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Method for measurement of transferred power to plasma in inductive dischargesHWANG, Hye-Ju; KIM, Young-Cheol; CHUNG, Chin-Wook et al.Thin solid films. 2013, Vol 547, pp 9-12, issn 0040-6090, 4 p.Conference Paper

Inductively coupled plasma etching to fabricate sensing window for polymer waveguide biosensor applicationXIBIN WANG; JIE MENG; XIAOQIANG SUN et al.Applied surface science. 2012, Vol 259, pp 105-109, issn 0169-4332, 5 p.Article

Spatial Distribution of C2 Spectra From Induction Thermal Plasmas With Polymer Powder InjectionTANAKA, Yasunori; SAKUYAMA, Toshiaki; TAKEUCHI, Yoshitaka et al.IEEE transactions on plasma science. 2008, Vol 36, Num 4, pp 1058-1059, issn 0093-3813, 2 p., 1Article

High rate dry etching of (BiSb)2Te3 film by H4/H2-based plasmaJUNQIANG SONG; XUN SHI; LIDONG CHEN et al.Applied surface science. 2014, Vol 317, pp 457-461, issn 0169-4332, 5 p.Article

Deposition and characterization of low temperature silicon nitride films deposited by inductively coupled plasma CVDKSHIRSAGAR, Abhijeet; NYAUPANE, Pradeep; BODAS, Dhananjay et al.Applied surface science. 2011, Vol 257, Num 11, pp 5052-5058, issn 0169-4332, 7 p.Article

Etching and oxidation of InAs in planar inductively coupled plasmaDULTSEV, F. N; KESLER, V. G.Applied surface science. 2009, Vol 256, Num 1, pp 246-250, issn 0169-4332, 5 p.Article

Comparisons of the electrical characteristics by impedance matching conditions on the E―H and H―E transition and the hysteresis of inductively coupled plasmaLEE, Hyo-Chang; CHUNG, Chin-Wook.Thin solid films. 2012, Vol 521, pp 185-188, issn 0040-6090, 4 p.Conference Paper

Inductively coupled plasma etching for phase-change material with superlattice-like structure in phase change memory deviceJIAO ZHOU; YING CHEN; WENLI ZHOU et al.Applied surface science. 2013, Vol 280, pp 862-867, issn 0169-4332, 6 p.Article

Controllable wettability of poly(ethylene terephthlate) film modified by oxygen combined inductively and capacitively coupled radio-frequency plasmaLEI, M. K; LIU, Y; LI, Y. P et al.Applied surface science. 2011, Vol 257, Num 16, pp 7350-7358, issn 0169-4332, 9 p.Article

Narrow-band photoluminescence at room-temperature in amorphous SiCx:H filmZHOU, H. P; XU, M; WEI, D. Y et al.Journal of alloys and compounds. 2013, Vol 550, pp 279-282, issn 0925-8388, 4 p.Article

Hydrocarbon Plasma for Treatment of Biodegradable Food ContainersYUPING REN; XU, S; JIDONG LONG et al.IEEE transactions on plasma science. 2008, Vol 36, Num 4, pp 1306-1307, issn 0093-3813, 2 p., 1Article

Line-type inductively coupled plasma source with ferromagnetic moduleJONG HYEUK LIM; KYONG NAM KIM; GWANG HO GWEON et al.Journal of physics. D, Applied physics (Print). 2009, Vol 42, Num 1, issn 0022-3727, 015204.1-015204.5Article

Stanovenie kremika metodou AES ICP = Le dosage du silicium par la méthode AES ICPFERIANCIK, E; BLAHUT, L; HRIC, I et al.Geologický průzkum. 1990, Vol 32, Num 5, pp 146-148, issn 0016-772X, 3 p.Article

Inductively coupled plasma-mass spectrometry: the manufacturer's view = Spectrométrie de masse à plasma couplé inductivement: point de vue du fabricantCANTLE, J. E.Analytical proceedings. 1987, Vol 24, Num 1, issn 0144-557X, 10Conference Paper

External circuit system effects on chlorine plasma instabilitiesELLINGBOE, A. R; LAW, V. J; SOBERON, F et al.Electronics Letters. 2005, Vol 41, Num 9, pp 525-526, issn 0013-5194, 2 p.Article

Generation of Micro Inductively Coupled Plasma on a ChipTAGHIOSKOUI, Mazdak; ZAGHLOUL, Mona E; MONTASER, Akbar et al.IEEE transactions on plasma science. 2008, Vol 36, Num 4, pp 1262-1263, issn 0093-3813, 2 p., 1Article

Plasmas, ions et spectrométrie de masse = Plasmas,ions and spectrometryBEAUGRAND, C. G.Journal de chimie physique. 1993, Vol 90, Num 6, pp 1407-1410, issn 0021-7689Conference Paper

Inductively coupled plasma determination of nine rare-earth elements in sixty international geochemical reference samples = Détermination par plasma à couplage inductif de neuf terres rares dans soixante échantillons géochimiques de référenceROELANDTS, I.Geostandards newsletter. 1990, Vol 14, Num 1, pp 137-147, issn 0150-5505Article

Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design : Plasma ModellingKUSHNER, Mark J.Journal of physics. D, Applied physics (Print). 2009, Vol 42, Num 19, issn 0022-3727, 194013.1-194013.20Article

The application of inductively coupled plasma mass spectrometry in pharmaceutical and biomedical analysisJIANQUAN HUANG; XIN HU; JUNREN ZHANG et al.Journal of pharmaceutical and biomedical analysis. 2006, Vol 40, Num 2, pp 227-234, issn 0731-7085, 8 p.Article

Scaled Synthesis of Boron Nitride Nanotubes, Nanoribbons, and Nanococoons Using Direct Feedstock Injection into an Extended-Pressure, Inductively-Coupled Thermal PlasmaFATHALIZADEH, Aidin; PHAM, Thang; MICKELSON, William et al.Nano letters (Print). 2014, Vol 14, Num 8, pp 4881-4886, issn 1530-6984, 6 p.Article

Inductively coupled plasma mass spectrometry with an electrically floating sampling interfaceHU, K; HOUK, R. S.Journal of the American Society for Mass Spectrometry. 1993, Vol 4, Num 9, pp 733-741, issn 1044-0305Article

Rare earth elements in six new GSJ standard rock samples as determined by inductively coupled plasma atomic emission spectrometry = Détermination des terres rares dans six standards géochimiques de référence du GSJ par spectrométrie d'émission avec plasma à couplage inductifTOYODA, K; HARAGUCHI, H.Geostandards newsletter. 1986, Vol 10, Num 2, pp 173-175, issn 0150-5505Article

Growth characteristics of micro-plasma oxidation ceramic coatings on Ti alloy by inductively coupled plasma-atomic emission spectrometer techniqueZHONGPING YAO; ZHAOHUA JIANG; FUPING WANG et al.Applied surface science. 2007, Vol 253, Num 9, pp 4267-4272, issn 0169-4332, 6 p.Article

Computer simulation of enclosed inductively coupled plasma discharges. I: Monatomic gasesGAILLAT, A; BARNES, R. M; PROULX, P et al.Journal of analytical atomic spectrometry (Print). 1995, Vol 10, Num 11, pp 935-940, issn 0267-9477Conference Paper

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