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THE DESIGN, TESTING, AND ANALYSIS OF A COMPREHENSIVE TEST PATTERN FOR MEASURING CMOS/SOS PROCESS PERFORMANCE AND CONTROLLINHOLM LW.1981; SPEC. PUBL.-NATL. BUR. STAND.; ISSN 0083-1883; USA; DA. 1981; NO 400-66; 147 P.; BIBL. 4 REF.Serial Issue

A DIRECT MEASUREMENT OF INTERFACIAL CONTACT RESISTANCEPROCTOR SJ; LINHOLM LW.1982; ELECTRON DEVICE LETT.; ISSN 0193-8576; USA; DA. 1982; VOL. 3; NO 10; PP. 294-296; BIBL. 19 REF.Article

AN OPTIMIZED OUTPUT STAGE FOR MOS INTEGRATED CIRCUITS.HUNG CHANG LIN; LINHOLM LW.1975; I.E.E.E. J. SOLID-STATE CIRCUITS; U.S.A.; DA. 1975; VOL. 10; NO 2; PP. 106-109Article

A CROSS-BRIDGE TEST STRUCTURE FOR EVALUATING THE LINEWIDTH UNIFORMITY OF AN INTEGRATED CIRCUIT LITHOGRAPHY SYSTEMYEN D; LINHOLM LW; BUEHLER MG et al.1982; JOURNAL OF THE ELECTROCHEMICAL SOCIETY; ISSN 0013-4651; USA; DA. 1982; VOL. 129; NO 10; PP. 2313-2318; BIBL. 12 REF.Article

USE OF MICROELECTRONIC TEST STRUCTURES TO CHARACTERIZE IC MATERIALS, PROCESSES, AND PROCESSING EQUIPMENTCARVER GP; LINHOLM LW; RUSSELL TJ et al.1980; SOLID STATE TECHNOL.; ISSN 0038-111X; USA; DA. 1980; VOL. 23; NO 9; PP. 85-92; BIBL. 16 REF.Article

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