Pascal and Francis Bibliographic Databases

Help

Search results

Your search

au.\*:("KOLA R")

Publication Year[py]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Discipline (document) [di]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Author Country

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Results 1 to 16 of 16

  • Page / 1
Export

Selection :

  • and

SEKUNDAERVORSTOFFE IM IMPERIAL-SMELTING-SCHACHTOFEN DER BERZELIUS METALLHUETTEN-GMBH, DUISBURG:ERFAHRUNGEN BEI DER VERARBEITUNG ALS HEISSBRIKETTE = SECONDARY MATERIALS IN THE IMPERIAL-SMELTING-FURNACE AT BERZELIUS METALLHUETTEN-GMBH, DUISBURGKOLA R.1982; ERZMETALL; ISSN 0044-2658; DEU; DA. 1982; VOL. 35; NO 3; PP. 130-137; BIBL. 4 REF.Conference Paper

ENTFERNUNG VON QUECKSILBER AUS SCHWEFELSAEURE. = ELIMINATION DU MERCURE DE L'ACIDE SULFURIQUEKOLA R.1977; ERZMETALL; DTSCH.; DA. 1977; VOL. 30; NO 12; PP. 559-561; ABS. ANGL. FR. ESP.Article

RECOVERY OF ZINC AND LEAD FROM ELECTRIC-FURNACE STEELMAKING DUST AT BERZELIUSMACZEK H; KOLA R.1980; J. MET.; DEU; DA. 1980-01; VOL. 59; NO 1; PP. 53-58; BIBL. 8 REF.Article

Microstructure of Ta2O5 films grown by the anodization of TaNxWERDER, D. J; KOLA, R. R.Thin solid films. 1998, Vol 323, Num 1-2, pp 6-9, issn 0040-6090Article

Correlation of modulated optical reflectance with silicon carrier lifetime and impurity concentrationROZGONYI, G. A; RADZIMSKI, Z. J; KOLA, R. R et al.Applied physics letters. 1990, Vol 56, Num 12, pp 1169-1171, issn 0003-6951Article

Formation of monolithic masks for 0.25 μm x-ray lithographyCELLER, G. K; TRIMBLE, L. E; FRACKOVIAK, J et al.Applied physics letters. 1991, Vol 59, Num 24, pp 3105-3107, issn 0003-6951Article

Transition metal silicide precipitation in silicon induced by rapid thermal processing and free-surface getteringKOLA, R. R; ROZGONYI, G. A; LI, J et al.Applied physics letters. 1989, Vol 55, Num 20, pp 2108-2110, issn 0003-6951Article

Stress and microstructure of sputter-deposited thin films : molecular dynamics simulations and experimentFANG, C. C; JONES, F; KOLA, R. R et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1993, Vol 11, Num 6, pp 2947-2952, issn 1071-1023Conference Paper

Studies of metal-induced surface defects in Czochralski Si following rapid thermal processing with thermal wave methodHAHN, S; SMITH, W. L; SUGA, H et al.Journal of crystal growth. 1990, Vol 103, Num 1-4, pp 206-216, issn 0022-0248, 11 p.Conference Paper

Study of electron beam patterning of resist on tungsten x-ray masksCUMMINGS, K. D; RESNICK, D. J; FRACKOVIAK, J et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1993, Vol 11, Num 6, pp 2872-2875, issn 1071-1023Conference Paper

Tungsten patterning for 1:1 x-ray masksJURGENSEN, C. W; KOLA, R. R; NOVEMBRE, A. E et al.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1991, Vol 9, Num 6, pp 3280-3286, issn 0734-211XConference Paper

Down's syndrome-like skeletal abnormalities in Ets2 transgenic miceSUMARSONO, S. H; WILSON, T. J; TYMMS, M. J et al.Nature (London). 1996, Vol 379, Num 6565, pp 534-537, issn 0028-0836Article

Patterning of x-ray masks using the negative-acting resist P(SI-CMS)MIXON, D. A; NOVEMBRE, A. E; TAI, W. W et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1993, Vol 11, Num 6, pp 2834-2838, issn 1071-1023Conference Paper

Masks for x-ray lithography with a point source stepperCELLER, G. K; BIDDICK, C; FRACKOVIAK, J et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 3186-3190, issn 1071-1023Conference Paper

Mask fabrication for projection electron-beam lithography incorporating the SCALPEL techniqueLIDDLE, J. A; HUGGINS, H. A; BERGER, S. D et al.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1991, Vol 9, Num 6, pp 3000-3004, issn 0734-211XConference Paper

Mark detection for alignment and registration in a high-throughput projection electron lithography toolFARROW, R. C; LIDDLE, J. A; BERGER, S. D et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2780-2783, issn 1071-1023Conference Paper

  • Page / 1