Pascal and Francis Bibliographic Databases

Help

Search results

Your search

kw.\*:("Fotolitografía")

Document Type [dt]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Publication Year[py]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Discipline (document) [di]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Language

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Author Country

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Origin

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Results 1 to 25 of 7220

  • Page / 289

Export

Selection :

  • and

Photomask and next-generation lithography mask technology XIII (18-20 April, 2006, Yokohama, Japan)Hoga, Morihisa.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6358-2, 2 vol, isbn 0-8194-6358-2Conference Proceedings

Messtechnische Erfassung der Bildleistung photolithographischer Objektive durch Wellenflächenanalyse = Estimation métrologique des performances image en photolithogravure par analyse du front d'onde = Metrological assessment of the imaging performance of photolithographic objectives by wave front analysisFREITAG, W; GROSSMANN, W; GRUNEWALD, U et al.Experimentelle Technik der Physik. 1988, Vol 36, Num 6, pp 417-428, issn 0014-4924Article

Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)Martin, Patrick M; Naber, Robert J.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6444-9, 2Vol, pagination multiple, isbn 0-8194-6444-9Conference Proceedings

More evolved PGSD (Proximity Gap Suction Developer) for controlling movement of dissolution productsSAKURAI, Hideaki; OPPATA, Yukio; KAMEI, Shigenori et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 63494J.1-63494J.8, issn 0277-786X, isbn 0-8194-6444-9, 2VolConference Paper

Photolithography at 193 nmROTHSCHILD, M; GOODMAN, R. B; HARTNEY, M. A et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2989-2996, issn 1071-1023Conference Paper

Limits of optical lithographyWILCZYNSKI, J. S.Polymer engineering and science. 1986, Vol 26, Num 16, issn 0032-3888, 1145Article

Optical microlithography XXI (26-29 February 2008, San Jose, California, USA)Levinson, Harry J; Dusa, Mircea V.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7109-3, 3 v, isbn 978-0-8194-7109-3Conference Proceedings

157-nm Photomask handling and infrastructure: Requirements and feasibilityCULLINS, Jerry; MUZIO, Ed.SPIE proceedings series. 2001, pp 52-60, isbn 0-8194-4032-9, 2VolConference Paper

Prospects for using existing resists for evaluating 157-nm imaging systemsFEDYNYSHYN, Theodore H; KUNZ, Roderick R; DORAN, Scott P et al.SPIE proceedings series. 2000, pp 335-346, isbn 0-8194-3617-8Conference Paper

Application of development-free vapor photolithography in etching silicon nitrideXIAOYIN HONG; SHENGQUAN DUAN; JIANPING LU et al.SPIE proceedings series. 1998, pp 478-486, isbn 0-8194-2776-4Conference Paper

Optical microlithography XX (27 February-2 March 2007, San Jose, California, USA)Flagello, Donis G.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6639-6, 3 v, isbn 978-0-8194-6639-6Conference Proceedings

Microparticles of all shapes and chemistriesMUKHOPADHYAY, Rajendrani.Analytical chemistry (Washington, DC). 2006, Vol 78, Num 13, pp 4247-4247, issn 0003-2700, 1 p.Article

Optical microlithography XXIV (1-3 March 2011, San Jose, California, United States)Dusa, Mircea V.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 2 vol, 2, isbn 978-0-8194-8532-8Conference Proceedings

Development of Photosensitive SilsesquioxaneTASHIRO, Yuji; SEKITO, Takeshi; IWATA, Takafumi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7140, issn 0277-786X, isbn 978-0-8194-7381-3 0-8194-7381-2, 71402O.1-71402O.11, 2Conference Paper

Polymers for 157 nm photoresist applications : A progress reportPATTERSON, Kyle; YAMACHIKA, Mikio; CONLEY, Willard et al.SPIE proceedings series. 2000, pp 365-374, isbn 0-8194-3617-8Conference Paper

Mask Data Correction Methodology in the Context of Model-Based Fracturing and Advanced Mask ModelsPIERRAT, Christophe; CHAU, Larry; BORK, Ingo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79732J.1-79732J.11, 2Conference Paper

Photomask technology 2008 (7-10 October 2008, Monterey, California, USA)Kawahira, Hiroichi; Zurbrick, Larry S.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7122, issn 0277-786X, isbn 978-0-8194-7355-4 0-8194-7355-3, 2 vol, 2, isbn 978-0-8194-7355-4 0-8194-7355-3Conference Proceedings

24th annual BACUS symposium on photomask technology (Monterey CA, 14-17 October 2004)Staud, Wolfgang; Weed, J. Tracy.SPIE proceedings series. 2004, isbn 0-8194-5513-X, 2Vol, XIX, 1450 p, isbn 0-8194-5513-XConference Proceedings

Photolithography at wavelengths below 200 nmROTHSCHILD, M.SPIE proceedings series. 1998, pp 222-228, isbn 0-8194-2713-6Conference Paper

Depth of focus enhancement in optical lithographyVON BRÜNAU, R; OWEN, G; PEASE, R. F. W et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 3047-3054, issn 1071-1023Conference Paper

Photomask technology 2007 (18-21 September, 2007, Monterey, California, USA)Naber, Robert J; Kawahira, Hiroichi.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6887-1, 3 vol, isbn 978-0-8194-6887-1Conference Proceedings

High power injection lock 6kHz 60W laser for ArF dry/wet lithographyMIZOGUCHI, Hakaru; INOUE, T; YOSHINO, M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 2, 615425.1-615425.10Conference Paper

Optical microlithography XVII (Santa Clara CA, 24-27 January 2004)Smith, Bruce W.SPIE proceedings series. 2004, isbn 0-8194-5290-4, 3Vol, XXIII, 2008 p, isbn 0-8194-5290-4Conference Proceedings

Asymmetric biasing for subgrid pattern adjustmentWONG, Alfred K; LIEBMANN, Lars W.SPIE proceedings series. 2001, pp 1548-1553, isbn 0-8194-4032-9, 2VolConference Paper

Optical microlithography XV (Santa Clara CA, 5-8 March 2002)Yen, Anthony.SPIE proceedings series. 2002, isbn 0-8194-4437-5, 2Vol, XLIV, 1778 p, isbn 0-8194-4437-5Conference Proceedings

  • Page / 289