Pascal and Francis Bibliographic Databases

Help

Search results

Your search

kw.\*:("Faisceau ionique")

Document Type [dt]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Publication Year[py]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Discipline (document) [di]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Language

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Author Country

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Origin

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Results 1 to 25 of 8684

  • Page / 348
Export

Selection :

  • and

Low-aberration einzel lens for a focused-ion-beam systemKURIHARA, K.Japanese journal of applied physics. 1985, Vol 24, Num 2, pp 225-230, issn 0021-4922Article

FIGURING MINIATURE ASPHERICS. ION POLISHINGKARGER AM.1973; APPL. OPT.; U.S.A.; DA. 1973; VOL. 12; NO 3; PP. 451-454; BIBL. 2 REF.Serial Issue

Caractéristiques d'émittance des faisceaux ioniquesRUDYAK, YU. V.Žurnal tehničeskoj fiziki. 1984, Vol 54, Num 7, pp 1334-1337, issn 0044-4642Article

PHYSICS OF ION PLATING AND ION BEAM DEPOSITIONAISENBERG S; CHABOT RW.1973; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1973; VOL. 10; NO 1; PP. 104-107; BIBL. 7 REF.Serial Issue

First evidence of tyre debris characterization at the nanoscale by focused ion beamMILANI, M; PUCILLO, F. P; BALLERINI, M et al.Materials characterization. 2004, Vol 52, Num 4-5, pp 283-288, issn 1044-5803, 6 p.Article

Self-aligned broad-beam ion opticsLOSSY, R; ENGEMANN, J; ÜNAL, N et al.I.E.E.E. transactions on electron devices. 1992, Vol 39, Num 2, pp 444-447, issn 0018-9383Article

Focused Ion Beam (FIB)-basierte Zielpräparation an Transistoren der 70 nm-Generation zur Elektronenholographie = Focused Ion Beam (FIB) Based Target Preparation on Transistors of the 70 nm Generation for Electron HolographyMÜHLE, Uwe; SICKMANN, Jan; HILLMANN, Lutz et al.Praktische Metallographie. 2009, Vol 46, Num 10, pp 509-520, issn 0032-678X, 12 p.Article

RELAXATION D'UN FAISCEAU IONIQUE INJECTE DANS LE PLASMA TRANSVERSALEMENT A UN CHAMP MAGNETIQUEBORISENKO AG; KIRICHENKO GS.1972; ZH. EKSPER. TEOR. FIZ., PIS'MA REDAKC.; S.S.S.R.; DA. 1972; VOL. 16; NO 6; PP. 349-352; BIBL. 12 REF.Serial Issue

ION MILLING (ION BEAM ETCHING), 1975-1978: A BIBLIOGRAPHYHAWKINS DT.1979; J. VAC. SCI. TECHNOL.; ISSN 0022-5355; USA; DA. 1979; VOL. 16; NO 4; PP. 1051-1071Article

NEUTRALISED ION BEAM MILLING: ANOMALOUS SPUTTER YIELD BEHAVIOURPITT CW; SPINGH SP.1980; ELECTRON. LETT.; ISSN 0013-5194; GBR; DA. 1980; VOL. 16; NO 19; PP. 721-722; BIBL. 12 REF.Article

A NEW PRODUCTION TECHNIQUE: ION MILLING. II: APPLICATIONSBOLLINGER D; FINK R.1980; SOLID STATE TECHNOL.; ISSN 0038-111X; USA; DA. 1980; VOL. 23; NO 12; PP. 97-103; BIBL. 10 REF.Article

Focused ion beams in microelectronic fabricationDOHERTY, J. A; WARD, B. W; KELLOGG, E. M et al.IEEE transactions on components, hybrids, and manufacturing technology. 1983, Vol CHMT 6, Num 3, pp 329-333, issn 0148-6411Article

Formation d'un faisceau d'ion dans une source ionique multiouvertureDANILOVICH, N. I.Izvestiâ vysših učebnyh zavedenij. Radiofizika. 1984, Vol 27, Num 8, pp 1056-1064, issn 0021-3462Article

3D-computer simulation of ion-beam deflection caused by the displacement of extraction electrodesOTA, K; INOUE, N; NIHEI, H et al.Japanese journal of applied physics. 1984, Vol 23, Num 9, pp 1241-1245, issn 0021-4922Article

Focused Ion Beam : A Versatile Technique for the Fabrication of Nano-DevicesSANTSCHI, Christian; PRZYBYLSKA, Joanna; GUILLAUMEE, Mickael et al.Praktische Metallographie. 2009, Vol 46, Num 3, pp 154-156, issn 0032-678X, 3 p.Article

Automated X-ray elemental analysis in three dimensions using a dual beam-focused Ion beam systemSCHAFFER, Miroslava; WAGNER, Julian; SCHRÖTTNER, Hartmuth et al.Praktische Metallographie. 2007, Vol 44, Num 5, pp 248-250, issn 0032-678X, 3 p.Article

Energie et flux d'énergie des ondes avec une phase complexe dans des milieux avec une «fenêtre de transparence»EFIMOV, S. P; YUDIN, L. A.Izvestiâ vysših učebnyh zavedenij. Radiofizika. 1984, Vol 27, Num 6, pp 690-696, issn 0021-3462Article

Characteristics of intense ion beam in pinch reflex diodeYOSHINOUCHI, A; OZAKI, T; MIYAMOTO, S et al.Japanese journal of applied physics. 1983, Vol 22, Num 8, pp 485-487, issn 0021-4922Article

Génération de flux intenses d'ions négatifsAGAFONOV, A. V; KOLOMENSKIJ, A. A; LEBEDEV, A. N et al.ZETF. Pis′ma v redakciû. 1983, Vol 84, Num 6, pp 2040-2045, issn 0044-4510Article

Fabrication and modification of photonic structures with focused ion beamCALLEGARI, Victor; NELLEN, Philipp M; BRÖNNIMANN, Rolf et al.Praktische Metallographie. 2007, Vol 44, Num 5, pp 239-243, issn 0032-678X, 5 p.Article

Proceedings of the 14th International Conference on Surface Modification of Materials by Ion Beams, SMMIB'05, Kuşadasi, 4-9 September, 2005OZTARHAN, Ahmet; BAGLIN, John E. E; BROWN, Ian G et al.Surface & coatings technology. 2007, Vol 201, Num 19-20, issn 0257-8972, 671 p.Conference Proceedings

Low energy nuclear cross sections in metalsKASAGI, Jirohta.Surface & coatings technology. 2007, Vol 201, Num 19-20, pp 8574-8578, issn 0257-8972, 5 p.Conference Paper

InstrumentationTAPPER, U. A. S; MALMQVIST, K. G.Analytical chemistry (Washington, DC). 1991, Vol 63, Num 14, issn 0003-2700, 715 A-725 AArticle

Study of beam divergence of low-energy (1-3 keV) ion sourceYATSU, K; AOKI, S; HORIE, A et al.Japanese journal of applied physics. 1983, Vol 22, Num 6, issn 0021-4922, 1071Article

The application of focused ion beam microscopy in the material sciencesMUNROE, P. R.Materials characterization. 2009, Vol 60, Num 1, pp 2-13, issn 1044-5803, 12 p.Article

  • Page / 348