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A NEW PENALTY FUNCTION ELEMENT FOR THIN SHELL ANALYSISHAUGENEDER E.1982; INT. J. NUMER. METHODS ENG.; ISSN 0029-5981; GBR; DA. 1982; VOL. 18; NO 6; PP. 845-861; BIBL. 23 REF.Article

AUTOMATISCHE BERECHNUNG DER DURCHBIEGUNGEN UND DER SCHNITTGROESSEN DUENNER PLATTEN MIT HILFE DER FUNKTIONENTHEORIE. = CALCUL AUTOMATIQUE DES FLECHES ET DES EFFORTS DANS LES SECTIONS DE PLAQUES MINCES A L'AIDE DE LA THEORIE DES FONCTIONSHAUGENEDER E; PROCHAZKA W.1978; BAUINGENIEUR; DTSCH.; DA. 1978; VOL. 53; NO 7; PP. 243-248; BIBL. 15 REF.Article

ZUR GLAETTUNG UNSTETIGER SCHNITTKRAFTVERLAEUFE BEI DER BERECHNUNG VON SCHALENTRAGWERKER MITTEB DER METHODE DER FINITEN ELEMENTE = REGULARISATION DE COURBES D'EFFORTS TRANCHANTS DISCONTINUES DANS LE CALCUL DES COQUES MINCES, AU MOYEN DE LA METHODE DES ELEMENTS FINISRIESSLAND B; HAUGENEDER E.1983; BAUINGENIEUR; ISSN 0005-6650; DEU; DA. 1983; VOL. 58; NO 1; PP. 27-33; ABS. ENG; BIBL. 17 REF.Article

ZUR BERECHNUNG GROSSER VERFORMUNGEN VON GEKRUEMMTEN STAEBEN = SUR LE CALCUL DE GRANDES DEFORMATIONS DE POUTRES COURBESHAUGENEDER E; PROCHAZKA W.1981; ING. ARCH.; ISSN 0020-1154; DEU; DA. 1981; VOL. 50; NO 6; PP. 401-411; ABS. ENG; BIBL. 19 REF.Article

ON AN IMPROPER MODIFICATION OF A VARIATIONAL PRINCIPLE FOR FINITE ELEMENT PLATE ANALYSISHAUGENEDER E; MANG HA.1979; Z. ANGEW. MATH. MECH.; DDR; DA. 1979; VOL. 59; NO 11; PP. 637-640; BIBL. 6 REF.Article

SPANNUNGSANALYSE EINES DETAILS DER NEUEN WIENER REICHSBRUECKE = ANALYSE DES CONTRAINTES DANS UN DETAIL DU NEUEN WIENER REICHSBRUECKEHAUGENEDER E; MANG H; PROCHAZKA W et al.1981; OESTERR. ING.-Z.; ISSN 0029-9219; AUT; DA. 1981; VOL. 24; NO 3; PP. 100-104; BIBL. 2 REF.Article

A PREPROCESSOR FOR THE FINITE ELEMENT PROGRAM SAP IVHAUGENEDER E; PROCHAZKA W; TAVOLATO P et al.1981; INT. J. NUMER. METHODS ENG.; ISSN 0029-5981; GBR; DA. 1981; VOL. 17; NO 12; PP. 1779-1789; BIBL. 13 REF.Article

DER ABGASSCHALLDAEMPFERKANAL DER GASTURBINENANLAGE TIMELKAM III DER OBEROESTERREICHISCHEN KRAFTWERKE AG. = LE SILENCIEUX POUR GAZ D'ECHAPPEMENT DES TURBINES A GAZ DE LA CENTRALE TIMELKAM III DE LA OBEROESTERREICHISCHE KRAFTWERK AGHACKER H; HAUGENEDER E; MANG H et al.1975; BAUINGENIEUR; DTSCH.; DA. 1975; VOL. 50; NO 9; PP. 348-352Article

DIE ERRICHTUNG EINES RECHENLABORATORIUMS AM INSTITUT FUER FESTIGKEITSLEHRE DER TECHNISCHEN UNIVERSITAET WIEN. = CREATION D'UN LABORATOIRE DE CALCUL A L'INSTITUT POUR L'ENSEIGNEMENT DE LA RESISTANCE DES MATERIAUX DE L'UNIVERSITE TECHNIQUE DE VIENNEMUDRAK W; HAUGENEDER E; MANG H et al.1976; OESTERR. INGR-Z.; OESTERR.; DA. 1976; VOL. 19; NO 8; PP. 265-271; BIBL. 11 REF.Article

Improvements of the membrane bulging method for stress determination of silicon open stencil masks for ion projection lithographyDEGEN, A; VOIGT, J; SOSSNA, E et al.SPIE proceedings series. 2000, pp 97-104, isbn 0-8194-3614-3Conference Paper

Assembly of an aperture plate system for projection mask-less lithographyMOHAUPT, M; EBERHARDT, R; DAMM, C et al.Microelectronic engineering. 2006, Vol 83, Num 4-9, pp 980-983, issn 0167-9317, 4 p.Conference Paper

Stress relief structures for ion-beam projection lithography masksTEJEDA, R; ENGELSTAD, R; LOVELL, E et al.Microelectronic engineering. 1999, Vol 46, Num 1-4, pp 481-484, issn 0167-9317Conference Paper

Mechanical characterization of membrane like microelectronic componentsDRZIK, M; LÖSCHNER, H; HAUGENEDER, E et al.Microelectronic engineering. 2006, Vol 83, Num 4-9, pp 1036-1042, issn 0167-9317, 7 p.Conference Paper

Finite element simulation of ion-beam lithography mask fabricationTEJEDA, R; FRISQUE, G; ENGELSTAD, R et al.Microelectronic engineering. 1999, Vol 46, Num 1-4, pp 485-488, issn 0167-9317Conference Paper

Measures to achieve 20nm IPL stencil mask distortionHAUGENEDER, E; CHALUPKA, A; IRMSCHER, M et al.SPIE proceedings series. 2002, pp 23-31, isbn 0-8194-4531-2, 9 p.Conference Paper

Progress in placement control for ion beam stencil mask technologyKAMM, F.-M; EHRMANN, A; KRATZENBERG, M et al.SPIE proceedings series. 2001, pp 18-22, isbn 0-8194-4039-6Conference Paper

Mask manufacture for projection mask-less lithography (PML) : EMMS-technology for a programmable aperture platesystemREIMER, K; WITT, M; KÄHLER, D et al.SPIE proceedings series. 2005, pp 196-204, isbn 0-8194-5830-9, 9 p.Conference Paper

Progress in placement control for ion beam stencil mask technologyKAMM, F.-M; EHRMANN, A; STRUCK, T et al.SPIE proceedings series. 2001, pp 460-465, isbn 0-8194-4029-9Conference Paper

Placement measurement and FE modeling results for distortion control of stencil masksEHRMANN, A; STRUCK, T; KAESMAIER, R et al.SPIE proceedings series. 1999, pp 822-830, isbn 0-8194-3468-X, 2VolConference Paper

PN and SOI wafer flow process for stencil mask fabricationBUTSCHKE, J; EHRMANN, A; REUTER, C et al.SPIE proceedings series. 1999, pp 20-29, isbn 0-8194-3139-7Conference Paper

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