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Results 1 to 25 of 814

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Double Patterning Lithography Study with High Overlay AccuracyKIKUCHI, Takahisa; SHIRATA, Yosuke; YASUDA, Masahiko et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76400H.1-76400H.9, 2Conference Paper

Immersion Specific Error Contribution to Overlay ControlD'HAVE, Koen; LAIDLER, David; CHENG, Shaunee et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72720D.1-72720D.6, 2Conference Paper

Studies of High Index Immersion LithographyOHMURA, Yasuhiro; NAGASAKA, Hiroyuki; MATSUYAMA, Tomoyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692413.1-692413.8, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Extending Immersion Lithography to the 32nm NodeWARRICK, Scott; CONLEY, Will; FARYS, Vincent et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652015.1-652015.11, issn 0277-786X, isbn 978-0-8194-6639-6Conference Paper

Measurement of the birefringence distribution in high resolution laser scanning lensesHEE SUNG CHO; YUN WOO LEE; JAE HYEOB LEE et al.Proceedings of SPIE, the International Society for Optical Engineering. 2005, pp 602413.1-602413.7, issn 0277-786X, isbn 0-8194-6055-9, 1VolConference Paper

Immersion lithography robustness for the C065 nodeWARRICK, Scott; MORTON, Rob; CRUAU, David et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 1, 615407.1-615407.12Conference Paper

Analytical-numerical reconstruction of the inhomogeneity profile of layered media from a backscattered pulse fieldTEMCHENKO, V. V.Journal of communications technology & electronics. 1998, Vol 43, Num 6, pp 658-662, issn 1064-2269Article

Polar Correction: new overlay control method for higher-order intrafield error dependent on the wafer coordinatesTAKAKUWA, Manabu; TORIUMI, Keigo; KOMINE, Nobuhiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72720J.1-72720J.9, 2Conference Paper

XLR 600i : Recirculating Ring ArF Light Source for Double Patterning Immersion LithographyFLEUROV, Vladimir; ROKITSKI, Slava; PARTLO, William et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69241R.1-69241R.5, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Rigorous simulation study of mask gratings at conical illuminationKÖHLE, Roderick.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 66072Z.1-66072Z.10, issn 0277-786X, isbn 978-0-8194-6745-4Conference Paper

Scatterometry Sensitivity for NIL ProcessMIYAKAWA, Takahiro; SATO, Kazuhiro; SENTOKU, Koich et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701N.1-79701N.7Conference Paper

Defect performance of a 2X node resist with a revolutionary point-of-use filterBRAGGIN, J; RAMIREZ, R; WU, A et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76391E.1-76391E.8, 2Conference Paper

Design of Resist Stacks with Antireflection Coatings from the Viewpoint of Focus BudgetNAGAI, Satoshi; SATO, Kazuya.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72741H.1-72741H.10, 2Conference Paper

Novel depolymerizable topcoat for immersion lithographyPENG ZHANG; WEIGEL, Scott J; BRAYMER, Tom et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 61531N.1-61531N.7Conference Paper

Analysis of the Effect of Point-of-Use Filtration on Microbridging DefectivityBRAGGIN, J; GRONHEID, R; CHENG, S et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72730S.1-72730S.10, 2Conference Paper

L'optique en ligne de mire = Optics in the line of sightFERRARI, Thierry.Technologies internationales (Strasbourg). 2005, Num 119, pp 27-30, issn 1165-8568, 4 p.Article

High Reliability ArF Light Source for Double Patterning Immersion LithographyROKITSKI, Rostislav; ISHIHARA, Toshi; RAO, Rajeskar et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76401Q.1-76401Q.7, 2Conference Paper

Film Stacking Architecture for Immersion Lithography ProcessGOTO, Tomohiro; SANADA, Masakazu; MIYAGI, Tadashi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69222X.1-69222X.9, issn 0277-786X, isbn 978-0-8194-7107-9Conference Paper

Assurance of CD for 45 nm half-pitch with immersion microscopeYAMANE, Takeshi; TANIGUCHI, Rikiya; HIRANO, Takashi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6358-2, vol 1, 628314.1-628314.8Conference Paper

Recent performance results of Nikon immersion lithography toolsHAZELTON, Andrew J; SHIRAISHI, Kenichi; WAKAMOTO, Shinji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7109-3, Part II, 69241N.1-69241N.8Conference Paper

Current status of water immersion lithography and prospect of higher index methodOWA, Soichi; NAKANO, Katsushi; NAGASAKA, Hiroyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 653304.1-653304.5, issn 0277-786X, isbn 978-0-8194-6655-6Conference Paper

Investigation of aberration measurement in confocal microscopyZHOU, H; GU, M; SHEPPARD, C. J. R et al.Journal of modern optics (Print). 1995, Vol 42, Num 3, pp 627-638, issn 0950-0340Article

Mask 3D effects: impact on Imaging and PlacementFINDERS, Jo; HOLLINK, Thijs.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7985, issn 0277-786X, isbn 978-0-8194-8553-3, 79850I.1-79850I.23Conference Paper

Directed assembly of block copolymers on lithographically defined surfacesCRAIG, Gordon S. W; NEALEY, Paul F.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 76370L.1-76370L.8Conference Paper

Defectivity Improvement by Modified Wafer Edge Treatment in Immersion LithographyFUJITA, Masafumi; TAMURA, Takao; ONODA, Naka et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72741G.1-72741G.10, 2Conference Paper

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