Chemical composition and biocompatibility of Ti-Ag-O films prepared by ion beam assisted depositionXIANGHUI WANG; PROKERT, Friedrich; REUTHER, Helfried et al.Surface & coatings technology. 2004, Vol 185, Num 1, pp 12-17, issn 0257-8972, 6 p.Article

Stress generation mechanisms in carbon thin films grown by ion-beam depositionSULIN ZHANG; JOHNSON, Harley T; WAGNER, Gregory J et al.Acta materialia. 2003, Vol 51, Num 17, pp 5211-5222, issn 1359-6454, 12 p.Article

Correlation between the composition, structure and properties of dual ion beam deposited SiN_x filmsTSANG, M. P; ONG, C. W; CHOY, C. L et al.Thin solid films. 2003, Vol 424, Num 1, pp 143-147, issn 0040-6090, 5 p.Conference Paper

Transport properties of C₆₀ ultra-thin filmsIWATA, Nobuyuki; MUKAIMOTO, Keigo; IMAI, Hiroyuki et al.Surface & coatings technology. 2003, Vol 169-70, pp 646-649, issn 0257-8972, 4 p.Conference Paper

Effect of secondary ion beam energy and oxygen partial pressure on the structural, morphological and optical properties of ITO films prepared by DMIBD techniqueKIM, Daeil; KIM, Steven.Surface & coatings technology. 2002, Vol 154, Num 2-3, pp 204-208, issn 0257-8972Article

Influence of substrate bias voltage on the properties of Cu thin films by sputter type ion beam depositionLIMB, Jae-Won; ISHIKAWA, Yukio; MIYAKE, Kiyoshi et al.Materials transactions - JIM. 2002, Vol 43, Num 6, pp 1403-1408, issn 0916-1821Article

Ion beam induced growth of amorphous alloy films in the Co-Nb system during ion beam assisted depositionZENG, F; PAN, F.Journal of alloys and compounds. 2002, Vol 335, Num 1-2, pp 181-187, issn 0925-8388Article

Phase evolution of electron-beam evaporated Pb(Zr, Ti)O₃ thin filmsRASTOGI, A. C; DARVISH, S. R; BHATNAGAR, P. K et al.Materials chemistry and physics. 2002, Vol 73, Num 2-3, pp 135-143, issn 0254-0584Article

Deposition of TiN thin films on Si(100) by HCD ion platingCHOU, Wen-Jun; YU, Ge-Ping; HUANG, Jia-Hong et al.Surface & coatings technology. 2001, Vol 140, Num 3, pp 206-214, issn 0257-8972Article

Hot-pressed Ti-Al targets for synthesizing Ti_1-xAl_xN films by the arc ion plating methodKIMURA, Ayako; MURAKAMI, Tomohiro; YAMADA, Kunihiro et al.Thin solid films. 2001, Vol 382, Num 1-2, pp 101-105, issn 0040-6090Article

Negative bias dependence of sulfur and fluorine incorporation in diamond films etched by an SF₆ plasmaTEII, K; HORI, M; GOTO, T et al.Journal of the Electrochemical Society. 2001, Vol 148, Num 2, pp G55-G58, issn 0013-4651Article

Reversible phase change in Bi_xSe_100-x chalcogenide thin films for using as optical recording mediumHAFIZ, M. M; EL-SHAZLY, O; KINAWY, N et al.Applied surface science. 2001, Vol 171, Num 3-4, pp 231-241, issn 0169-4332Article

Layer of positive charge in the process of coating deposition in RF plasmaABDULLIN, I. Sh; KASHAPOV, N. F; KUDINOV, V. V et al.Fizika i himiâ obrabotki materialov. 2001, Num 6, pp 69-75, issn 0015-3214Article

Phase changes of CrN films annealed at high temperature under controlled atmosphereLU, Fu-Hsing; CHEN, Hong-Ying.Thin solid films. 2001, Vol 398-99, Num 1, pp 368-373, issn 0040-6090Conference Paper

Plasma deposition of carbon films at room temperature from C₂H₂-Ar mixtures: anodic vs. cathodic filmsSETH, T; ROCA I CABARROCAS, P.Thin solid films. 2001, Vol 383, Num 1-2, pp 216-219, issn 0040-6090Conference Paper

Preparation of diamond like carbon films by plasma source ion implantationBABA, Koumei; HATADA, Ruriko.Hyomen gijutsu. 2001, Vol 52, Num 1, pp 74-75, issn 0915-1869Article

Use of the hydrocarbon plasma of a low-pressure arc discharge for deposition of highly adhesive a-C:H filmsBUGAEV, S. P; OSKOMOV, K. V; PODKOVYROV, V. G et al.Surface & coatings technology. 2000, Vol 135, Num 1, pp 18-26, issn 0257-8972Article

Carbon coatings formation from plasma phase with ultrasound loading of condensation sutfaceKLUBOVICH, V. V; BOBROVSKY, V. V; KHAMCHUKOV, Yu. D et al.Fizika i himiâ obrabotki materialov. 2000, Num 6, pp 46-49, issn 0015-3214Article

Formation and ordering effects of C-induced Ge dots grown on Si (001) by molecular beam epitaxyLEIFELD, O; BEYER, A; MÜLLER, E et al.Materials science & engineering. B, Solid-state materials for advanced technology. 2000, Vol 74, Num 1-3, pp 222-228, issn 0921-5107Conference Paper

Inhomogeneous refractive index of SiO_XF_Y thin films prepared by ion beam assisted depositionLEE, J. H; HWANGBO, C. K.Surface & coatings technology. 2000, Vol 128-29, pp 280-285, issn 0257-8972Conference Paper

In situ diagnostic during growth of BN filmsFUKAREK, W.Le Vide (1995). 2000, Vol 55, Num 295, pp 1-10, issn 1266-0167, SUPConference Paper

Tantalum nitride films formed by ion beam assisted deposition : analysis of the structure in dependence on the ion irradiation intensityVOLZ, K; KIUCHI, M; ENSINGER, W et al.Surface & coatings technology. 2000, Vol 128-29, pp 298-302, issn 0257-8972Conference Paper

The protection of metallic archaeological objects using plasma polymer coatingsFAVRE-QUATTROPANI, L; GROENING, P; RAMSEYER, D et al.Surface & coatings technology. 2000, Vol 125, Num 1-3, pp 377-382, issn 0257-8972Conference Paper

Deposition of duplex Al₂O₃/DLC coatings on Al alloys for tribological applications using a combined micro-arc oxidation and plasma-immersion ion implantation techniqueNIE, X; WILSON, A; LEYLAND, A et al.Surface & coatings technology. 2000, Vol 131, Num 1-3, pp 506-513, issn 0257-8972Conference Paper

Low-temperature deposition of optical coatings using ion assistanceNIEDERWALD, Hansjörg.Thin solid films. 2000, Vol 377-78, pp 21-26, issn 0040-6090Conference Paper