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Stadtgestaltung und die Okonomie des Vergangenen: Vorzüge und Hemmnisse der Umnutzung von Industriebrachen. (Organisation urbaine et héritage économique: priorités et obstacles quant à la réutilisation des friches industrielles)KLEINEBERG, U; WOLF, R.Informationen zur Raumentwicklung Bonn-Bad Godesberg. 1984, Num 10-11, pp 1097-1109Article

Zone-plate interferometry at 13 nm wavelengthWIELAND, M; WILHEIN, T; SPIELMANN, C et al.Applied physics. B, Lasers and optics (Print). 2003, Vol 76, Num 8, pp 885-889, issn 0946-2171, 5 p.Article

Structural organization of DMPC lipid layers on chemically micropatterned self-assembled monolayers as biomimetic systemsBRECHLING, A; POHL, M; KLEINEBERG, U et al.Journal of biotechnology. 2004, Vol 112, Num 1-2, pp 115-125, issn 0168-1656, 11 p.Article

Inspection of EUVL mask blank defects and patterned masks using EUV photoemission electron microscopyJINGQUAN LIN; MAUL, J; WEBER, N et al.Microelectronic engineering. 2008, Vol 85, Num 5-6, pp 922-924, issn 0167-9317, 3 p.Conference Paper

Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidthLIM, Y. C; WESTERWALBESLOH, T; ASCHENTRUP, A et al.Applied physics. A, Materials science & processing (Print). 2001, Vol 72, Num 1, pp 121-124, issn 0947-8396Article

Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopyREESKORNFELD, L; SEGLER, R; HAINDL, G et al.Microelectronic engineering. 2000, Vol 54, Num 3-4, pp 303-314, issn 0167-9317Article

STM writing of artificial nanostructures in alkanethiol-type self-assembled monolayersHARTWICH, J; SUNDERMANN, M; KLEINEBERG, U et al.Applied surface science. 1999, Vol 144-45, pp 538-542, issn 0169-4332Conference Paper

Thermal stability of Mo/Si multilayer sof-X-ray mirrors fabricated by electron-beam evaporationSTOCK, H.-J; KLEINEBERG, U; HILGERS, K et al.Applied physics. A, Solids and surfaces. 1994, Vol 58, Num 4, pp 371-376, issn 0721-7250Article

Spin-polarized LEED from Xe-Pt(111)HILGERS, G; KLEINEBERG, U; NOLTING, K et al.Vacuum. 1990, Vol 41, Num 1-3, pp 325-327, issn 0042-207X, 3 p.Conference Paper

Time-resolved atomic inner-shell spectroscopyDRESCHER, M; HENTSCHEL, M; KIENBERGER, R et al.Nature (London). 2002, Vol 419, Num 6909, pp 803-807, issn 0028-0836Article

Giant magnetoresistance of hysteresis-free Cu/Co-based multilayersHÜTTEN, A; HEMPEL, T; SCHEPPER, W et al.Journal of magnetism and magnetic materials. 2001, Vol 226-30, pp 1758-1760, issn 0304-8853, 2Conference Paper

Thermal stability of W1-xSix/Si multilayer reflective coatings under high intensity excimer laser pulsesD'ANNA, E; LUCHES, A; HEINZMANN, U et al.Applied surface science. 1996, Vol 106, pp 166-170, issn 0169-4332Conference Paper

Mo0.5SiO.5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivitySTOCK, H.-J; KLEINEBERG, U; KLOIDT, A et al.Applied physics letters. 1993, Vol 63, Num 16, pp 2207-2209, issn 0003-6951Article

Phase defect inspection of multilayer masks for 13.5 nm optical lithography using PEEM in a standing wave modeMAUL, J; LIN, J; SCHÖNHENSE, G et al.Surface science. 2007, Vol 601, Num 20, pp 4758-4763, issn 0039-6028, 6 p.Conference Paper

A new approach for actinic defect inspection of EUVL multilayer mask blanks : Standing wave photoemission electron microscopyNEUHÄUSLER, U; LIN, J; BRECHLING, A et al.Microelectronic engineering. 2006, Vol 83, Num 4-9, pp 680-683, issn 0167-9317, 4 p.Conference Paper

Submicron imaging in the EUV spectral range using high-harmonic radiationWIELAND, M; FRÜKE, R; WILHEIN, T et al.Journal de physique. IV. 2003, Vol 104, pp 149-152, issn 1155-4339, 4 p.Conference Paper

Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVDHAMELMANN, F; ASCHENTRUP, A; SCHMALHORST, J et al.Journal de physique. IV. 2001, Vol 83, pp Pr3.431-Pr3.436, issn 1155-4339Conference Paper

Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon filmsKLIPP, A; HAMELMANN, F; HAINDL, G et al.Chemical vapor deposition (Print). 2000, Vol 6, Num 2, pp 63-66, issn 0948-1907Article

W/Si multilayers deposited by hot-filament MOCVDHAMELMANN, F; PETRI, S. H. A; KLIPP, A et al.Thin solid films. 1999, Vol 338, Num 1-2, pp 70-74, issn 0040-6090Article

Attosecond control and measurement : Lightwave electronics : Attosecond spectroscopyGOULIELMAKIS, E; YAKOVLEV, V. S; CAVALIERI, A. L et al.Science (Washington, D.C.). 2007, Vol 317, Num 5839, pp 769-775, issn 0036-8075, 7 p.Article

Attosecond spectroscopy in condensed matterCAVALIERI, A. L; MÜLLER, N; DRESCHER, M et al.Nature (London). 2007, Vol 449, Num 7165, pp 1029-1032, issn 0028-0836, 4 p.Article

Actinic inspection of EUVL mask blank defects by photoemission electron microscopy : Effect of inspection wavelength variationJINGQUAN LIN; NEUHAEUSLER, U; SCHOENHENSE, G et al.Microelectronic engineering. 2007, Vol 84, Num 5-8, pp 1011-1014, issn 0167-9317, 4 p.Conference Paper

Direct measurement of light wavesGOULIELMAKIS, E; UIBERACKER, M; KRAUSZ, F et al.Science (Washington, D.C.). 2004, Vol 305, Num 5688, pp 1267-1269, issn 0036-8075, 3 p.Article

Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishingKLEINEBERG, U; WESTERWALBESLOH, Th; HACHMANN, W et al.Thin solid films. 2003, Vol 433, Num 1-2, pp 230-236, issn 0040-6090, 7 p.Conference Paper

Electron-beam-deposited Mo/Si and MoxSiy/Si multilayer x-ray mirrors and gratingsSCHMIEDESKAMP, B; KLOIDT, A; HEINZMANN, U et al.Optical engineering (Bellingham. Print). 1994, Vol 33, Num 4, pp 1314-1321, issn 0091-3286Article

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