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RENDEMENT DE PULVERISATION DANS LE CAS DE LA PULVERISATION PAR FAISCEAU D'IONSHOSAKA S; KANOMATA I; HASHIMOTO S et al.1975; J. VACUUM SOC. JAP.; JAP.; DA. 1975; VOL. 18; NO 11; PP. 384-391; ABS. ANGL.; BIBL. 20 REF.Article

IONENSTRAHLSCHWEISSEN. = SOUDAGE PAR FAISCEAU D'IONSWIESNER P.1975; Z.I.S. MITT.; DTSCH.; DA. 1975; VOL. 17; NO 1; PP. 68-70; BIBL. 6 REF.Article

FOCUSED ION BEAM DESIGNS FOR SPUTTER DEPOSITIONKAUFMAN HR; HARPER JME; CUOMO JJ et al.1979; J. VACUUM SCI. TECHNOL.; USA; DA. 1979; VOL. 16; NO 3; PP. 899-905; BIBL. 13 REF.Article

LITHIUM-ION-BEAM EXPOSURE OF PMMA-LAYERS WITHOUT PROXIMITY-EFFECTSPEIDEL R; BEHRINGER U.1980; OPTIK; DEU; DA. 1980; VOL. 54; NO 5; PP. 439-444; ABS. ENG; BIBL. 3 REF.Article

HOMOGENEITE DU FAISCEAU ET INFLUENCE DE LA VARIATION DES DIFFERENTS PARAMETRES DE FONCTIONNEMENT SUR L'UTILISATION D'UN USINEUR IONIQUE THOMSONPERE JF.1974; VIDE; FR.; DA. 1974; NO 171 SUPPL; PP. 270-277; BIBL. 2 REF.; (APPL. PROCESSUS ELECTRON. IONIQUES. IVEME CONGR. INT. AVISEM 74; TOULOUSE; 1974)Conference Paper

INTERPENETRATING SOLAR WIND STREAMS.FELDMAN WC; ASBRIDGE JR; BAME SJ et al.1974; REV. GEOPHYS. SPACE PHYS.; U.S.A.; DA. 1974; VOL. 12; NO 4; PP. 715-723; BIBL. 47 REF.Article

ION BEAM TECHNOLOGY APPLIED TO ELECTRON MICROSCOPYFRANKS J.1978; ADV. ELECTRON. ELECTRON PHYS.; USA; DA. 1978; VOL. 47; PP. 1-50; BIBL. 3 P.Article

SIMPLE ACCELERATOR BEAM POSITION MONITORSNOWDON KJ; BARBER CH.1979; J. PHYS. E; ISSN 0022-3735; GBR; DA. 1979; VOL. 12; NO 10; PP. 923Article

DETERMINATION SEMI-EMPIRIQUE DES ETATS DE CHARGES D'UN FAISCEAU D'IONS RAPIDES (Z <OU= 18)KY KUAN TO; DROUIN R.1979; NUCL. INSTRUM. METHODS; NLD; DA. 1979; VOL. 160; NO 3; PP. 461-463; ABS. ENG; BIBL. 9 REF.Article

PROBLEMES CONTEMPORAINS DE LA PHYSIQUE DES FAISCEAUX ELECTRONIQUES ET IONIQUES PUISSANTSDIDENKO AN.1979; IZV. VYSS. UCEBN. ZAVED., FIZ.; ISSN 0021-3411; SUN; DA. 1979; VOL. 22; NO 10; PP. 5-6Article

MASK PREPARATION FOR SMALL DIMENSION ION MILLING BY TWO STEP LIFT-OFF PROCESS.WADA O; YAMAMOTO S; KOBAYASHI K et al.1977; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1977; VOL. 124; NO 6; PP. 959-960; BIBL. 4 REF.Article

APPLICATION OF ION BEAM TECHNIQUE TO MICROMACHINING = APPLICATION DE LA TECHNIQUE DU FAISCEAU IONIQUE AU MICRO-USINAGENAKAI T; OHMAE N; MIYAWAKI T et al.1976; BULL. JAP. SOC. PRECIS. ENGNG.; JAP.; DA. 1976; VOL. 9; NO 5; PP. 157-162; BIBL. 11 REF.Article

ELECTRODE POUR PULVERISATION IONIQUE H.FDOROZHKO EV; SAVITSKIJ VG.1975; PRIBORY TEKH. EKSPER.; S.S.S.R.; DA. 1975; NO 1; PP. 236-237; BIBL. 3 REF.Article

LES DIVERS ASPECTS DE L'USINAGE IONIQUE APPLIQUE AUX SYSTEMES METALLIQUES DES TRANSISTORS BIPOLAIRES HYPERFREQUENCES.PESTIE JP; DUMONTET H; ANDRIEU JP et al.1974; VIDE; FR.; DA. 1974; NO 171 SUPPL.; PP. 161-170; BIBL. 7 REF.; (APPL. PROCESSUS ELECTRON. IONIQUES. IVEME CONGR. INT. AVISEM 74; TOULOUSE; 1974)Conference Paper

A SIMPLE INEXPENSIVE BENDING MAGNET SYSTEM FOR VERY LOW ENERGY ION BEAMS. = SYSTEMES D'AIMANTS DE COURBURE, SIMPLE ET PEU CHER, POUR FAISCEAUX D'IONS DE TRES FAIBLE ENERGIEWARD TR; JIGGINS AH.1974; J. PHYS. E; G.B.; DA. 1974; VOL. 7; NO 7; PP. 520-521; BIBL. 1 REF.Article

GLASS MACHINING BY ION SPUTTERINGBAYLY AR; TOWNSEND PD.1972; J. PHYS. D; G.B.; DA. 1972; VOL. 5; NO 11; PP. L103-L104; BIBL. 7 REF.Serial Issue

MEASUREMENTS OF THE EROSION OF STAINLESS STEEL, CARBON, AND SIC BY HYDROGEN BOMBARDMENT IN THE ENERGY RANGE OF 0.5-7.5 KEVBEHRISCH R; BOHDANSKY J; OETJEN GH et al.1976; J. MATER. NUCL.; PAYS-BAS; DA. 1976; VOL. 60; NO 3; PP. 321-329; ABS. FR. ALLEM.; BIBL. 37 REF.Article

MAKING INTEGRATED CIRCUITS WITH ION BEAMS.1975; BELL LAB. REC.; U.S.A.; DA. 1975; VOL. 53; NO 5; PP. 252Article

SPUTTERING OF SILICON AND GALLIUM ARSENIDE WITH MEDIUM ENERGY INTENSE ION BEAMS OF ARGON AND XENON.PEARMAIN K; UNVALA BA.1975; VACUUM; G.B.; DA. 1975; VOL. 25; NO 1; PP. 3-7; BIBL. 30 REF.Article

ION BEAMS PROMISE PRACTICAL SYSTEMS FOR SUBMICROMETER WAFER LITHOGRAPHYSELIGER RL; SULLIVAN PA.1980; ELECTRONICS; USA; DA. 1980; VOL. 53; NO 7; PP. 142-146Article

CHARACTERIZATION OF SI SURFACE BY ELLIPSOMETRYOHIRA F; ITAKURA M.1979; BULL. JAP. SOC. PRECIS. ENGNG; JPN; DA. 1979; VOL. 13; NO 3; PP. 152-154Article

VISUAL ION-BEAM IMAGES PRODUCED BY ELECTRON AND ION-BEAM INTERACTION ON SURFACES.FINE J; GORDEN R JR.1978; J. APPL. PHYS.; U.S.A.; DA. 1978; VOL. 49; NO 3 PART. 1; PP. 1236-1240; BIBL. 4 REF.Article

A SWEPT-FOCUS SCHEME FOR AN ION-BEAM LASER.LOUISELL WH; SEELY JF; SHNIDMAN R et al.1977; J. APPL. PHYS.; U.S.A.; DA. 1977; VOL. 48; NO 2; PP. 711-717; BIBL. 7 REF.Article

NEGATIVE ION SOURCES AND STRIPPING.1976; I.E.E.E. TRANS. NUCL. SCI.; U.S.A.; DA. 1976; VOL. 23; NO 2; PP. 1098-1144; BIBL. DISSEM.; (INT. CONF. HEAVY ION SOURCES. PROC.; GATLINBURG, TENN.; 1975)Conference Paper

OBSERVATION OF A SELF-COLLIDING BEAM.MAGLICH B; MAZARAKIS M; ROBINSON B et al.1975; APPL. PHYS. LETTERS; U.S.A.; DA. 1975; VOL. 26; NO 11; PP. 609-612; BIBL. 4 REF.Article

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