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Results 1 to 25 of 1471

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Estimating thermal transport in deep X-ray lithography with an inversion methodCHANG, W.-J; YANG, Y.-C; LIN, C.-M et al.Applied physics. B, Lasers and optics (Print). 2005, Vol 81, Num 4, pp 543-548, issn 0946-2171, 6 p.Article

One-, two- and three-dimensional nanostructures with atom lithographyOBERTHALER, Markus K; PFAU, Tilman.Journal of physics. Condensed matter (Print). 2003, Vol 15, Num 6, pp R233-R255, issn 0953-8984Article

Proton-exchanged wet etching of recessed-structure SAW filterTSAI, Shih-Hung; WANG, Na-Fu; HOUNG, Mau-Phon et al.IEEE transactions on ultrasonics, ferroelectrics, and frequency control. 2003, Vol 50, Num 9, pp 1219-1222, issn 0885-3010, 4 p.Article

Single step direct-write photomask made from bimetallic Bi/In thermal resistCHAPMAN, Glenn; YUQIANG TU.SPIE proceedings series. 2003, pp 257-268, isbn 0-8194-4777-3, 12 p.Conference Paper

Direct silicon-silicon bonding by induction heatingTHOMPSON, Keith; GIANCHANDANI, Yogesh B; BOOSKE, John et al.Journal of microelectromechanical systems. 2002, Vol 11, Num 4, pp 285-292, issn 1057-7157Article

Feature superfilling in copper electrochemical depositionSOUKANE, S; SEN, S; CALE, And T. S et al.Journal of the Electrochemical Society. 2002, Vol 149, Num 1, pp C74-C81, issn 0013-4651Article

Application of feedforward reticle: Offset for overlay APC in a high part count fabCROW, David; JOUBERT, Etienne.SPIE proceedings series. 2002, isbn 0-8194-4435-9, 2Vol, vol 2, 1151-1161Conference Paper

Contrast Enhancement materials for yield improvement in submicron I-line LithographyGEARY, Shane; THOMPSON, Jim; CAPSUTO, Elliott et al.SPIE proceedings series. 2002, isbn 0-8194-4435-9, 2Vol, vol 2, 1017-1026Conference Paper

Metal characterization and process enhancement techniques for photolithographic materialsKO, Fu-Hsiang; CHEN, Hsuen-Li; HSU, Chun-Chen et al.SPIE proceedings series. 2002, isbn 0-8194-4435-9, 2Vol, vol 2, 696-705Conference Paper

Anisotropic etching of {100} and {110} planes in (100) siliconPOWELL, Oliver; HARRISON, H. Barry.Journal of micromechanics and microengineering (Print). 2001, Vol 11, Num 3, pp 217-220, issn 0960-1317Article

Powder blasting for the realisation of microchips for bio-analytic applicationsSOLIGNAC, D; SAYAH, A; CONSTANTIN, S et al.Sensors and actuators. A, Physical. 2001, Vol 92, Num 1-3, pp 388-393, issn 0924-4247Conference Paper

In-plane gravity loading of a circular membraneTEJEDA, R. O; LOVELL, E. G; ENGELSTAD, R. L et al.Journal of applied mechanics. 2000, Vol 67, Num 4, pp 837-839, issn 0021-8936Article

Microfabrication of two layer structures of electrically isolated wires using self-assembly to guide the deposition of insulating organic polymerBLACK, Andrew J; NEALEY, Paul F; THYWISSEN, Joseph H et al.Sensors and actuators. A, Physical. 2000, Vol 86, Num 1-2, pp 96-102, issn 0924-4247Article

Laser printing of photoluminescent porous silicon featuresBARANAUSKAS, V.Applied surface science. 2000, Vol 154-55, pp 605-609, issn 0169-4332Conference Paper

A metric for process optimisation on substrates with transparent stacks in optical lithographyMARTIN, B; ARTHUR, G.SPIE proceedings series. 2000, pp 641-647, isbn 0-8194-3616-XConference Paper

A study of a single closed Contact for 0.18 micron photolithography processCHEUNG, C; PHAN, K; CHIU, R et al.SPIE proceedings series. 2000, pp 738-748, isbn 0-8194-3616-XConference Paper

Influence of inter-metal dielectrics' thickness on overlay mark size variation in photolithographyLEE, S.-J; YOO, J.-Y; KIM, Y.-C et al.SPIE proceedings series. 2000, pp 195-204, isbn 0-8194-3616-XConference Paper

Effects of alignment accuracy on CMP process for overlay controlHONG, J; JOUNG, G; YANG, H et al.SPIE proceedings series. 2000, pp 441-448, isbn 0-8194-3616-XConference Paper

Accelerated yield learning in aggressive lithographyMONAHAN, K. M; ASHKENAZ, S; CHEN, X et al.SPIE proceedings series. 2000, pp 492-503, isbn 0-8194-3616-XConference Paper

Determination of optical properties of thin films and surfaces in 157-nm lithographyLIBERMAN, V; BLOOMSTEIN, T. M; ROTHSCHILD, M et al.SPIE proceedings series. 2000, pp 480-491, isbn 0-8194-3616-XConference Paper

Monte carlo model of charging in resists in e-beam lithographyKO, Y.-U; HWU, J. J; JOY, D. C et al.SPIE proceedings series. 2000, pp 694-702, isbn 0-8194-3616-XConference Paper

Anisotropic etching of AlSiCu in chlorofluorocarbon reactive plasma for the fabrication of VLSICsPANT, B. D; WADHAWAN, O. P.SPIE proceedings series. 2000, pp 875-878, isbn 0-8194-3601-1Conference Paper

Development of a nanoscale printing technology for planar and curved surfacesHULL, R; LONGO, D.SPIE proceedings series. 2000, pp 974-981, isbn 0-8194-3601-1Conference Paper

Photomask and next-generation lithography mask technology VII (Yokohama, 12-13 April 2000)Morimoto, Hiroaki.SPIE proceedings series. 2000, isbn 0-8194-3702-6, XV, 750 p, isbn 0-8194-3702-6Conference Proceedings

Re-evaluating simple lambda based design rules for low K1 lithography process controlPOSTNIKOV, S; LUCAS, K; ROMAN, B et al.SPIE proceedings series. 2000, pp 901-912, isbn 0-8194-3616-XConference Paper

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