au.\*:("GOESELE U")
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SIMPLE RELATIONSHIP BETWEEN THE KINETICS OF CORRELATED AND UNCORRELATED DIFFUSION-CONTROLLED REACTIONSGOESELE U.1980; CHEM. PHYS. LETTERS; NLD; DA. 1980; VOL. 69; NO 2; PP. 332-335; BIBL. 27 REF.Article
LONG-RANGE ENERGY TRANSFER COMBINED WITH ISOTROPIC OR ANISOTROPIC DIFFUSION.GOESELE U.1978; SPECTROSC. LETTERS; USA; DA. 1978; VOL. 11; NO 7; PP. 445-454; BIBL. 28 REF.Article
DIFFUSION WITH STRONG DRIFT.GOESELE U.1977; COMMENTS SOLIDE STATE PHYS.; G.B.; DA. 1977; VOL. 8; NO 2; PP. 23-27; BIBL. 10 REF.Article
KINETICS OF SILICON STACKING FAULT GROWTH/SHRINKAGE IN AN OXIDIZING AMBIENT CONTAINING A CHLORINE COMPOUNDTAN TY; GOESELE U.1982; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1982; VOL. 53; NO 7; PP. 4767-4778; BIBL. 36 REF.Article
OXYGEN DIFFUSION AND THERMAL DONOR FORMATION IN SILICONGOESELE U; TAN TY.1982; APPL. PHYS., A SOLIDS SURF.; ISSN 0721-7250; DEU; DA. 1982; VOL. 28; NO 2; PP. 79-92; BIBL. 128 REF.Article
HIGH-TEMPERATURE DIFFUSION OF PHOSPHORUS AND BORON IN SILICON VIA VACANCIES OR VIA SELF-INTERSTITIALS.GOESELE U; STRUNK H.1979; APPL. PHYS.; ISSN 0340-3793; DEU; DA. 1979; VOL. 20; NO 4; PP. 265-273; BIBL. 65 REF.Article
STAGE II RECOVERY OF THERMAL NEUTRON IRRADIATED COPPER.ASPELING J; PIANI CSB; GOESELE U et al.1977; PHYS. LETTERS, A; NETHERL.; DA. 1977; VOL. 60; NO 2; PP. 153-155; BIBL. 23 REF.Article
MECHANISM AND KINETICS OF THE DIFFUSION OF GOLD IN SILICONGOESELE U; FRANK W; SEEGER A et al.1980; APPL. PHYS.; ISSN 0340-3793; DEU; DA. 1980; VOL. 23; NO 4; PP. 361-368; BIBL. 31 REF.Article
Diffusion mechanism of zinc and beryllium in gallium arsenideYU, S; TAN, T. Y; GOÊSELE, U et al.Journal of applied physics. 1991, Vol 69, Num 6, pp 3547-3565, issn 0021-8979, 19 p.Article