Photomask and next-generation lithography mask technology XIII (18-20 April, 2006, Yokohama, Japan)Hoga, Morihisa.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6358-2, 2 vol, isbn 0-8194-6358-2Conference Proceedings

Messtechnische Erfassung der Bildleistung photolithographischer Objektive durch Wellenflächenanalyse = Estimation métrologique des performances image en photolithogravure par analyse du front d'onde = Metrological assessment of the imaging performance of photolithographic objectives by wave front analysisFREITAG, W; GROSSMANN, W; GRUNEWALD, U et al.Experimentelle Technik der Physik. 1988, Vol 36, Num 6, pp 417-428, issn 0014-4924Article

Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)Martin, Patrick M; Naber, Robert J.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6444-9, 2Vol, pagination multiple, isbn 0-8194-6444-9Conference Proceedings

More evolved PGSD (Proximity Gap Suction Developer) for controlling movement of dissolution productsSAKURAI, Hideaki; OPPATA, Yukio; KAMEI, Shigenori et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 63494J.1-63494J.8, issn 0277-786X, isbn 0-8194-6444-9, 2VolConference Paper

Photolithography at 193 nmROTHSCHILD, M; GOODMAN, R. B; HARTNEY, M. A et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2989-2996, issn 1071-1023Conference Paper

Optical microlithography XXI (26-29 February 2008, San Jose, California, USA)Levinson, Harry J; Dusa, Mircea V.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7109-3, 3 v, isbn 978-0-8194-7109-3Conference Proceedings

157-nm Photomask handling and infrastructure: Requirements and feasibilityCULLINS, Jerry; MUZIO, Ed.SPIE proceedings series. 2001, pp 52-60, isbn 0-8194-4032-9, 2VolConference Paper

Prospects for using existing resists for evaluating 157-nm imaging systemsFEDYNYSHYN, Theodore H; KUNZ, Roderick R; DORAN, Scott P et al.SPIE proceedings series. 2000, pp 335-346, isbn 0-8194-3617-8Conference Paper

Application of development-free vapor photolithography in etching silicon nitrideXIAOYIN HONG; SHENGQUAN DUAN; JIANPING LU et al.SPIE proceedings series. 1998, pp 478-486, isbn 0-8194-2776-4Conference Paper

Optical microlithography XX (27 February-2 March 2007, San Jose, California, USA)Flagello, Donis G.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6639-6, 3 v, isbn 978-0-8194-6639-6Conference Proceedings

Microparticles of all shapes and chemistriesMUKHOPADHYAY, Rajendrani.Analytical chemistry (Washington, DC). 2006, Vol 78, Num 13, pp 4247-4247, issn 0003-2700, 1 p.Article

Polymers for 157 nm photoresist applications : A progress reportPATTERSON, Kyle; YAMACHIKA, Mikio; CONLEY, Willard et al.SPIE proceedings series. 2000, pp 365-374, isbn 0-8194-3617-8Conference Paper

Photomask technology 2007 (18-21 September, 2007, Monterey, California, USA)Naber, Robert J; Kawahira, Hiroichi.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6887-1, 3 vol, isbn 978-0-8194-6887-1Conference Proceedings

High power injection lock 6kHz 60W laser for ArF dry/wet lithographyMIZOGUCHI, Hakaru; INOUE, T; YOSHINO, M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 2, 615425.1-615425.10Conference Paper

Optical microlithography XVII (Santa Clara CA, 24-27 January 2004)Smith, Bruce W.SPIE proceedings series. 2004, isbn 0-8194-5290-4, 3Vol, XXIII, 2008 p, isbn 0-8194-5290-4Conference Proceedings

Asymmetric biasing for subgrid pattern adjustmentWONG, Alfred K; LIEBMANN, Lars W.SPIE proceedings series. 2001, pp 1548-1553, isbn 0-8194-4032-9, 2VolConference Paper

Optical microlithography XV (Santa Clara CA, 5-8 March 2002)Yen, Anthony.SPIE proceedings series. 2002, isbn 0-8194-4437-5, 2Vol, XLIV, 1778 p, isbn 0-8194-4437-5Conference Proceedings

Continuous Image Writer with improved critical dimension performance for high-accuracy maskless optical patterningPAUFLER, J; BRUNN, St; KÖRNER, T et al.Microelectronic engineering. 2001, Vol 57-58, pp 31-40, issn 0167-9317Conference Paper

Simulation-based defect printability analysis for 0.13μm technologyTINAZTENE, Cihan; KAGAMI, Ichiro.SPIE proceedings series. 2001, pp 518-519, isbn 0-8194-4111-2Conference Paper

Photoresist silylation and dry development for sub-micron photolithographyZHOU, R; ALLSOPP, D. W. E; WOOD, J et al.Vacuum. 1992, Vol 43, Num 1-2, pp 83-86, issn 0042-207XConference Paper

An exact solution for the optical absorbance of thin filmsBABU, S. V; BAROUCH, E.Studies in applied mathematics (Cambridge). 1987, Vol 77, Num 2, pp 173-182, issn 0022-2526Article

Polymeric materials for semi-conductor processing: photolithographic materialsPETHRICK, R. A.Progress in rubber and plastics technology. 1986, Vol 2, Num 2, pp 1-9, issn 0266-7320Article

Binary Cr etch process control directed at the 45nm nodePLUMHOFF, J; WESTERMAN, R; CONSTANTINE, C et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6358-2, vol 2, 62831U.1-62831U.10Conference Paper

Unifying the RET design flow with portable modeling informationSWEIS, Jason; STAUD, Wolf; NABER, Bob et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6358-2, vol 2, 62832V.1-62832V.6Conference Paper

Recent developments in micromilling using focused ion beam technologyTSENG, Ampere A.Journal of micromechanics and microengineering (Print). 2004, Vol 14, Num 4, pp R15-R34, issn 0960-1317Article