au.\*:("HUNG, Raymond J")
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Resist materials for 157 nm microlithography: An updateHUNG, Raymond J; TRAN, Hoang V; THOMAS, Brian H et al.SPIE proceedings series. 2001, pp 385-395, isbn 0-8194-4031-0, 2VolConference Paper
Metal-catalyzed addition polymers for 157 nm resist applications. Synthesis and polymerization of partially fluorinated, ester-functionalized tricyclo[4.2.1.02,5]non-7-enesSANDERS, Daniel P; CONNOR, Eric F; GRUBBS, Robert H et al.Macromolecules. 2003, Vol 36, Num 5, pp 1534-1542, issn 0024-9297, 9 p.Article
Metal-catalyzed vinyl addition polymers for 157 nm resist applications. 2. Fluorinated norbornenes: Synthesis, polymerization, and initial imaging resultsTRAN, Hoang V; HUNG, Raymond J; MACDONALD, Scott A et al.Macromolecules. 2002, Vol 35, Num 17, pp 6539-6549, issn 0024-9297Article
