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THERMAL CHARACTERISTICS OF THE H2SO4-H2O2 SILICON WAFER CLEANING SOLUTIONPINTCHOVSKI F; PRICE JB; TOBIN PJ et al.1979; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1979; VOL. 126; NO 8; PP. 1428-1430; BIBL. 4 REF.Article

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