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Chemical vapour deposition of amorphous hydrogenated silicon with a CO2 laser : chemical mechanismHESCH, K; KARSTENS, H; HESS, P et al.Thin solid films. 1992, Vol 218, Num 1-2, pp 29-39, issn 0040-6090Article

Synthesis of polysulfides containing the triazeno group and their application as photoresists in excimer laser polymer ablationNUYKEN, O; DAHN, U; EHRFELD, W et al.Chemistry of materials. 1997, Vol 9, Num 2, pp 485-494, issn 0897-4756Article

Conceptual Design of a Toroidal Field Coil for a Fusion Power Plant Using High Temperature SuperconductorsGADE, P. V; BARTH, C; BAYER, C et al.IEEE transactions on applied superconductivity. 2014, Vol 24, Num 3, issn 1051-8223, 4202705.1-4202705.5Conference Paper

Kostengünstige Serienfertigung von Mikrobauteilen durch «Laser-LIGA» = Favourably priced series production of micro components by laser LIGAARNOLD, J; EHRFELD, W; HESCH, K et al.F & M. Feinwerktechnik, Mikrotechnik, Messtechnik. 1995, Vol 103, Num 1-2, pp 48-49, issn 0944-1018Article

Combination of excimer laser micromachining and replication processes suited for large scale productionARNOLD, J; DASBACH, U; EHRFELD, W et al.Applied surface science. 1995, Vol 86, Num 1-4, pp 251-258, issn 0169-4332Conference Paper

Laser CVD of a-Si:H from SiH4 and Si2H6 : relations between chemistry, growth rate and film propertiesHESCH, K; HESS, P; OETZMANN, H et al.Applied surface science. 1990, Vol 46, Num 1-4, pp 233-238, issn 0169-4332, 6 p.Conference Paper

Process characterization and mechanism for laser-induced chemical vapor deposition of a-Si:H from SiH4METZGER, D; HESCH, K; HESS, P et al.Applied physics. A, Solids and surfaces. 1988, Vol 45, Num 4, pp 345-353, issn 0721-7250Article

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