Focused ion beam fabrication of silicon print mastersLI, Hong-Wei; KANG, Dae-Joon; BLAMIRE, M. G et al.Nanotechnology (Bristol. Print). 2003, Vol 14, Num 2, pp 220-223, issn 0957-4484, 4 p.Conference Paper

ION BEAMS PROMISE PRACTICAL SYSTEMS FOR SUBMICROMETER WAFER LITHOGRAPHYSELIGER RL; SULLIVAN PA.1980; ELECTRONICS; USA; DA. 1980; VOL. 53; NO 7; PP. 142-146Article

Application of a focused ion beam system to micro and nanoengineeringLANGFORD, R. M; PETFORD-LONG, A. K; ROMMESWINKLE, M et al.Materials science and technology. 2002, Vol 18, Num 7, pp 743-748, issn 0267-0836Conference Paper

Large-field ion-optics for Projection and proximity printing and for mask-less Lithography (ML2)LOESCHNER, Hans; STENGL, Gerhard; HIRSCHER, Stefan et al.SPIE proceedings series. 2002, pp 595-606, isbn 0-8194-4434-0, 2VolConference Paper

Neon Ion Beam Lithography (NIBL)WINSTON, Donald; MANFRINATO, Vitor R; BERGGREN, Karl K et al.Nano letters (Print). 2011, Vol 11, Num 10, pp 4343-4347, issn 1530-6984, 5 p.Article

Orthogonal and fine lithographic structures attained from the next generation proton beam writing facilityYAO, Y; SANTHANA RAMAN, P; VAN KAN, J. A et al.Microsystem technologies. 2014, Vol 20, Num 10-11, pp 2065-2069, issn 0946-7076, 5 p.Conference Paper

Depth control of a silicon structure fabricated by 100q keV Ar ion beam lithographyKAWASEGI, Noritaka; MORITA, Noboru; YAMADA, Shigeru et al.Applied surface science. 2007, Vol 253, Num 6, pp 3284-3291, issn 0169-4332, 8 p.Article

SiGe nanostructuresBERBEZIER, I; RONDA, A.Surface science reports. 2009, Vol 64, Num 2, pp 47-98, issn 0167-5729, 52 p.Article

The rapid prototyping of textured amorphous surfaces for the graphoepitaxial deposition of CdTe films using focused ion beam lithographyNERETINA, S; HUGHES, R. A; STORTZ, G et al.Applied physics. A, Materials science & processing (Print). 2011, Vol 102, Num 2, pp 259-264, issn 0947-8396, 6 p.Article

Focused ion beam mjicro-and nanoengineering : Focused ion beam microscopy and micromachiningLANGFORD, Richard M; NELLEN, Philipp M; GIERAK, Jacques et al.MRS bulletin. 2007, Vol 32, Num 5, pp 417-423, issn 0883-7694, 7 p.Article

Ion beam imprinting system for nanofabricationQING JI; YE CHEN; LILI JI et al.Microelectronic engineering. 2006, Vol 83, Num 4-9, pp 796-799, issn 0167-9317, 4 p.Conference Paper

Nanofabrication using computer-assisted design and automated vector-scanning probe lithographyCRUCHON-DUPEYRAT, S; PORTHUN, S; LIU, G.-Y et al.Applied surface science. 2001, Vol 175-76, pp 636-642, issn 0169-4332Conference Paper

Label-free detection of DNA hybridization and single point mutations in a nano-gap biosensorZAFFINO, R. L; MIR, M; SAMITIER, J et al.Nanotechnology (Bristol. Print). 2014, Vol 25, Num 10, issn 0957-4484, 105501.1-105501.8Article

Emerging lithographic technologies VI (Santa Clara CA, 5-7 March 2002)Engelstad, Roxann L.SPIE proceedings series. 2002, isbn 0-8194-4434-0, 2Vol, XIV, 950 p, isbn 0-8194-4434-0Conference Proceedings

Development of nanostructures for thermoelectric microgenerators using ion-track lithographyKOUKHARENKO, E; LI, X; NANDHAKUMAR, I et al.Electronics Letters. 2008, Vol 44, Num 7, pp 500-501, issn 0013-5194, 2 p.Article

Neutral particle lithography : a simple solution to charge-related artefacts in ion beam proximity printing : Neutral Beam ProcessesWOLFE, J. C; CRAVER, B. P.Journal of physics. D, Applied physics (Print). 2008, Vol 41, Num 2, issn 0022-3727, 024007.1-024007.12Article

Site-specific fabrication of nanoscale heterostructures: Local chemical modification of GaN nanowires using electrochemical dip-pen nanolithographyMAYNOR, Benjamin W; JIANYE LI; CHENGUANG LU et al.Journal of the American Chemical Society. 2004, Vol 126, Num 20, pp 6409-6413, issn 0002-7863, 5 p.Article

Dip-pen nanolithography in Tapping ModeAGARWAL, Gunjan; SOWARDS, Laura A; NAIK, Rajesh R et al.Journal of the American Chemical Society. 2003, Vol 125, Num 2, pp 580-583, issn 0002-7863, 4 p.Article

LITHIUM-ION-BEAM EXPOSURE OF PMMA-LAYERS WITHOUT PROXIMITY-EFFECTSPEIDEL R; BEHRINGER U.1980; OPTIK; DEU; DA. 1980; VOL. 54; NO 5; PP. 439-444; ABS. ENG; BIBL. 3 REF.Article

Fabrication of hierarchical micro-nanotopographies for cell attachment studiesLOPEZ-BOSQUE, M. J; TEJEDA-MONTES, E; CAZORLA, M et al.Nanotechnology (Bristol. Print). 2013, Vol 24, Num 25, issn 0957-4484, 255305.1-255305.12Article

Soft UV-NIL at the 12.5 nm ScaleKREINDL, G; KAST, M; BERGMAIR, I et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701M.1-79701M.7Conference Paper

Fractional matching effect of vortices in Bi₂Sr₂CaCu₂O_8+y with square lattice of antidotsOOI, S; MOCHIKU, T; HIRATA, K et al.Physica. C. Superconductivity. 2010, Vol 470, Num SUP1, issn 0921-4534, S868-S869Conference Paper

Shadow Overlap Ion-beam Lithography for NanoarchitecturesCHOI, Yeonho; HONG, Soongweon; LEE, Luke P et al.Nano letters (Print). 2009, Vol 9, Num 11, pp 3726-3731, issn 1530-6984, 6 p.Article

Direct writing of microtunnels using proton beam micromachiningMAROT, Laurent; MUNNIK, Frans; MIKHAILOV, Sergueï et al.Applied surface science. 2006, Vol 252, Num 20, pp 7343-7346, issn 0169-4332, 4 p.Article

An addressable antibody nanoarray produced on a nanostructured surfaceBRUCKBAUER, Andreas; DEJIAN ZHOU; KANG, Dae-Joon et al.Journal of the American Chemical Society. 2004, Vol 126, Num 21, pp 6508-6509, issn 0002-7863, 2 p.Article