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Influence of gas medium on the sensitivity of an ionization type semiconductor photographic systemSALAMOV, B. G; COLAKOGLU, K; ALTINDAL, S et al.Imaging science journal. 1997, Vol 45, Num 2, pp 65-68, issn 1368-2199Article

Simulation of micro discharges for the optimization of energy requirements for removal of NO_x from exhaust gases : Special issue on images in plasma scienceRUSS, H; NEIGER, M; LANG, J. E et al.IEEE transactions on plasma science. 1999, Vol 27, Num 1, pp 38-39, issn 0093-3813Article

Image of a gaseous discharge in microgravity : Special issue on images in plasma scienceDEMPSEY, D. L; GLOVER, T. W; KURT, C. M et al.IEEE transactions on plasma science. 1999, Vol 27, Num 1, pp 42-43, issn 0093-3813Article

Implementing arbitrarily shaped boundaries in two-dimensional discharge modelingHAGELAAR, G. J. M; KROESEN, G. M. W.IEEE transactions on plasma science. 1999, Vol 27, Num 6, pp 1606-1609, issn 0093-3813Article

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Time evolution of hollow cathode ionization processes in the final breakdown phase of a transient hollow cathode dischargeZAMBRA, M; FAVRE, M; MORENO, J et al.IEEE transactions on plasma science. 1999, Vol 27, Num 3, pp 748-751, issn 0093-3813Article

One-dimensional modelling of low-frequency and high-pressure Xe barrier discharges for the design of excimer lampsODA, A; SAKAI, Y; AKASHI, H et al.Journal of physics. D, Applied physics (Print). 1999, Vol 32, Num 21, pp 2726-2736, issn 0022-3727Article

High-speed imaging system of luminous intensity distribution of plasma using light emission CTKAWAMURA, H; SAITO, H; YUASA, K et al.Optics communications. 1995, Vol 119, Num 1-2, pp 197-206, issn 0030-4018Article

Comprehensive parameter study of a micro-hollow cathode discharge containing xenonADLER, F; DAVLIATCHINE, E; KINDEL, E et al.Journal of physics. D, Applied physics (Print). 2002, Vol 35, Num 18, pp 2291-2297, issn 0022-3727, 7 p.Article

Further statistical studies of ionization growth and breakdown formation mechanisms in the final breakdown phase of a Transient Hollow Cathode DischargeMORENO, José; ZAMBRA, Marcelo; FAVRE, Mario et al.IEEE transactions on plasma science. 2002, Vol 30, Num 1, pp 417-422, issn 0093-3813, 6 p., 3Article

A critique of models of electronegative plasmasFRANKLIN, R. N.Plasma sources science & technology (Print). 2001, Vol 10, Num 2, pp 162-167, issn 0963-0252Conference Paper

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Auto-solitary solutions in a generalized model of gas discharge contractionSONNEMANN, G. R; SEMENOV, V. E.The European physical journal. D, Atomic, molecular and optical physics (Print). 2000, Vol 11, Num 3, pp 481-489, issn 1434-6060Article

Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources : Special issue on the modeling of collisional or near-collisionless low-temperature plasmasRAUF, S; KUSHNER, M. J.IEEE transactions on plasma science. 1999, Vol 27, Num 5, pp 1329-1338, issn 0093-3813Article

Transverse-discharge flashlamp operation : a surface model of gas breakdown as a first step towards representing discharge initiationTRUSOV, K. K.Journal of physics. D, Applied physics (Print). 1999, Vol 32, Num 8, pp 845-854, issn 0022-3727Article

Density measurements from the asymmetry of the Lyman ξ line in a vacuum spark lithium dischargePODDER, N. K; CLOTHIAUX, E. J; OKS, E et al.Contributions to plasma physics (1985). 1999, Vol 39, Num 6, pp 529-539, issn 0863-1042Article

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Arc discharge rotation in external magnetic field-nonuniformities and formation of a nonlinear dynamic system : Special Issue on High-Pressure Arcs and High-Frequency Thermal PlasmasHLINA, J; NENICKA, V.IEEE transactions on plasma science. 1997, Vol 25, Num 5, pp 846-851, issn 0093-3813Article

On the use of actinometry to measure the dissociation in O₂ DC glow discharges : determination of the wall recombination probabilityPAGNON, D; AMORIM, J; NAHORNY, J et al.Journal of physics. D, Applied physics (Print). 1995, Vol 28, Num 9, pp 1856-1868, issn 0022-3727Article

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A model study of propagation of the first ionization wave during breakdown in a straight tube containing argonBROK, W. J. M; VAN DIJK, J; BOWDEN, M. D et al.Journal of physics. D, Applied physics (Print). 2003, Vol 36, Num 16, pp 1967-1979, issn 0022-3727, 13 p.Article

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Modeling of photoresist erosion in plasma etching processesDA ZHANG; RAUF, Shahid; SPARKS, Terry et al.IEEE transactions on plasma science. 2002, Vol 30, Num 1, pp 114-115, issn 0093-3813, 1Article