au.\*:("IYANAGI, K")
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Predictable topography simulation of SiO2 etching by C5F8 gas combined with a plasma simulation, sheath model and chemical reaction modelTAKAGI, S; ONOUE, S; IYANAGI, K et al.Plasma sources science & technology (Print). 2003, Vol 12, Num 4, pp S64-S71, issn 0963-0252Article
