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Extending analog design scaling to sub-wavelength lithography: co-optimization of RET and photomasksPARIKH, Ashesh; DORRIS, Siew; SMELKO, Tom et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7974, issn 0277-786X, isbn 978-0-8194-8533-5, 79740N.1-79740N.8Conference Paper

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