Evolution des dépôts par voie sèche (PVD et CVD) = Evolution of dry coatings (PVD and CVD)ZEGA, B.Le Vide, les couches minces. 1986, Num 232, pp 3-12, issn 0223-4335Conference Paper

Vapour deposition of engineering coatings = Dépôt en phase vapeur des revêtements technologiquesEDWARDS, J.Transactions of the Institute of Metal Finishing. 1986, Vol 64, Num 4, pp 17-23, issn 0020-2967Article

Vapor phase propylene epoxidation kineticsQIAN, G; YUAN, Y. H; WU, W et al.Studies in surface science and catalysis. 2006, pp 333-336, issn 0167-2991, isbn 0-444-51733-2, 4 p.Conference Paper

Conformal vapor phase growth of submicron thick (100) GaAs filmsPRIBAT, D; COLLET, C; LEGAGNEUX, P et al.Applied physics letters. 1990, Vol 56, Num 20, pp 2007-2009, issn 0003-6951Article

Crystalline CrV_0.95P_0.05O₄ catalyst for the vapor-phase oxidation of picolinesTAKEHIRA, K; SHISHIDO, T; SONG, Z et al.Catalysis today. 2004, Vol 91-92, pp 7-11, issn 0920-5861, 5 p.Conference Paper

Oxi-condensation of n-pentane to phthalic anhydrideCENTI, G; BURATTINI, M; TRIFIRO', F et al.Applied catalysis. 1987, Vol 32, Num 1-2, pp 353-356, issn 0166-9834Article

P.V.D. hard coatings: new dimension in surface technology = Revêtements durs par dépôt physique en phase vapeur: une nouvelle dimension en technologie de surfaceMUENZ, W. D.Le Vide, les couches minces. 1986, Num 232, pp 13-25, issn 0223-4335Conference Paper

Formation pathway of various oxygenated compounds for the homogeneous oxidation of isopentane in the vapor phaseNAGATA, Hideo; TASHIRO, Shizuka; KISHIDA, Masahiro et al.Sekiyu Gakkai Shi. 2001, Vol 44, Num 6, pp 392-396, issn 0582-4664Article

Optical anisotropy associated with the rotational alignment of complex-molecule vaporsTOLKACHEV, V. A.Optics and spectroscopy. 1991, Vol 71, Num 3, pp 269-272, issn 0030-400XArticle

Vapor-phase reduction of aldehydes and ketones with 2-propanol over hydrous zirconium oxideSHIBAGAKI, M; TAKAHASHI, K; KUNO, H et al.Chemistry Letters. 1988, Num 10, pp 1633-1636, issn 0366-7022Article

Introducing SECA: a new industry associationTEETER, Frederick J.Advanced materials & processes. 2001, Vol 159, Num 7, pp 28-30, issn 0882-7958Article

Application of a Hall accelerator to diamondlike carbon film coatingsOKADA, M; TOKU, H; YAMAMOTO, Y et al.Japanese journal of applied physics. 1992, Vol 31, Num 6A, pp 1845-1854, issn 0021-4922, 1Article

In-situ optical monitoring of the decomposition process of gaseous sources in metal-organic chemical vapor deposition and atomic layer epitaxyKOBAYASHI, N; KOBAYASHI, Y; YAMAUCHI, Y et al.Applied surface science. 1992, Vol 60-61, pp 544-552, issn 0169-4332Conference Paper

Real time in situ observation of (001) GaAs in OMCVD by reflectance difference spectroscopyKAMIYA, I; ASPNES, D. E; TANAKA, H et al.Applied surface science. 1992, Vol 60-61, pp 534-543, issn 0169-4332Conference Paper

Growth and Characterization of GaN Nanowires by NiCl₂ Assisted Chemical Vapor DepositionXIAOFENG WEI; FENG SHI.Metallurgical and materials transactions. A, Physical metallurgy and materials science. 2011, Vol 42, Num 12, pp 3838-3843, issn 1073-5623, 6 p.Article

Free molecular transport and deposition in cylindrical featuresCALE, T. S; RAUPP, G. B.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1990, Vol 8, Num 4, pp 649-655, issn 0734-211X, 7 p.Article

Les dépôts céramiques = Ceramic depositionFAUCHAIS, P; DESMAISON, J; MACHET, J et al.L' Industrie céramique (Paris). 1987, Num 812, pp 48-56, issn 0019-9044Article

Evaporation à l'aide d'arcs électriques sous vide pour l'obtention de dépôt P.V.D = Evaporation with vacuum electric arc for PVD coatingsJACQUOT, P.Le Vide, les couches minces. 1986, Num 232, pp 35-37, issn 0223-4335Conference Paper

Vapor-phase synthesis of nanoparticles : Polymers and nanomaterialsSWIHART, Mark T.Current opinion in colloid & interface science. 2003, Vol 8, Num 1, pp 127-133, issn 1359-0294, 7 p.Article

Influence de la présence d'impuretés sur le processus de condensation d'une vapeur en cours de détente en tuyère = The effect of the presence of impurities on the condensation process of a vapour expanding in a nozzleJURSKI, K; GEHIN, E; PIAR, G et al.Utilisation dela thermodynamique de la détente dans les organes et les machines. Journée. 1998, pp 1-12Conference Paper

Ein neuartiges Probenahmeverfahren für die Bestimmung niedriger Staubgehalte in wasserdampfgesättigten Abgasen = A new sampling system for the determination of low dust loads in exhaust gases saturated with water vapourGRITSCH, T; KRÄMER, E.Staub. Reinhaltung der Luft. 1995, Vol 55, Num 9, pp 329-334, issn 0039-0771Article

Self-organized phases combined with IDC devices-switchable materials for solvent vapor detectionDICKERT, F. L; KEPPLER, M.Advanced materials (Weinheim). 1995, Vol 7, Num 12, pp 1020-1023, issn 0935-9648Article

New vapor phase spontaneous Raman spectrometerROBINSON, J. C; FINK, M; MIHILL, A et al.Review of scientific instruments. 1992, Vol 63, Num 6, pp 3280-3284, issn 0034-6748Article

Spectral characteristics of intra-Doppler dynamic holograms in rubidium vaporsKOROLEV, A. E; LEBEDEV, E. A; NAZAROV, V. N et al.Optics and spectroscopy. 1991, Vol 71, Num 3, pp 301-303, issn 0030-400XArticle

Synthesis of 2,3,6-trimethyl phenol from m-cresol over MgO^aDURGAKUMARI, V; SREEKANTH, G; NARAYANAN, S et al.Research on chemical intermediates. 1990, Vol 14, Num 3, pp 223-233, issn 0922-6168, 11 p.Article