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au.\*:("MAKHVILADZE, T. M")

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Several aspects of the return flows formation in horizontal CVD reactorsMAKHVILADZE, T. M; MARTJUSHENKO, A. V.International journal of heat and mass transfer. 1998, Vol 41, Num 16, pp 2529-2536, issn 0017-9310Article

Mechanisms of photon-stimulated desorption and chemisorption of atomic particles on the surfaces of semiconductors and metalsAGAFONOV, A. I; MAKHVILADZE, T. M.Applied surface science. 1990, Vol 46, Num 1-4, pp 288-291, issn 0169-4332, 4 p.Conference Paper

A new method of enhancing focus latitude in laser lithographyVALIEV, K. A; ILKAYEV, D. R; MAKHVILADZE, T. M et al.Microelectronic engineering. 1992, Vol 18, Num 4, pp 295-303, issn 0167-9317Article

Mécanisme de gravure des couches polymères dans un plasma de basse températureVALIEV, K. A; MAKHVILADZE, T. M; SARYCHEV, M. E et al.Žurnal tehničeskoj fiziki. 1986, Vol 56, Num 7, pp 1329-1335, issn 0044-4642Article

A new, general model for mechanical stress evolution during electromigrationSARYCHEV, M. E; ZHITNIKOV, Yu. V; BORUCKI, L et al.Thin solid films. 2000, Vol 365, Num 2, pp 211-218, issn 0040-6090Article

Extension of the traditional optical model for investigation into the EUV projection lithography capabilitiesIVIN, V. V; LUCAS, K. D; MAKHVILADZE, T. M et al.SPIE proceedings series. 1998, pp 646-654, isbn 0-8194-2776-4Conference Paper

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