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BEITRAG ZUR DYNAMISCHEN KURZSCHLUSSBEANSPRUCHUNG IN SCHALTANLAGEN. = CONTRIBUTION AUX CONTRAINTES DYNAMIQUES DE COURT-CIRCUIT DANS LES INSTALLATIONS DE COMMUTATIONGROBER R; STEIN N.1976; ELEKTROTECH. Z., A; DTSCH.; DA. 1976; VOL. 97; NO 5; PP. 293-298; ABS. ANGL.; BIBL. 9 REF.Article

Evidence for an electron-hole plasma in the photoluminescence spectra of insulating InSb at very low pump intensitiesGROBER, R. D; DREW, H. D.Physical review. B, Condensed matter. 1991, Vol 43, Num 14, pp 11732-11739, issn 0163-1829, 8 p.Article

Magnetic-field-induced evolution from electron-hole plasma to excitonic gas in photoexcited InSbGROBER, R. D; DREW, H. D.Physical review. B, Condensed matter. 1991, Vol 44, Num 24, pp 13374-13380, issn 0163-1829Article

Crystal growth of Hg1-xMnxTe by solid state recrystallizationMANI, R. G; MCNAIR, T; LU, C. R et al.Journal of crystal growth. 1989, Vol 97, Num 3-4, pp 617-621, issn 0022-0248Article

Infrared photoluminescence of InAs epilayers grown on GaAs and Si substratesGROBER, R. D; DREW, H. D; CHYI, J.-I et al.Journal of applied physics. 1989, Vol 65, Num 10, pp 4079-4081, issn 0021-8979Article

Frequency and intensity modulation characteristics GaAs lasers in an external cavityCARTER, G. M; KAO-YANG HUANG; BROTMAN, J et al.IEEE journal of quantum electronics. 1993, Vol 29, Num 12, pp 2910-2918, issn 0018-9197Article

Direct measurement of the recombination rates in bulk InSb by time-resolved photoluminescenceGROBER, R. D; DREW, H. D; BURDGE, G. L et al.Journal of applied physics. 1992, Vol 71, Num 10, pp 5140-5145, issn 0021-8979Article

Playing with polaritySTUTZMANN, M; AMBACHER, O; EICKHOFF, M et al.Physica status solidi. B. Basic research. 2001, Vol 228, Num 2, pp 505-512, issn 0370-1972Conference Paper

Strain and dislocation reduction in maskless pendeo-epitaxy GaN thin filmsROSKOWSKI, A. M; MIRAGLIA, P. Q; PREBLE, E. A et al.Physica status solidi. A. Applied research. 2001, Vol 188, Num 2, pp 729-732, issn 0031-8965Conference Paper

Evaluation of photoacid generators in chemically amplified resists for X-ray lithography using an on-wafer photoacid determination techniqueBING LU; DENTINGER, P. M; TAYLOR, J. W et al.SPIE proceedings series. 1999, isbn 0-8194-3150-8, 2Vol, Vol 2, 466-472Conference Paper

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