EUV lithographyATTWOOD, D. T.Journal de physique. IV. 2001, Vol 82, pp Pr2.441-Pr2.449, issn 1155-4339Conference Paper
Heat resistance of EUV multilayer mirrors for long-time applicationsFEIGL, T; LAUTH, H; YULIN, S et al.Microelectronic engineering. 2001, Vol 57-58, pp 3-8, issn 0167-9317Conference Paper
Solar photoionization as a loss mechanism of neutral interstellar hydrogen in interplanetary spaceOGAWA, H. S; WU, C. Y. R; GANGOPADHYAY, P et al.Journal of geophysical research. 1995, Vol 100, Num A3, pp 3455-3462, issn 0148-0227Article
EUVE first light observation of the diffuse sky backgroundLIEU, R; BOWYER, S; LAMPTON, M et al.The Astrophysical journal. 1993, Vol 417, Num 1, pp L41-L44, issn 0004-637X, 2Article