Dependence of the anisotropy of wet chemical etching of silicon on the amount of surface coverage by OH radicalsGOSALVEZ, Miguel A; FOSTER, Adam S; NIEMINEN, Risto M et al.Sensors and materials. 2003, Vol 15, Num 2, pp 53-65, issn 0914-4935, 13 p.Article

Adsorption of metal impurities on H-terminated Si surfaces and their influence on the wet chemical etching of Si : Surface, interface and atomic-scale scienceHYNNINEN, Teemu; FOSTER, Adam S; GOSALVEZ, Miguel A et al.Journal of physics. Condensed matter (Print). 2008, Vol 20, Num 48, issn 0953-8984, 485005.1-485005.9Article

Experimental humidity dependency of small particle adhesion on silica and titaniaPAAJANEN, Matti; KATAINEN, Jukka; PAKARINEN, Olli H et al.Journal of colloid and interface science. 2006, Vol 304, Num 2, pp 518-523, issn 0021-9797, 6 p.Article

Measuring site-specific cluster-surface bond formationHOFFMANN, Regina; BARTH, Clemens; FOSTER, Adam S et al.Journal of the American Chemical Society. 2005, Vol 127, Num 50, pp 17863-17866, issn 0002-7863, 4 p.Article