Effect of sintering temperature on functional properties of alumina membranesLEVÄNEN, Erkki; MÄNTYLÄ, Tapio.Journal of the European Ceramic Society. 2002, Vol 22, Num 5, pp 613-623, issn 0955-2219Article

The effect of acidity in low-temperature synthesis of titanium dioxideNIKKANEN, Juha-Pekka; KANERVA, Tomi; MÄNTYLÄ, Tapio et al.Journal of crystal growth. 2007, Vol 304, Num 1, pp 179-183, issn 0022-0248, 5 p.Article

Wetting behaviour of plasma sprayed oxide coatingsHARJU, Mika; LEVÄNEN, Erkki; MÄNTYLÄ, Tapio et al.Applied surface science. 2006, Vol 252, Num 24, pp 8514-8520, issn 0169-4332, 7 p.Article

Optical filters by the pyrolysis of metal-organicsDESU, S. B.Journal de physique. IV. 1993, Vol 3, Num 3, issn 1155-4339, p. 391Conference Paper

Transition alumina nanoparticles and nanorods from boehmite nanoflakesXIAOXUE ZHANG; HONKANEN, Mari; LEVÄNEN, Erkki et al.Journal of crystal growth. 2008, Vol 310, Num 15, pp 3674-3679, issn 0022-0248, 6 p.Article

Surface characterization of plasma sprayed oxide materials: estimation of surface acidity using mass titrationHARJU, Mika; LEVÄNEN, Erkki; MÄNTYLÄ, Tapio et al.Journal of colloid and interface science. 2004, Vol 276, Num 2, pp 346-353, issn 0021-9797, 8 p.Article

A consideration of adsorption processes in the CVD of polysiliconHITCHMAN, M. L; ZHAO, J.Journal de physique. IV. 1993, Vol 3, Num 3, pp 115-122, issn 1155-4339Conference Paper

Chemical vapour deposition of Al₂O₃ on titanium oxidesFREDRIKSSON, E; CARLSSON, J.-O.Journal de physique. IV. 1993, Vol 3, Num 3, pp 557-562, issn 1155-4339Conference Paper

Ellipsometric analysis for CVD thick films on weakly absorbing substratesCHURAEVA, M. N.Journal de physique. IV. 1993, Vol 3, Num 3, pp 189-193, issn 1155-4339Conference Paper

YBa₂Cu₃O_7-x thin films deposition of YSZ substrates by MOCVDSANTISO, J; FIGUERAS, A.Journal de physique. IV. 1993, Vol 3, Num 3, pp 353-360, issn 1155-4339Conference Paper

Influence of additives on capillary absorption of aqueous solutions into asymmetric porous ceramic substrateLEVÄNEN, Erkki; MÄNTYLÄ, Tapio; MIKKOLA, Pasi et al.Journal of colloid and interface science. 2001, Vol 234, Num 1, pp 28-34, issn 0021-9797Article

Chemical vapor deposition of hafnium carbide and hafnium nitrideEMIG, G; SCHOCH, G; WORMER, O et al.Journal de physique. IV. 1993, Vol 3, Num 3, pp 535-540, issn 1155-4339Conference Paper

Direct writing of piezoresistive silicon resistors using laser-induced CVDMOILANEN, H; LEPPÄVUORI, L; UUSIMÄKI, A et al.Journal de physique. IV. 1993, Vol 3, Num 3, pp 457-464, issn 1155-4339Conference Paper

Structures and properties of Y-ZrO₂ thin films deposited by reactive r.f. sputteringWANG, Y.-H; PI, X.-P.Journal de physique. IV. 1993, Vol 3, Num 3, pp 611-615, issn 1155-4339Conference Paper

Characterization of water exposed plasma sprayed oxide coating materials using XPSHARJU, Mika; AREVA, Sami; ROSENHOLM, Jarl B et al.Applied surface science. 2008, Vol 254, Num 18, pp 5981-5989, issn 0169-4332, 9 p.Article

Water adsorption on plasma sprayed transition metal oxidesHARJU, Mika; MÄNTYLÄ, Tapio; VÄHÄ-HEIKKILÄ, Kalle et al.Applied surface science. 2005, Vol 249, Num 1-4, pp 115-126, issn 0169-4332, 12 p.Article

Electrical properties of interlevel deposited oxides related to polysilicon preparationCOBIANU, C; POPA, O; DASCALU, D et al.Journal de physique. IV. 1993, Vol 3, Num 3, pp 467-473, issn 1155-4339Conference Paper

Kinetics laws of the chemical process in the CVD of SiC ceramics from CH₃SiCl₃-H₂ precursorLOUMAGNE, F; LANGLAIS, F; NASLAIN, R et al.Journal de physique. IV. 1993, Vol 3, Num 3, pp 527-533, issn 1155-4339Conference Paper

Silicon atomic layer growth using flash heating in CVDSAKURABA, M; MUROTA, J; ONO, S et al.Journal de physique. IV. 1993, Vol 3, Num 3, pp 449-456, issn 1155-4339Conference Paper

Chemical vapor deposition of pyrolytic carbon on polished substratesDESPRES, J.-F; VAHLAS, C; OBERLIN, A et al.Journal de physique. IV. 1993, Vol 3, Num 3, pp 563-570, issn 1155-4339Conference Paper

Comparative study of copper deposits obtained by thermal decomposition and photo-assisted chemical vapour deposition of 3-diketonate complexesKARSI, M; REYNES, A; MORANCHO, R et al.Journal de physique. IV. 1993, Vol 3, Num 3, pp 273-280, issn 1155-4339Conference Paper

Growth kinetics of copper thin film in different MOCVD systemsGERFIN, T; BECHT, M; DAHMEN, K.-H et al.Journal de physique. IV. 1993, Vol 3, Num 3, pp 345-352, issn 1155-4339Conference Paper

LCVD of aluminium stripes obtained by pyrolysis of TMAA and TMASHANOV, V; POPOV, C; IVANOV, B et al.Journal de physique. IV. 1993, Vol 3, Num 3, pp 255-260, issn 1155-4339Conference Paper

Preparation of iridium and platinum films by MOCVD and their propertiesGOTO, T; VARGAS, R; HIRAI, T et al.Journal de physique. IV. 1993, Vol 3, Num 3, pp 297-304, issn 1155-4339Conference Paper

SiCN coatings prepared by PACVD from TMS-NH₃-Ar system on steelDUCARROIR, M; ZHANG, W; BERJOAN, R et al.Journal de physique. IV. 1993, Vol 3, Num 3, pp 247-254, issn 1155-4339Conference Paper