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PROCEEDINGS: MICROCIRCUIT ENGINEERING 81/INTERNATIONAL CONFERENCE ON MICROLITHOGRAPHY, LAUSANNE, SEPTEMBER 28-30, 1981OOSENBRUG A ED.1981; MICROCIRCUIT ENGINEERING 81. INTERNATIONAL CONFERENCE ON MICROLITHOGRAPHY/1981-09-28/LAUSANNE; CHE; LAUSANNE: SWISS FEDERAL INSTITUTE OF TECHNOLOGY; DA. 1981; 546 P.; 21 CMConference Proceedings

Prospects for x-ray lithographyFLEMING, D; MALDONADO, J. R; NEISSER, M et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2511-2515, issn 1071-1023Conference Paper

Scaling behavior in interference lithographyAGAYAN, R. R; BANYAI, W. C; FERNANDEZ, A et al.SPIE proceedings series. 1998, pp 662-672, isbn 0-8194-2776-4Conference Paper

A REVIEW OF FINE-LINE LITHOGRAPHIC TECHNIQUES: PRESENT AND FUTUREWATTS RK; BRUNING JH.1981; SOLID STATE TECHNOL.; ISSN 0038-111X; USA; DA. 1981; VOL. 24; NO 5; PP. 99-105; BIBL. 42 REF.Article

Characterization of AZ PN114 resist for high resolution using electron-beam and soft-x-ray projection lithographiesEARLY, K; TENNANT, D. M; JEON, D. Y et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2600-2605, issn 1071-1023Conference Paper

AN OVERVIEW OF E-BEAM MASK-MAKINGREYNOLDS JA.1979; SOLID STATE TECHNOL.; USA; DA. 1979; VOL. 22; NO 8; PP. 87-94; BIBL. 6 REF.Article

Recent advances in the Sandia EUV 10x microstepperGOLDSMITH, J. E. M; BARR, P. K; KRENZ, K. D et al.SPIE proceedings series. 1998, pp 11-19, isbn 0-8194-2776-4Conference Paper

Principles of lithographyLevinson, Harry J.2001, isbn 0-8194-4045-0, X, 373 p, isbn 0-8194-4045-0Book

Wafer-level fabrication and optical characterization of nanoscale patterned sapphire substratesLIN, Yu-Sheng; HSU, Wen-Ching; HUANG, Kuo-Cheng et al.Applied surface science. 2011, Vol 258, Num 1, pp 2-6, issn 0169-4332, 5 p.Article

Three-dimensional electron-beam resist profile simulatorMONIWA, A; YAMAGUCHI, H; OKAZAKI, S et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2771-2775, issn 1071-1023Conference Paper

Diffraction effects and image blurring in x-ray proximity printingDUBNER, A. D; WAGNER, A; LEVIN, J. P et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 3212-3216, issn 1071-1023Conference Paper

Helium field ion source for application in a 100 keV focused ion beam systemSAKATA, T; KUMAGAI, K; NAITOU, M et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2842-2845, issn 1071-1023Conference Paper

25th European Mask and Lithography Conference (12-15 January 2009, Dresden, Germany)Behringer, Uwe F. W.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, various pagings, isbn 978-0-8194-7770-5 0-8194-7770-2Conference Proceedings

High-power laser interference lithography process on photoresist : Effect of laser fluence and polarisationELLMAN, M; RODRIGUEZ, A; PEREZ, N et al.Applied surface science. 2009, Vol 255, Num 10, pp 5537-5541, issn 0169-4332, 5 p.Conference Paper

Frequency selective IR-filter produced by using EB-lithographyKATHURIA, Y. P.Applied surface science. 2007, Vol 253, Num 19, pp 7826-7830, issn 0169-4332, 5 p.Conference Paper

Novel approach to zero-magnification x-ray mask replicationWELLS, G. M; KRASNOPEROVA, A; HAYTCHER, E. A et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 3221-3223, issn 1071-1023Conference Paper

Electron lithography for the fabrication of microelectronic devicesOWEN, G.Reports on Progress in Physics (Print). 1985, Vol 48, Num 6, pp 795-851, issn 0034-4885Article

INTERNATIONAL CONFERENCE ON MICROLITHOGRAPHY; MICROCIRCUIT ENGINEERING 82/COLLOQUE INTERNATIONAL SUR LA MICROLITHOGRAPHIE, GRENOBLE, 5-8 OCTOBRE 19821982; MICROCIRCUIT ENGINEERING 82. COLLOQUE INTERNATIONAL SUR LA MICROLITHOGRAPHIE/1982-10-05/GRENOBLE; FRA; GRENOBLE: COMITE DU COLLOQUE INTERNATIONAL SUR LA MICROLITHOGRAPHIE; DA. 1982; 395 P.; 30 CMConference Proceedings

Proceedings of the 1983 international symposium on electron, ion, and photon beams, 31 May-3 June 1983, Westin Bonaventure Hotel, Los Angeles, CaliforniaHATZAKIS, M; CHANG, T. H. P.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1983, Vol 1, Num 4, pp 947-1400, issn 0734-211XConference Proceedings

Deformation of x-ray lithography masks during tool chuckingCHEN, A. C; MALDONADO, J. R.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 3208-3211, issn 1071-1023Conference Paper

Metal-less x-ray phase-shift masks for nanolithographyWHITE, V; CERRINA, F.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 3141-3144, issn 1071-1023Conference Paper

Fast formation of hydrophilic and reactive polymer micropatterns by photocatalytic lithography methodCHANG, Chi-Jung; WANG, Chih-Feng; CHEN, Jem-Kun et al.Applied surface science. 2013, Vol 286, pp 280-286, issn 0169-4332, 7 p.Article

SLM-based maskless lithography for TFT-LCDKIM, Kwang-Ryul; YI, Junsin; CHO, Sung-Hak et al.Applied surface science. 2009, Vol 255, Num 18, pp 7835-7840, issn 0169-4332, 6 p.Article

Compact recycled beam source for XRL and EUVL exposure toolsPIESTRUP, M. A; POWELL, M. W; RETZLAFF, G. A et al.SPIE proceedings series. 1998, pp 450-463, isbn 0-8194-2776-4Conference Paper

Submicrometer lithography using lensless high-efficiency holographic systemsCHEN, R. T; SADOVNIK, L; AYE, T. M et al.Optics letters. 1990, Vol 15, Num 15, pp 869-871, issn 0146-9592, 3 p.Article

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