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Three-dimensional electron-beam resist profile simulatorMONIWA, A; YAMAGUCHI, H; OKAZAKI, S et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2771-2775, issn 1071-1023Conference Paper

E-Beam direct wafer writing process using a water-soluble conductive layerWATANABE, H; TODOKORO, Y.I.E.E.E. transactions on electron devices. 1989, Vol 36, Num 3, pp 474-478, issn 0018-9383, 5 p.Article

Conducting electron beam resists based on polyanilineHUPCEY, M. A. Z; ANGELOPOULOS, M; GELORME, J. D et al.SPIE proceedings series. 1998, pp 369-374, isbn 0-8194-2776-4Conference Paper

Electron beam direct writing technology for fine gate patterningSATO, K; SHIRAI, S; HAYAKAWA, H et al.SPIE proceedings series. 1998, pp 326-333, isbn 0-8194-2776-4Conference Paper

Optimization of pattern shape in electron-beam cell projection lithographyEMA, T; YAMASHITA, H; NAKAJIMA, K et al.SPIE proceedings series. 1998, pp 464-470, isbn 0-8194-2776-4Conference Paper

Low-energy electron beam enhanced etching of Si(100)-(2×1) by molecular hydrogenGILLIS, H. P; CLEMONS, J. L; CHAMBERLAIN, J. P et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2729-2733, issn 1071-1023Conference Paper

Advanced electron-beam pattern generation technology for 180 nm masksABBOUD, F; SAUER, C; WANG, W et al.SPIE proceedings series. 1998, pp 19-27, isbn 0-8194-2669-5Conference Paper

Photomask in-plane distortion induced during e-beam patterningSHAMOUN, B; SPRAGUE, M; ENGELSTAD, R et al.SPIE proceedings series. 1998, pp 275-279, isbn 0-8194-2776-4Conference Paper

The application of the fullerene C60 thin films as an electron beam resist for micro- and nanolithographyGAEVSKI, M. E; ROTKINA, L. G; MAKAROVA, T. L et al.SPIE proceedings series. 1998, pp 382-385, isbn 0-8194-2776-4Conference Paper

Defect printability analysis on electron projection lithography with diamond stencil reticleTOMO, Yoichi; KOJIMA, Yoshinori; SHIMIZU, Sumito et al.SPIE proceedings series. 2002, pp 786-797, isbn 0-8194-4434-0, 2VolConference Paper

Cell projection column for high speed electron-beam lithography systemITOH, H; TODOKORO, H; SOHDA, Y et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2799-2803, issn 1071-1023Conference Paper

Alkali-developable silicone-based positive resist for electron beam lithographyBAN, H; TANAKA, A; IMAMURA, S et al.Japanese journal of applied physics. 1988, Vol 27, Num 11, pp L2137-L2138, issn 0021-4922, part 2Article

Dynamic image placement accuracy of a stencil maskTAKENAKA, H; YAMASHITA, H; TAKAHASHI, K et al.SPIE proceedings series. 2002, pp 559-569, isbn 0-8194-4434-0, 2VolConference Paper

Nikon EPL tool development summaryMIURA, Takaharu; SATO, Tatsuo; MIYAZAKI, Masaya et al.SPIE proceedings series. 2002, pp 527-534, isbn 0-8194-4434-0, 2VolConference Paper

Fabrication of micro optical surface profiles by using gray scale masksKLEY, E.-B; THOMA, F; ZEITNER, U. D et al.SPIE proceedings series. 1998, pp 254-262, isbn 0-8194-2715-2Conference Paper

Electron beam lithography system with new correction techniquesTAKAHASHI, Y; YAMADA, A; OAE, Y et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2794-2798, issn 1071-1023Conference Paper

Electron beam block exposureYASUDA, H; SAKAMOTO, K; YAMADA, A et al.Japanese journal of applied physics. 1991, Vol 30, Num 11B, pp 3098-3102, issn 0021-4922, 1Article

EPL mask fabricationLERCEL, Michael; WILLIAMS, Carey; LAWLISS, Mark et al.SPIE proceedings series. 2002, pp 790-798, isbn 0-8194-4517-7, 9 p.Conference Paper

DY-7 sub-0.1 micron EB lithography systemWENQI GU; NIANKAN KANG; HONG XUE et al.Microelectronic engineering. 2001, Vol 57-58, pp 191-198, issn 0167-9317Conference Paper

Line-width controllability depending on electron-beam blur and resist thicknessITOH, M; ANDO, A; MAGOSHI, S et al.SPIE proceedings series. 1998, pp 442-449, isbn 0-8194-2776-4Conference Paper

Comprehensive simulation of electron-beam lithography processes using PROLITH/3D and TEMPTATION software toolsBABIN, Sergey; KUZMIN, Igor Yu; MACK, Chris A et al.Microelectronic engineering. 2001, Vol 57-58, pp 343-348, issn 0167-9317Conference Paper

Critical dimension and write time performance : A next generation vector electron beam mask patterning systemROSE, C; WANG, L; JUSTEN, J et al.SPIE proceedings series. 1998, pp 302-312, isbn 0-8194-2776-4Conference Paper

Critical issues for developing a high-throughput SCALPEL system for sub-0.18 micron lithography generationsSTANTON, S. T; LIDDLE, J. A; WASKIEWICZ, W. K et al.SPIE proceedings series. 1998, pp 673-688, isbn 0-8194-2776-4Conference Paper

Low voltage alternative for electron beam lithographyLEE, Y.-H; BROWNING, R; MALUF, N et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 3094-3098, issn 1071-1023Conference Paper

Measurement of beam current and beam diameter of an E-beam lithography SystemSAXENA, Renuka; PRASAD, Manju; SHARMA, M. U et al.SPIE proceedings series. 2002, pp 713-717, isbn 0-8194-4500-2, 2VolConference Paper

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